화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.27, No.3 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (6 articles)

241 - 255 Decomposition of gaseous sulfide compounds in air by pulsed corona discharge
Jarrige J, Vervisch P
256 - 266 Investigation of soot deposition and composition in a radio frequency plasma of benzene
Lee S, Chen HF, Peng JW
267 - 291 Thermodynamic and transport properties of two-temperature oxygen plasmas
Ghorui S, Heberlein JVR, Pfender E
292 - 310 Numerical simulation of the spatiotemporal evolution of a nanoparticle-plasma system
Warthesen SJ, Girshick SL
311 - 336 Correlation of plasma sprayed coating deposition efficiency with volume flux measurements by phase Doppler anemometry (PDA)
Wang P, Yu SCM, Ng HW
337 - 348 Formations of active species and by-products in water by pulsed high-voltage discharge
Bian WJ, Zhou MH, Lei LC