Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.21, No.1 Entire volume, number list

ISSN: 0272-4324 (Print)

1 - 21	Diagnostics of an RF plasma flash evaporation process using the monochromatic imaging technique Buchner P, Schubert H, Uhlenbusch J, Weiss M
23 - 35	Generation of long, laminar plasma jets at atmospheric pressure and effects of flow turbulence Pan WX, Zhang WH, Zhang WH, Wu CK
37 - 63	Characterization of the converging jet region in a triple torch plasma reactor Asmann M, Wank A, Kim H, Heberlein J, Pfender E
65 - 82	Experimental testing of a curvilinear gas shroud nozzle for improved plasma spraying Thomson I, Pershin V, Mostaghimi J, Chandra S
83 - 105	A new modified pseudoequilibrium calculation to determine the composition of hydrogen and nitrogen plasmas at atmospheric pressure Andre P, Aubreton J, Elchinger MF, Fauchais P, Lefort A
107 - 137	From chemical kinetics to streamer corona reactor and voltage pulse generator Yan K, van Heesch EJM, Pemen AJM, Huijbrechts PAHJ
139 - 147	Rate coefficient for self-association reaction of CF2 radicals determined in the afterglow of low-pressure C4F8 plasmas Suzuki C, Sasaki K, Kadota K
149 - 161	A simplified model for the etch rate of novolac-based photoresist Bray RP, Rhinehart RR
163 - 174	A method of mechanistic model validation with a case study in plasma etching Bray RP, Rhinehart RR