Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.22, No.2 Entire volume, number list

ISSN: 0272-4324 (Print)

199 - 224	Electron density and energy distributions in the positive DC corona: Interpretation for corona-enhanced chemical reactions Chen JH, Davidson JH
225 - 237	A high-efficiency reactor for the pulsed plasma conversion of methane Yao SL, Suzuki E, Meng N, Nakayama A
239 - 254	Study of SO2 removal using non-thermal plasma induced by dielectric barrier discharge (DBD) Ma HB, Chen P, Zhang ML, Lin XY, Ruan R
255 - 269	Characterization of the active species in the afterglow of a nitrogen and helium atmospheric-pressure plasma Babayan SE, Ding G, Nowling GR, Yang X, Hicks RF
271 - 283	Characteristics of argon laminar DC plasma jet at atmospheric pressure Pan WX, Zhang WH, Ma W, Wu CK
285 - 295	Kinetics of sulfur oxide, sulfur fluoride, and sulfur oxyfluoride anions with ozone Viggiano AA, Arnold ST, Williams S, Miller TM
297 - 311	Measurement of spatial distributions of electron density and electron temperature in direct current glow discharge by double langmuir probes Tao WH, Yasuda HK
313 - 333	Anode magnetron enhanced DC glow discharge processes for plasma surface cleaning and polymerization Tao WH, Yasuda HK