Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.28, No.6 Entire volume, number list

ISSN: 1071-1023 (Print)

In this Issue (171 articles)

L61 - L63	Sputtering of (001) AlN thin films: Control of polarity by a seed layer Milyutin E, Harada S, Martin D, Carlin JF, Grandjean N, Savu V, Vaszquez-Mena O, Brugger J, Muralt P
1081 - 1085	Different growth mechanisms of vertical carbon nanotubes by rf- or dc-plasma enhanced chemical vapor deposition at low temperature Wang HY, Moore JJ
1086 - 1092	Influence of the tip work function on scanning tunneling microscopy and spectroscopy on zinc doped GaAs Wijnheijmer AP, Garleff JK, van der Heijden MA, Koenraad PM
1093 - 1096	Field-emission of TiSi(2) thin film deposited by an in situ chloride-generated route Hu YM, Li Y, Zhu MY, Hu Z, Yu LS
1097 - 1099	Characterization of electrodeposited Ni-Fe-SiC alloys for microelectromechanical applications Zheng XH, Chen X, Gu F, Liu YW, Lee DW
1100 - 1103	UV ozone passivation of the metal/dielectric interface for HfO2-based organic thin film transistors Tang WM, Ng WT, Helander MG, Greiner MT, Lu ZH
1104 - 1110	Surface and near-surface modifications of ultralow dielectric constant materials exposed to plasmas under sidewall-like conditions Kuo MS, Oehrlein GS
1111 - 1119	Growth of size and density controlled GaAs/InxGa1-xAs/GaAs (x=0.10) nanowires on anodic alumina membrane-assisted etching of nanopatterned GaAs Gunawan AA, Jha S, Kuech TF
1120 - 1124	Complex dielectric function and refractive index spectra of epitaxial CdO thin film grown on r-plane sapphire from 0.74 to 6.45 eV Choi SG, Zuniga-Perez J, Munoz-Sanjose V, Norman AG, Perkins CL, Levi DH
1125 - 1131	Formation of three-dimensional and nanowall structures on silicon using a hydrogen-assisted high aspect ratio etching Azimi S, Mehran M, Amini A, Vali A, Mohajerzadeh S, Fathipour M
1132 - 1137	Statistical-noise effect on discrete power spectrum of line-edge and line-width roughness Hiraiwa A, Nishida A
1138 - 1142	Defect-free etching process for GaAs/AlGaAs hetero-nanostructure using chlorine/argon mixed neutral beam Wang XY, Huang CH, Ohno Y, Igarashi M, Murayama A, Samukawa S
1143 - 1147	Effect of Al doping on resistive switching behavior of NiOx films for nonvolatile memory application Kim J, Na H, Oh J, Ko DH, Sohn H
1148 - 1152	Mechanical and electronic characteristics of scanning probe microscopy probes based on coaxial palladium nanowire/carbon nanotube hybrid structures Clark IT, Rius G, Matsuoka Y, Yoshimura M
1153 - 1157	CO(2) laser treatment for stabilization of the superhydrophobicity of carbon nanotube surfaces Ramos SC, Vasconcelos G, Antunes EF, Lobo AO, Trava-Airoldi VJ, Corat EJ
1158 - 1163	Dose loss of phosphorus due to interface segregation in silicon-on-insulator substrates Chang RD, Ma CC, Tsai JR
1164 - 1168	Influence of surface treatment and interface layers on electrical spin injection efficiency and transport in InAs Zhu L, Yua ET
1169 - 1172	Electron detection performance of diamond avalanche diode Morishita H, Ohshima T, Hatano M, Iwakaji Y, Maida O, Ito T
1173 - 1178	Thin film transistors with a ZnO channel and gate dielectric layers of HfO2 by atomic layer deposition Grundbacher R, Chikkadi K, Hierold C
1179 - 1186	Silicon nitride hardmask fabrication using a cyclic CHF3-based reactive ion etching process for vertical profile nanostructures Kaspar P, Jeyaram Y, Jackel H, Foelske A, Kotz R, Bellini S
1187 - 1194	Hydrogen etching and cutting of multiwall carbon nanotubes Behr MJ, Gaulding EA, Mkhoyan KA, Aydil ES
1195 - 1201	Controlled sacrificial sidewall surface micromachining for the release of high length-to-thickness aspect ratio bridges Raum CR, Tait RN, Gauthier R
1202 - 1205	Field emission stability and properties of simultaneously grown microcrystalline diamond and carbon nanostructure films Uppireddi K, Weiner BR, Morell G
1206 - 1209	Electron beam induced etching of silicon with SF(6) Vanhove N, Lievens P, Vandervorst W
1210 - 1214	Simultaneous observation of surface topography and elasticity at atomic scale by multifrequency frequency modulation atomic force microscopy Naitoh Y, Ma ZM, Li YJ, Kageshima M, Sugawara Y
1215 - 1221	Nonlinearities in depth profiling nanometer layers Seah MP, Mulcahy CPA, Biswas S
1222 - 1230	Challenges in the fabrication of an optical frequency ground plane cloak consisting of silicon nanorod arrays Blair J, Brown D, Tamma VA, Park W, Summers C
1231 - 1234	Ni full-filling into Al(2)O(3)/Al film with etched tunnels using a polyethylene glycol solution bath in electroless-plating Jang JH, Lee CH, Choi WS, Kim NJ, Kim TY, Kim TY, Kim JH, Park C, Suh SJ
1235 - 1238	Antimonide-based depletion-mode metal-oxide-semiconductor field-effect transistors using small-bandgap InAs channel layers Lin HK, Liau GY, Liu HK
1239 - 1241	Impact of exposure doses on demolding process in UV nanoimprint lithography Tanabe T, Fujii N, Matsue M, Kawata H, Hirai Y
1242 - 1250	Statistical-noise effect on autocorrelation function of line-edge and line-width roughness Hiraiwa A, Nishida A
1251 - 1258	Thin polymer films viscosity measurements from nanopatterning method Leveder T, Landis S, Chaix N, Davoust L
1259 - 1266	Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer Naulleau PP, Gallatin GM
1267 - 1270	Performance and reliability analysis of p-type metal-oxide-semiconductor field effect transistors with various combinations of Ru and Al gate metal Park HB, Park CS, Kang CY, Song SC, Lee BH, Kim TW, Jang TY, Kim DH, Jeong JK, Choi R
1271 - 1273	Structural and optical properties of self-assembled InAs quantum dot molecules on GaAs substrates Tian P, Huang LR, Yu Y, Huang DX
1274 - 1278	Fabrication and field emission of carbon nanotubes/TiO(2)/Ti composite nanostructures Chen JB, Wang CW, Guo RS, Wang LQ, Zhu WD, Zhou F, Liu WM
1279 - 1283	Atomic resolution force microscopy imaging on a strongly ionic surface with differently functionalized tips Arai T, Gritschneder S, Troger L, Reichling M
1284 - 1286	Electron field emission from well-aligned GaP nanotips Lo HC, Tsai JTH, Leu JP, Chen CF
1287 - 1297	Sputtering behavior and evolution of depth resolution upon low energy ion irradiation of GaAs Hopstaken MJP, Gordon MS, Pfeiffer D, Sadana DK, Topuria T, Rice PM, Gerl C, Richter M, Marchiori C
1298 - 1303	Relaxation of misfit strain in silicon-germanium, Si(1-x)Ge(x). films during dry oxidation Yoo JH, Kim SW, Min BG, Sohn H, Ko DH, Cho MH
1304 - 1313	Quantifying reaction spread and x-ray exposure sensitivity in hydrogen silsesquioxane latent resist patterns with x-ray spectromicroscopy Caster AG, Kowarik S, Schwartzberg AM, Leone SR, Tivanski A, Gilles MK
1314 - 1317	Reduction of spin-flip scattering in metallic nonlocal spin valves Zou H, Wang XJ, Ji Y
1318 - 1321	Single-walled carbon nanotube alignment by grating-guided electrostatic self-assembly Li HF, Sun D, Sue HJ, Cheng X
1322 - 1325	Moisture effect on electromigration characteristics for copper dual damascene interconnection Cheng YL, Chang WY, Wang YL
1326 - 1329	Simple derivation of the formula for Sommerfeld supply density used in electron-emission physics and limitations on its use Forbes RG
C6A1 - C6A1	PREFACE Feldman M
C6B1 - C6B6	Argon ion multibeam nanopatterning of Ni-Cu inserts for injection molding Koeck A, Bruck R, Wellenzohn M, Hainberger R, Platzgummer E, Loeschner H, Joechl P, Eder-Kapl S, Ebm C, Czepl P, Kaiblinger K, Pipelka F, Letzkus F, Irmscher M, Heitkamp B
C6B7 - C6B12	Directed assembly of solution processed single-walled carbon nanotubes via dielectrophoresis: From aligned array to individual nanotube devices Stokes P, Khondaker SI
C6C1 - C6C5	High-current electron optical design for reflective electron beam lithography direct write lithography McCord M, Kojima S, Petric P, Brodie A, Sun J
C6C6 - C6C13	Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept Petric P, Bevis C, McCord M, Carroll A, Brodie A, Ummethala U, Grella L, Cheung A, Freed R
C6D1 - C6D4	Direct transformation of a resist pattern into a graphene field effect transistor through interfacial graphitization of liquid gallium Fujita J, Miyazawa Y, Ueki R, Sasaki M, Saito T
C6D5 - C6D10	Fabrication of metal patterns on freestanding graphenoid nanomembranes Beyer A, Turchanin A, Nottbohm CT, Mellech N, Schnietz M, Golzhauser A
C6E1 - C6E10	Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research Goldberg KA, Mochi I
C6F1 - C6F5	Focused chromium ion beam Steele AV, Knuffman B, McClelland JJ, Orloff J
C6F6 - C6F9	Analysis of subsurface beam spread and its impact on the image resolution of the helium ion microscope Sijbrandij S, Notte J, Sanford C, Hill R
C6G1 - C6G4	Blanking characteristics of a miniature electron beam column Silver CS, Spallas JP, Muray LP
C6G5 - C6G10	Multibeam scanning electron microscope: Experimental results Mohammadi-Gheidari A, Hagen CW, Kruit P
C6H1 - C6H5	Application of analytic scanning electron microscopy to critical dimensions metrology at nanometer scale Babin S, Bay K, Hwu JJ
C6H6 - C6H10	Linewidth metrology for sub-10-nm lithography Thoms S, Macintyre DS
C6I1 - C6I6	Three-dimensional microfluidic mixers using ion beam lithography and micromachining Palacios E, Ocola LE, Joshi-Imre A, Bauerdick S, Berse M, Peto L
C6I7 - C6I10	Fabricating millimeter to nanometer sized cavities concurrently for nanofluidic devices Devlin NR, Brown DK
C6J1 - C6J7	Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography Erdmann A, Shao F, Evanschitzky P, Fuhner T
C6J8 - C6J12	High accuracy electron beam model development in MICHELLE: eBEAM Ovtchinnikov SG, Cooke SJ, Shtokhamer R, Vlasov AN, Mkrtchyan MM, Kostas C, Petillo JJ, Levush B
C6K1 - C6K7	Fabrication of three-dimensional structures for the assessment of cell mechanical interactions within cell monolayers Fuard D, Moussus M, Tomba C, Peyrade D, Nicolas A
C6K8 - C6K12	Texturing of silicon using a microporous polymer etch mask Korivi NS, Hoffpauir J, Ajmera PK
C6L1 - C6L5	Low damage fully self-aligned replacement gate process for fabricating deep sub-100 nm gate length GaAs metal-oxide-semiconductor field-effect transistors Li X, Bentley S, McLelland H, Holland MC, Zhou H, Thoms S, Macintyre DS, Thayne IG
C6L6 - C6L8	Platinum single-electron transistors with tunnel barriers made by atomic layer deposition George HC, Orlov AO, Snider GL
C6L9 - C6L13	Si single electron transistor fabricated by chemical mechanical polishing Lee YC, Joshi V, Orlov AO, Snider GL
C6M1 - C6M6	Aspects of hybrid pattern definition while combining thermal nanoimprint with optical lithography Scheer HC, Mollenbeck S, Mayer A, Dhima K
C6M7 - C6M11	Defect analysis for patterned media Ye ZM, Fretwell J, Luo K, Ha S, Schmid G, LaBrake D, Resnick DJ, Sreenivasan SV
C6N1 - C6N6	Microelectromechanical systems for biomimetical applications Latif R, Mastropaolo E, Bunting A, Cheung R, Koickal T, Hamilton A, Newton M, Smith L
C6N7 - C6N11	Microfabricated resistive high-sensitivity nanoprobe for scanning thermal microscopy Wielgoszewski G, Sulecki P, Gotszalk T, Janus P, Szmigiel D, Grabiec P, Zschech E
C6O1 - C6O7	On the fabrication of three-dimensional silicon-on-insulator based optical phased array for agile and large angle laser beam steering systems Hosseini A, Kwong D, Zhang Y, Chandorkar SA, Crnogorac F, Carlson A, Fallah B, Bank S, Tutuc E, Rogers J, Pease RFW, Chen RT
C6O8 - C6O10	Tunable optofluidic nano-Bragg microcavity filter Jugessur AS, Dou J, Aitchison JS
C6P1 - C6P5	Batch wafer scale fabrication of passivated carbon nanotube transistors for electrochemical sensing applications Martin-Fernandez I, Borrise X, Lora-Tamayo E, Godignon P, Perez-Murano F
C6P6 - C6P10	Copper-plated 50 nm T-gate fabrication Oxland RK, Li X, Ferguson S, Bentley S, Thayne IG
C6Q1 - C6Q5	Optical and computed evaluation of keyhole diffractive imaging for lensless x-ray microscopy Dai B, Zhu DL, Jaroensri R, Kulalert K, Pianetta P, Pease RFW
C6Q6 - C6Q11	Customized illumination for process window optimization and yield improvement in mask aligner lithography systems Hornung M, Vogler U, Voelkel R
C6S1 - C6S5	Impact of development chemistry on extreme ultraviolet resist performance Gronheid R
C6S6 - C6S11	Comparison of positive tone versus negative tone resist pattern collapse bahavior* Yeh WM, Noga DE, Lawson RA, Tolbert LM, Henderson CL
C6B13 - C6B19	Mechanism and dynamics of block copolymer directed assembly with density multiplication on chemically patterned surfaces Liu GL, Delcambre SP, Stuen KO, Craig GSW, De Pablo JJ, Nealey PF, Nygard K, Satapathy DK, Bunk O, Solak HH
C6B20 - C6B23	Nanostructure fabrication by self-assembly of block copolymers on three-dimensional diamondlike carbon structures Mino H, Kometani R, Warisawa S, Ishihara S
C6B24 - C6B29	Shape control and density multiplication of cylinder-forming ternary block copolymer-homopolymer blend thin films on chemical patterns Kang HM, Detcheverry F, Stuen KO, Craig GSW, de Pablo JJ, Gopalan P, Nealey PF
C6B30 - C6B34	Integration of block copolymer directed assembly with 193 immersion lithography Liu CC, Nealey PF, Raub AK, Hakeem PJ, Brueck SRJ, Han E, Gopalan P
C6C14 - C6C20	5 kV multielectron beam lithography: MAPPER tool and resist process characterization Rio D, Constancias C, Martin M, Icard B, van Nieuwstadt J, Vijverberg J, Pain L
C6C21 - C6C25	Excitation and imaging of resonant optical modes of Au triangular nanoantennas using cathodoluminescence spectroscopy Kumar A, Fung KH, Mabon JC, Chow E, Fang NX
C6C26 - C6C33	Field induced shape and work function modification for the ZrO/W(100) Schottky cathode Liu K, Schwind GA, Swanson LW, Campbell JA
C6C34 - C6C40	Performance characterization of negative resists for sub-10-nm electron beam lithography Bonam R, Verhagen P, Munder A, Hartley J
C6C41 - C6C47	Simulation of scanning electron microscope images taking into account local and global electromagnetic fields Babin S, Borisov SS, Ito H, Ivanchikov A, Suzuki M
C6C48 - C6C57	Simulation of electron beam lithography of nanostructures Stepanova M, Fito T, Szabo Z, Alti K, Adeyenuwo AP, Koshelev K, Aktary M, Dew SK
C6C58 - C6C62	Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist Duan HG, Winston D, Yang JKW, Cord BM, Manfrinato VR, Berggren KK
C6C63 - C6C68	Analysis of surface electromagnetic wave resonant structures for potential application in an array of compact photoelectron sources Choi HJ, Groves TR
C6C69 - C6C73	Inspection of open defects in a thin film transistor-liquid crystal display panel by using a low-energy electron microcolumn Oh TS, Kim DW, Kim YC, Ahn S, Lee GH, Kim HS
C6C74 - C6C79	Brightness limitations of cold field emitters caused by Coulomb interactions Cook B, Verduin T, Hagen CW, Kruit P
C6D11 - C6D14	Study of transport properties in graphene monolayer flakes on SiO2 substrates Tirado JM, Nezich D, Zhao X, Chung JW, Kong J, Palacios T
C6E11 - C6E16	Actinic imaging and evaluation of phase structures on extreme ultraviolet lithography masks Mochi I, Goldberg KA, Huh S
C6E17 - C6E22	Assessing the mask clamping ability of a low thermal expansion material chuck Zeuske JR, Vukkadala P, Engelstad RL, Mikkelson AR, Kalkowski G, Risse S, Mueller S
C6E23 - C6E30	Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning George SA, Naulleau PP, Mochi I, Salmassi F, Gullikson EM, Goldberg KA, Anderson EH
C6E31 - C6E35	Extreme ultraviolet mask surface cleaning effects on lithography process performance George SA, Baclea-an LM, Naulleau PP, Chen RJ, Liang T
C6E36 - C6E41	High transmission pellicles for extreme ultraviolet lithography reticle protection Shroff YA, Leeson M, Yan PY, Gullikson E, Salmassi F
C6F10 - C6F14	Design of a parallel mass spectrometer for focused ion beam columns Khursheed A, Cheong KH, Hoang HQ
C6F15 - C6F21	Gas field ion source and liquid metal ion source charged particle material interaction study for semiconductor nanomachining applications Tan SD, Livengood R, Shima D, Notte J, McVey S
C6F22 - C6F25	Model for nanopillar growth by focused helium ion-beam-induced deposition Alkemade PFA, Chen P, van Veldhoven E, Maas D
C6F26 - C6F30	Ga+ beam lithography for suspended lateral beams and nanowires Henry MD, Shearn M, Scherer A
C6F31 - C6F37	Transmission electron microscopy study of damage layer formed through ion beam induced deposition of platinum on silicon substrate Park BC, Park YC, Lee HJ, Kim YH
C6F38 - C6F41	Piezoresistive effect in the three-dimensional diamondlike carbon nanostructure fabricated by focused-ion-beam chemical vapor deposition Kometani R, Yusa K, Warisawa S, Ishihara S
C6H11 - C6H17	Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale Duan HG, Manfrinato VR, Yang JKW, Winston D, Cord BM, Berggren KK
C6H18 - C6H33	Robust estimation of line width roughness parameters Patel K, Lahiri SN, Spanos CJ
C6H34 - C6H39	Understanding the relationship between true and measured resist feature critical dimension and line edge roughness using a detailed scanning electron microscopy simulator Lawson RA, Henderson CL
C6I11 - C6I13	Nanofluidic channels fabricated by e-beam lithography and polymer reflow sealing Fouad M, Yavuz M, Cui B
C6I14 - C6I19	Rotation speed control of Janus particles by dielectrophoresis in a microfluidic channel Honegger T, Lecarme O, Berton K, Peyrade D
C6J13 - C6J18	Monte Carlo modeling of electron backscattering from carbon nanotube forests Alam MK, Yaghoobi P, Nojeh A
C6J19 - C6J24	Reducing the pattern redundancy in optical proximity correction modeling by analyzing the pattern linearity Li JL, Zhang L, Yan QL, Melvin LS, Lin C, Su E, Tang N
C6K13 - C6K16	Gelatin/glycerol coating to preserve mechanically compliant nanowire electrodes from damage during brain implantation Witteveen JA, Suyatin DB, Gallentoft L, Schouenborg J, Danielsen N, Prinz CN
C6K17 - C6K22	Microfluidics-assisted photo nanoimprint lithography for the formation of cellular bioimprints Nock V, Murray L, Samsuri F, Alkaisi MM, Evans JJ
C6M12 - C6M16	45 nm hp line/space patterning into a thin spin coat film by UV nanoimprint based on condensation Hiroshima H, Wang Q, Youn SW
C6M17 - C6M22	Evaluation of oxygen inhibition for UV-curable resins by adhesion force measurement using scanning probe microscope Okada M, Iwasa M, Miyake H, Ohsaki T, Haruyama Y, Kanda K, Matsui S
C6M23 - C6M27	Assessment of release properties in UV nanoimprint lithography using high-aspect-ratio nanoscale molds Takahashi J, Taniguchi J, Kamiya Y
C6M28 - C6M31	Characterizations of nanoembossed Pb(Zr-0.3, Ti-0.7)O-3 ferroelectric films Shen ZK, Chen ZH, Lu QA, Jiang AQ, Qiu ZJ, Qu XP, Chen YF, Liu R
C6M32 - C6M36	Electrical properties of transferred metal nanopattern using metal oxide release layer Unno N, Taniguchi J, Ide S
C6M37 - C6M40	Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography Schleunitz A, Spreu C, Haatainen T, Klukowska A, Schift H
C6M41 - C6M44	Fabrication of ordered nanospheres using a combination of nanoimprint lithography and controlled dewetting Schleunitz A, Spreu C, Lee J, Schift H
C6M45 - C6M49	Fabrication of seamless three-dimensional roll mold using direct electron-beam writing on rotating cylindrical substrate Taniguchi J, Tsuji S, Aratani M
C6M50 - C6M56	Facile wide-scale defect detection of UV-nanoimprinted resist patterns by fluorescent microscopy Kobayashi K, Kubo S, Matsui S, Nakagawa M
C6M57 - C6M62	High accuracy UV-nanoimprint lithography step-and-repeat master stamp fabrication for wafer level camera application Kreindl G, Glinsner T, Miller R, Treiblmayr D, Fodisch R
C6M63 - C6M67	Hole mobility enhancement by chain alignment in nanoimprinted poly(3-hexylthiophene) nanogratings for organic electronics Zhou M, Aryal M, Mielczarek K, Zakhidov A, Hu W
C6M68 - C6M71	Impact of molecular size on resist filling process in nanoimprint lithography: Molecular dynamics study Taga A, Yasuda M, Kawata H, Hirai Y
C6M72 - C6M76	Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithography Francone A, Iojoiu C, Poulain C, Lombard C, Pepin-Donat B, Boussey J, Zelsmann M
C6M77 - C6M82	Impact of substrate deformation on demolding force for thermal imprint process Kawata H, Watanabe Y, Fujikawa N, Yasuda M, Hirai Y
C6M83 - C6M87	Imprinted quarter wave plate at terahertz frequency Saha SC, Ma Y, Grant JP, Khalid A, Cumming DRS
C6M88 - C6M92	Long-range ordered aluminum oxide nanotubes by nanoimprint-assisted aluminum film surface engineering Noh K, Choi C, Kim JY, Oh Y, Brammer KS, Loya MC, Jin SH
C6M93 - C6M97	Nanofabrication of surface-enhanced Raman scattering device by an integrated block-copolymer and nanoimprint lithography method Yang EL, Liu CC, Yang CYP, Steinhaus CA, Nealey PF, Skinner JL
C6M98 - C6M103	Nanoimprinting for diffractive light trapping in solar cells Weiss DN, Yuan HC, Lee BG, Branz HM, Meyers ST, Grenville A, Keszler DA
C6N12 - C6N17	Micromachined scanning proximal probes with integrated piezoresistive readout and bimetal actuator for high eigenmode operation Woszczyna M, Zawierucha P, Paletko P, Zielony M, Gotszalk T, Sarov Y, Ivanov T, Frank A, Zollner JP, Rangelow IW
C6N18 - C6N23	Piezoelectrically driven silicon carbide resonators Mastropaolo E, Gual I, Wood G, Bunting A, Cheung R
C6O11 - C6O15	Colloidal optical waveguides with integrated local light sources built by capillary force assembly Lecarme O, Rivera TP, Arbez L, Honegger T, Berton K, Peyrade D
C6O16 - C6O20	Resonant coupling to a dipole absorber inside a metamaterial: Anticrossing of the negative index response Smolev S, Ku ZY, Brueck SRJ, Brener I, Sinclair MB, Ten Eyck GA, Langston WL, Basilio LI
C6O21 - C6O25	Fabrication and characterization of coupled metal-dielectric-metal nanoantennas Joshi B, Wen XJ, Sun K, Lu W, Wei QH
C6O26 - C6O29	Fabrication of nanostar arrays by nanoimprint lithography Veres T, Cui B, Clime L
C6O30 - C6O33	Fabrication techniques for three-dimensional metamaterials in the midinfrared Wendt JR, Burckel DB, Ten Eyck GA, Ellis AR, Brener I, Sinclair MB
C6O34 - C6O37	Self-aligned gold nanocone probe tips Zeeb B, Jager S, Schafer C, Nill P, Meixner AJ, Kern DP, Fleischer M
C6O38 - C6O44	Large area three-dimensional photonic crystals with embedded waveguides Raub AK, Brueck SRJ
C6O45 - C6O49	Sub-10 nm patterning of gold nanostructures on silicon-nitride membranes for plasmon mapping with electron energy-loss spectroscopy Koh AL, McComb DW, Maier SA, Low HY, Yang JKW
C6O50 - C6O55	Geometry enhanced asymmetric rectifying tunneling diodes Choi K, Ryu G, Yesilkoy F, Chryssis A, Goldsman N, Dagenais M, Peckerar M
C6O56 - C6O59	Waveguide-plasmon resonances in gold-capped silicon-nitride disk photonic crystal slabs Shyu JH, Lee HM, Chien JH, Wu JC
C6O60 - C6O63	Multilayer pattern transfer for plasmonic color filter applications Kaplan AF, Xu T, Wu YK, Guo LJ
C6P11 - C6P13	Direct synthesis of vertical alpha-Fe2O3 nanowires from sputtered Fe thin film Nagato K, Furubayashi M, Hamaguchi T, Nakao M
C6P14 - C6P17	Pyrolysis of two-dimensional and three-dimensional interferometrically patterned resist structures Burckel DB, Washburn CM, Koleske DD, Polsky R
C6P18 - C6P23	Fabrication and initial characterization of ultrahigh aspect ratio vias in gold using the helium ion microscope Scipioni L, Ferranti DC, Smentkowski VS, Potyrailo RA
C6P24 - C6P29	Fabrication of poly(ethylene glycol) hydrogel structures for pharmaceutical applications using electron beam and optical lithography Bae M, Gemeinhart RA, Divan R, Suthar KJ, Mancini DC
C6P30 - C6P35	Nanofabrication of x-ray zone plates using ultrananocrystalline diamond molds and electroforming Wojcik MJ, Joshi V, Sumant AV, Divan R, Ocola LE, Lu M, Mancini DC
C6P36 - C6P41	Nanomachining and clamping point optimization of silicon carbon nitride resonators using low voltage electron beam lithography and cold development Mohammad MA, Guthy C, Evoy S, Dew SK, Stepanova M
C6P42 - C6P47	Nanoporous ultrananocrystalline diamond membranes Makarova O, Divan R, Moldovan N, Rosenmann D, Tang CM
C6P48 - C6P52	Nanostructured silicon membranes for control of molecular transport Srijanto BR, Retterer ST, Fowlkes JD, Doktycz MJ
C6P53 - C6P58	Semiconductor crystal islands for three-dimensional integration Crnogorac F, Wong S, Pease RFW
C6P59 - C6P65	Structure and properties of polymer core-shell systems: Helium ion microscopy and electrical conductivity studies Bliznyuk V, Pud A, Scipioni L, Huynh C, Ogurtsov N, Ferranti D
C6P66 - C6P69	Noise analysis of carbon nanotube field effect transistors irradiated by electron beam Chan J, Kidd D, Burke B, Harriott L, Williams K
C6P70 - C6P75	Plasma etch fabrication of 60:1 aspect ratio silicon nanogratings with 200 nm pitch Mukherjee P, Bruccoleri A, Heilmann RK, Schattenburg ML, Kaplan AF, Guo LJ
C6Q12 - C6Q19	Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imaging Xie P, Smith BW
C6Q20 - C6Q24	Development of a simple, compact, low-cost interference lithography system Korre H, Fucetola CP, Johnson JA, Berggren KK
C6Q25 - C6Q27	Nondestructive detection of deviation in integrated circuits Baghaei L, Dai B, Pianetta P, Pease RFW
C6S12 - C6S18	High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors Lawson RA, Tolbert LM, Henderson CL
C6S19 - C6S22	Photopatternable inorganic hardmask Telecky A, Xie P, Stowers J, Grenville A, Smith B, Keszler DA
C6S23 - C6S27	Effects of salty-developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense pattern transfer Yan M, Lee J, Ofuonye B, Choi S, Jang JH, Adesida I
C6M104 - C6M107	Nanoimprinted P3HT/C-60 solar cells optimized by oblique deposition of C-60 Yang Y, Aryal M, Mielczarek K, Hu W, Zakhidov A
C6M108 - C6M113	Process-simulation system for UV-nanoimprint lithography Shibata M, Horiba A, Nagaoka Y, Kawata H, Yasuda M, Hirai Y
C6M114 - C6M121	Rapid patterning of spin-on-glass using ultrasonic nanoimprint Mekaru H, Takahashi M
C6M122 - C6M124	Rapid thermal imprinting of high-aspect-ratio nanostructures with dynamic heating of mold surface Nagato K, Hattori S, Hamaguchi T, Nakao M
C6M125 - C6M129	Residual layer uniformity using complementary patterns to compensate for pattern density variation in UV nanoimprint lithography Wang Q, Hiroshima H, Atobe H, Youn SW
C6M130 - C6M135	Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications Yu ZN, Hwu J, Liu YD, Su ZP, Yang H, Wang HY, Hu W, Xu YA, Kurataka N, Hsu YZ, Lee SF, Gauzner G
C6M136 - C6M139	Sputtering with an etch-free lift-off in thermal nanoimprint lithography Mayer A, Bogdanski N, Mollenbeck S, Dhima K, Papenheim M, Scheer HC