화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.27, No.2 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (8 articles)

115 - 126 Study of mechanism for hexane decomposition with gliding arc gas discharge
Yan JH, Bo Z, Li XD, Du CM, Cen KF, Cheron BG
127 - 139 Deposition of diamond-like carbon films using graphite sputtering in neon dense plasma
Zeb S, Qayyum A, Sadiq M, Shafiq M, Waheed A, Zakaullah M
141 - 162 Modeling study on the entrainment of ambient air into subsonic laminar and turbulent argon plasma jets
Wang HX, Chen X, Pan WX
163 - 176 Floating electrode dielectric barrier discharge plasma in air promoting apoptotic behavior in melanoma skin cancer cell lines
Fridman G, Shereshevsky A, Jost MM, Brooks AD, Fridman A, Gutsol A, Vasilets V, Friedman G
177 - 187 Comparative actions of NiO and TiO2 catalysts on the destruction of phenol and its derivatives in a dielectric barrier discharge
Bubnov AG, Burova EY, Grinevich VI, Rybkin VV, Kim JK, Choi HS
189 - 204 Numerical modeling of an Ar-H-2 radio-frequency plasma reactor under thermal and chemical nonequilibrium conditions
Ye RB, Murphy AB, Ishigaki T
205 - 224 Analytical detectors based on microplasma spectrometry
Miclea M, Franzke J
225 - 240 Influence of the excited states of atomic nitrogen N(D-2), N(P-2) and N(R) on the transport properties of nitrogen. Part II: Nitrogen plasma properties
Sourd B, Andre P, Aubreton J, Elchinger MF