화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.24, No.1 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (8 articles)

1 - 12 Improvement on hydrophilic and hydrophobic properties of glass surface treated by nonthermal plasma induced by silent corona discharge
Yamamoto T, Okubo M, Imai N, Mori Y
13 - 28 Etching mechanism of Pb(Zr,Ti)O-3 thin films in Cl-2/Ar plasma
Efremov AM, Kim DP, Kim KT, Kim CI
29 - 40 Use of neural network to control a refractive index of SiN film deposited by plasma enhanced chemical vapor deposition
Kim B, Kim S, Hong WS
41 - 56 Nondestructive analysis of metallic elements in diesel soot collected on filter: Benefits of laser induced breakdown spectroscopy
Lombaert K, Morel S, Le Moyne L, Adam P, de Maleissye JT, Amouroux J
57 - 72 Effect of electrical pulse forms on the CO(2) reforming of methane using atmospheric dielectric barrier discharge
Song HK, Lee H, Choi JW, Na BK
73 - 84 Study on arc movement in hollow electrode plasma generators with impressed double magnetic fields
Li MD, Deng WW, Fan YS, Yang JY, Liu XL
85 - 115 Some observations on particle size and velocity measurements using phase Doppler anemometry in plasma spray
Ma J, Yu SCM, Ng HW, Lam YC
117 - 136 Decomposition of cyanogen chloride by using a Packed Bed Plasma Reactor at dry and wet air in atmospheric pressure
Park MK, Ryu SG, Park HB, Lee HW, Hwang KC, Lee CH