화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.22, No.3 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (8 articles)

335 - 350 Reduction of TiO2 with hydrogen plasma
Palmer RA, Doan TM, Lloyd PG, Jarvis BL, Ahmed NU
351 - 369 Comparative calorimetric study of ICP generator with forward-vortex and reverse-vortex stabilization
Gutsol A, Larjo J, Hernberg R
371 - 385 Plasma destruction of ozone depleting substances
Murphy AB, Farmer AJD, Horrigan EC, McAllister T
387 - 400 A laboratory investigation of the reduction of chromium oxide by a reverse-polarity DC plasma-driven molten oxide electrolysis process
Taylor PR, Wang W
401 - 412 Concentration dependence of VOC decomposition by dielectric barrier discharges
Rudolph R, Francke KP, Miessner H
413 - 435 An alternative quantitative analysis of non-equilibrium transport coefficients in argon plasmas
Burm KTAL, Goedheer WJ, Schram DC
437 - 450 Modeling of oxidation during plasma spraying of iron particles
Kolman D, Volenik K
451 - 451 Electron density and energy distributions in the positive DC Corona: Interpretation for Corona-enhanced chemical reactions (vol 22, pg 199, 2002)
Chen J, Davidson JH