Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.17, No.3 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (6 articles)
| 263 - 280 |
Experimental Check of the High-Frequency Behavior of the Electrons in Molecular and Atomic Gas Plasmas Gundermann S, Winkler R |
| 281 - 303 |
On the Mechanisms of Spatial Electron Relaxation in Nonisothermal Plasmas Sigeneger F, Winkler R |
| 305 - 314 |
The Study of Electron-Energy Distribution-Functions, Swarm Parameters, and Transition Rates in N-2+o-2 Plasma Slavik J, Colonna G |
| 315 - 329 |
The Importance of Electron-Molecule Interactions in Free-Free Continuum Emission for Microwave-Discharge CVD Kelkar UM, Gordon MH |
| 331 - 352 |
Computer-Simulation of Added Li Influence on the ICP Properties Holclajtnerantunovic I, Raspopovic Z, Georgijevic V, Tripkovic M |
| 353 - 370 |
Heat-Transfer in RF Plasma Sintering - Modeling and Experiments Tandian NP, Pfender E |