화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.22, No.1 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (10 articles)

1 - 25 Wire-arc spray Modeling
Kelkar M, Heberlein J
27 - 58 Three-dimensional modeling of the turbulent plasma jet impinging upon a flat plate and with transverse particle and carrier-gas injection
Li HP, Chen X
59 - 84 Dynamics of splat formation in plasma spray coating process
Mostaghimi J, Pasandideh-Fard M, Chandra S
85 - 104 Effects of copper vapor on heat transfer from atmospheric nitrogen plasma to a molten metal anode
Furukawa S, Amakawa T, Adachi K
105 - 136 Plasma thermal conversion of methane to acetylene
Fincke JR, Anderson RP, Hyde T, Detering BA, Wright R, Bewley RL, Haggard DC, Swank WD
137 - 157 Tunable diode laser absorption studies of hydrocarbons in RF plasmas containing hexamethyldisiloxane
Ropcke J, Revalde G, Osiac M, Li K, Meichsner J
159 - 174 ECR plasma in growth of cubic GaN by low pressure MOCVD
Gu B, Xu Y, Qin FW, Wang SS, Sui Y, Wang ZG
175 - 185 Degradation of 4-chlorophenol by high-voltage pulse corona discharges combined with ozone
Wen YZ, Jiang XZ, Liu WP
187 - 195 Effects of water vapor and ammonia on SO2 removal from flue gases using pulsed corona discharge
Zhu YM, Chae JO, Kim KY, Kim KO, Park YK
197 - 197 Studies on gas purification by a pulsed microwave discharge at 2.46 GHz in mixtures of N-2/NO/O-2 at atmospheric pressure (vol 21, pg 225, 2001)
Baeva M, Gier H, Pott A, Uhlenbusch J, Hoschele J, Steinwandel J