Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.15, No.4 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (8 articles)
| 581 - 606 |
Nanoparticle Formation Using a Plasma Expansion Process Rao N, Girshick S, Heberlein J, Mcmurry P, Jones S, Hansen D, Micheel B |
| 607 - 628 |
A New Nozzle Design for DC Plasma Spray Guns Jankovic M, Mostaghimi J |
| 629 - 651 |
Temperature and Density Profiles of Magnetically Rotating Arcs Burning in Contaminated Argon Desaulnierssoucy N, Meunier JL |
| 653 - 675 |
In-Flight Particle Diagnostics in Induction Plasma Processing Coulombe S, Boulos MI |
| 677 - 692 |
Effect of Working Gases on Thermal Plasma Waste Treatment Paik S, Hawkes G, Nguyen HD |
| 693 - 710 |
Parametric Study of the Decomposition of NH3 for an Induction Plasma Reactor Design Soucy G, Jurewicz JW, Boulos MI |
| 711 - 720 |
Chemically Assisted Ion-Beam Etching of Silicon and Silicon Dioxide Using SF6 Ray SK, Maiti CK, Lahiri SK |
| 721 - 731 |
Production of N, H, and NH Active Species in N-2-H(2) DC Flowing Discharges Amorim J, Baravian G, Ricard A |