Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.18, No.1 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (7 articles)
| 1 - 27 |
New method to calculate thermodynamic and transport properties of a multi-temperature plasma : Application to N-2 plasma Aubreton J, Elchinger MF, Fauchais P |
| 29 - 52 |
A thermodynamic analysis of nonequilibrium argon plasma torches Chen K, Eddy TL |
| 53 - 71 |
Thermally induced measurement error by a water-cooled enthalpy probe Jankovic M, Mostaghimi J |
| 73 - 89 |
A three-dimensional two-phase model for thermal plasma chemical vapor deposition with liquid feedstock injection Kolman D, Heberlein J, Pfender E |
| 91 - 111 |
Combined effects of pulsed discharge removal of NO, SO2, and NH3 from flue gas van Veldhuizen EM, Zhou LM, Rutgers WR |
| 113 - 136 |
On the kinetic study of the electron velocity distribution function in the cathode region of a glow discharge Petrov G, Winkler R |
| 137 - 151 |
High reactivity of CH2 radical in an AR-CH4 post-discharge Jauberteau JL, Thomas L, Aubreton J, Jauberteau I, Catherinot A |