화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.24, No.2 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (10 articles)

137 - 154 NOx removal characteristics in plasma plus catalyst hybrid process
Lee YH, Chung JW, Choi YR, Chung JS, Cho MH, Namkung W
155 - 167 Influence of water vapor on CCl4 and CHCl3 conversion in gliding discharge
Krawczyk K, Ulejczyk B
169 - 188 Chemical vapor deposition of silicon dioxide by direct-current corona discharges in dry air containing octamethylcyclotetrasiloxane vapor: Measurement of the deposition rate
Chen JH, Davidson JH
189 - 216 Polymer-like C : H thin film coating of nanopowders in capacitively coupled RF discharge
Kouprine A, Gitzhofer F, Boulos M, Fridman A
217 - 238 Thermal plasma flow modeling: A simple model for gas heating and acceleration
Meillot E, Guenadou D
239 - 259 Temperature determination in air plasmas with chlorofluorocarboned molecules in the range 2500 K < T < 6000 K: Application to quantitative analysis of elemental pollutants
Gomes AM, Saloum S, Sarrette JP
261 - 284 Measurements of temperatures and electron number density in an argon-nitrogen plasma jet generated by a dc torch-operation close to supersonic threshold
Rajabian M, Gravelle DV, Vacquie S
285 - 305 Measurements of temperature and electron number density in a dc argon-nitrogen plasma torch - Supersonic operation
Rajabian M, Gravelle DV, Vacquie S
307 - 323 Effect of showerhead configuration on coherent Raman spectroscopically monitored pulsed radio frequency plasma enhanced chemical vapor deposited silicon nitride thin films
Phillips B, Rodriguez RG, Lau LD, Steidley SD
325 - 351 Creation of polymerizable species in plasma polymerization
Yasuda H, Yu QS