Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.14, No.2 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (5 articles)
| 87 - 116 |
Hydrogen-Atom Yield in RF and Microwave Hydrogen Discharges Stonge L, Moisan M |
| 117 - 130 |
Atomic-Hydrogen Concentrations in Pulsed Microwave Discharges Used for Diamond Synthesis Laimer J, Matsumoto S |
| 131 - 150 |
Temperature-Dependent Dry-Etching Characteristics of III-V Semiconductors in HBr-Based and HI-Based Discharges Pearton SJ, Ren F, Abernathy CR |
| 151 - 161 |
Structure and Properties of Plasma-Polymerized Thin-Films of Polyaniline Bhat NV, Joshi NV |
| 163 - 192 |
Thermophoretic Force Acting on an Evaporating Particle Suspended in a Rarefield Plasma Xi C, Xin T |