화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.26, No.3 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (8 articles)

205 - 209 The observation of plasma structures in electrolyte solution
Maximov AI, Kuzmicheva LA, Nikiforov AY, Titova JV
211 - 235 Comparison of laminar and turbulent thermal plasma jet characteristics -A modeling study
Cheng K, Chen X, Pan WX
237 - 249 Humidity effect on toluene decomposition in a wire-plate dielectric barrier discharge reactor
Guo YF, Ye DQ, Chen KF, Tian YF
251 - 266 Modification of hexatriacontane by O(2)-N(2) microwave post-discharges
Hody V, Belmonte T, Pintassilgo CD, Poncin-Epaillard F, Czerwiec T, Henrion G, Segui Y, Loureiro J
267 - 276 Preparation and application of Ca0.8Sr0.2TiO3 for plasma activation of CO2
Li RX, Tang Q, Yin S, Sato T
277 - 291 Spectroscopic analysis of a pulsed-laser deposition system for fullerene-like Cn(x) film production
Riascos H, Zambrano G, Prieto P
293 - 318 Modelling of carbon tetrachloride decomposition in oxidative RF thermal plasma
Kovacs T, Turanyi T, Foglein K, Szepvolgyi J
319 - 334 UV absorptance of titanium dioxide thin films by plasma enhanced deposition from mixtures of oxygen and titanium-tetrakis-isopropoxide
Sonnenfeld A, Hauert R, von Rohr PR