Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.20, No.3 Entire volume, number list

ISSN: 0272-4324 (Print)

279 - 297	Transport coefficients of hydrogen and argon-hydrogen plasmas Murphy AB
299 - 324	A computational examination of the sources of statistical variance in particle parameters during thermal plasma spraying Williamson RL, Fincke JR, Chang CH
325 - 342	A proposed process control chart for DC plasma spraying process Ang CB, Ng HW, Yu SCM, Lam YC
343 - 351	Degradation of acetophenone in water by pulsed corona discharges Wen Y, Jiang X
353 - 364	Efficient energy delivery condition from pulse generation circuit to corona discharge reactor Mok YS
365 - 392	An investigation of the positive column of a Cd-Ne glow discharge. I: Steady state Petrova T, Ogoyski A, Petrov GM, Blagoev A
393 - 403	Cleaning of air streams from organic pollutants by plasma-catalytic oxidation Francke KP, Miessner H, Rudolph R
405 - 415	Inductively coupled plasma etching in ICl- and IBr-based chemistries. Part I: GaAs, GaSb, and AlGaAs Hahn YB, Hays DC, Cho H, Jung KB, Lambers ES, Abernathy CR, Pearton SJ, Hobson WS, Shul RJ
417 - 427	Inductively coupled plasma etching in ICl- and IBr-based chemistries. Part II: InP, InSb, InGaP, and InGaAs Hahn YB, Hays DC, Cho H, Jung KB, Lambers ES, Abernathy CR, Pearton SJ, Hobson WS, Shul RJ