Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.21, No.2 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (6 articles)
| 175 - 200 |
Electron kinetics in nonisothermal plasmas with spatially two-dimensional structures Arndt SC, Uhrlandt D, Winkler R |
| 201 - 223 |
An investigation of the positive column of a Cd-Ne glow discharge: II. Afterglow Petrov GM, Petrova T, Ogoyski A, Blagoev A |
| 225 - 247 |
Studies on gas purification by a pulsed microwave discharge at 2.46 GHz in mixtures of N-2/NO/O-2 at atmospheric pressure Baeva M, Gier H, Pott A, Uhlenbusch J, Hoschele J, Steinwandel J |
| 249 - 264 |
Modeling of the subsonic-supersonic flow and heat transfer in a DC arc plasma torch Han P, Chen X |
| 265 - 277 |
Deposition of diamondlike carbon film and mass spectrometry measurement in CH4/N-2 RF plasma Mutsukura N |
| 279 - 299 |
Temperature distribution in a pilot plasma tundish: Comparison between plasma torch and graphite electrode systems Badie JM, Bertrand P, Flamant G |