| 107 - 121 |
Reactions of Hydrocarbons in a Supersonic Vacuum Plasma-Jet
Pauser H, Schwarzler CG, Laimer J, Stori H |
| 123 - 154 |
DC Plasma Polymerization of Hexamethyldisiloxane
Vanooij WJ, Eufinger S, Guo SY |
| 155 - 167 |
Plasma-Etching of III-V Semiconductors in BCl3 Chemistries .1. GaAs and Related-Compounds
Lee JW, Hong J, Lambers ES, Abernathy CR, Pearton SJ, Hobson WS, Ren F |
| 169 - 179 |
Plasma-Etching of III-V Semiconductors in BCl3 Chemistries .2. InP and Related-Compounds
Lee JW, Hong J, Lambers ES, Abernathy CR, Pearton SJ, Hobson WS, Ren F |
| 181 - 192 |
Optical-Emission Spectroscopy as a Real-Time Diagnostic-Tool for Plasma-Assisted Deposition of Tin
Boumerzoug M, Boudreau M, Mascher P |
| 193 - 206 |
Characterization of an Argon-Hydrogen Microwave-Discharge Used as an Atomic-Hydrogen Source - Effect of Hydrogen Dilution on the Atomic-Hydrogen Production
Thomas L, Jauberteau JL, Jauberteau I, Aubreton J, Catherinot A |
| 207 - 217 |
Comparison Between Gibbs Free-Energy Minimization and Mass-Action Law for a Multitemperature Plasma with Application to Nitrogen
Andre P, Abbaoui M, Bessege R, Lefort A |
| 219 - 249 |
Effects of Process Parameters on Ultrafine SiC Synthesis Using Induction Plasmas
Guo JY, Gitzhofer F, Boulos MI |
| 251 - 262 |
Impact of Copper-Vapor Contamination on Argon Arcs
Akbar S, Etemadi K |
