화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.29, No.3 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (6 articles)

173 - 195 Oxidation of Acetylene in Atmospheric Pressure Pulsed Corona Discharge Cell Working in the Nanosecond Regime
Redolfi M, Aggadi N, Duten X, Touchard S, Pasquiers S, Hassouni K
197 - 204 Plasma Grooving System Using Atmospheric Pressure Surface Discharge Plasma
Hamada T, Sakoda T, Otsubo M
205 - 215 NO Conversion by Dielectric Barrier Discharge and TiO2 Catalyst: Effect of Oxygen
Jogi I, Bichevin V, Laan M, Haljaste A, Kaambre H
217 - 228 Investigation of Dry Reforming of Methane in a Dielectric Barrier Discharge Reactor
Wang Q, Yan BH, Jin Y, Cheng Y
229 - 240 Remote Oxygen and Nitrogen Plasma Inactivation of Staphylococcus aureus: Effects and Mechanisms
Zhang Z, Chen JR
241 - 250 4-Chlorophenol Degradation and Hydrogen Peroxide Formation Induced by DC Diaphragm Glow Discharge in an Aqueous Solution
Wang L