Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.29, No.3 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (6 articles)
173 - 195 |
Oxidation of Acetylene in Atmospheric Pressure Pulsed Corona Discharge Cell Working in the Nanosecond Regime Redolfi M, Aggadi N, Duten X, Touchard S, Pasquiers S, Hassouni K |
197 - 204 |
Plasma Grooving System Using Atmospheric Pressure Surface Discharge Plasma Hamada T, Sakoda T, Otsubo M |
205 - 215 |
NO Conversion by Dielectric Barrier Discharge and TiO2 Catalyst: Effect of Oxygen Jogi I, Bichevin V, Laan M, Haljaste A, Kaambre H |
217 - 228 |
Investigation of Dry Reforming of Methane in a Dielectric Barrier Discharge Reactor Wang Q, Yan BH, Jin Y, Cheng Y |
229 - 240 |
Remote Oxygen and Nitrogen Plasma Inactivation of Staphylococcus aureus: Effects and Mechanisms Zhang Z, Chen JR |
241 - 250 |
4-Chlorophenol Degradation and Hydrogen Peroxide Formation Induced by DC Diaphragm Glow Discharge in an Aqueous Solution Wang L |