Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.25, No.6 Entire volume, number list

ISSN: 1071-1023 (Print)

In this Issue (180 articles)

1743 - 1761	Extreme ultraviolet lithography: A review Wua BQ, Kumar A
1762 - 1770	Effect of process parameters on via formation in Si using deep reactive ion etching Abhulimen IU, Polamreddy S, Burkett S, Cai L, Schaper L
1771 - 1775	Fabrication of a Fresnel zone plate through electron beam lithographic process and its application to measuring of critical dimension scanning electron microscope performance Kim J, Jalhadi K, Lee SY, Joy DC
1776 - 1784	Defects in HgTe grown by molecular beam epitaxy on (211)B-oriented CdZnTe substrates Selvig E, Tonheim CR, Kongshaug KO, Skauli T, Lorentzen T, Haakenaasen R
1785 - 1788	Enhanced field emission from carbon nanotubes with a thin layer of low work function barium strontium oxide surface coating Jin F, Liu Y, Day CM, Little SA
1789 - 1793	Development of chemical-mechanical polished high-resolution zone plates Rehbein S, Guttmann P, Werner S, Schneider G
1794 - 1798	Electrical properties and deep traps in ZnO films grown by molecular beam epitaxy Polyakov AY, Smirnov NB, Belogorokhov AI, Govorkov AV, Kozhukhova EA, Osinsky AV, Xie JQ, Hertog B, Pearton SJ
1799 - 1803	Proposed single layer composite film used as high transmission phase shifting masks for the 32, 45, and 65 nm technology nodes Lai FD, Huang JL
1804 - 1807	Critical parameter determination of sonic flow controller diamond microtubes and micronozzles Mammana SS, Degasperia FT, Salvadori MC, Sparapani DC, Laino MF, Rangel RC, Teixeira FS, Cattani M
1808 - 1813	On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during SiO2 etching process Jinnai B, Orita T, Konishi M, Hashimoto J, Ichihashi Y, Nishitani A, Kadomura S, Ohtake H, Samukawa S
1814 - 1818	Influence of RuO2 nanoparticles on electron emission from carbon nanotubes Liua HR, Noguchi T, Kato S
1819 - 1822	Yield improvement of 0.13 mu m Cu/low-k dual-damascene interconnection by organic cleaning process Kim NH, Kim SY, Lee HK, Lee KY, Kim CI, Chang EG
1823 - 1826	Growth of ZnSe nanowires by pulsed-laser deposition Zhang TW, Shen YQ, Hu W, Sun J, Wu J, Ying ZF, Xu N
1827 - 1831	Fabrication of periodic microstructures on flexible polyimide membranes Shelton DJ, Tharp JS, Zummo G, Folks WR, Boreman GD
1832 - 1835	Evolution of surface morphology of GaN thin films during photoelectrochemical etching Leach JH, Ozgur U, Morkoc H
1836 - 1841	C-doped semi-insulating GaNHFETs on sapphire substrates with a high breakdown voltage and low specific on-resistance Choi YC, Shi J, Pophristic M, Spencer MG, Eastman LF
1842 - 1846	Large-scale growth of single-walled carbon nanotubes using cold-wall chemical vapor deposition Shin KY, Lee CT, Kao JS, Kei CC, Chang CM, Hsiao CN, Liang JH, Leou KC, Tsai CH
1847 - 1852	Formation of single crystal sulfur supersaturated silicon based junctions by pulsed laser melting Tabbal M, Kim T, Warrender JM, Aziz MJ, Cardozo BL, Goldman RS
1853 - 1858	Effects and mechanisms of nitrogen incorporation into hafnium oxide by plasma immersion implantation Wong H, Sen B, Yang BL, Huang AP, Chu PK
1859 - 1866	Characterization of ruthenium thin films as capping layer for extreme ultraviolet lithography mask blanks Yan PY, Spiller E, Mirkarimi P
1867 - 1869	Zero-dimensional analysis for discharge characteristics Park W
1870 - 1874	Highly selective zero-bias plasma etching of GaN over AlGaN Schuette ML, Lu W
1875 - 1881	Structural and optical characterization of WO3 nanorods/films prepared by oblique angle deposition Smith W, Zhang ZY, Zhao YP
1882 - 1887	Ion energy control at substrates during plasma etching of patterned structures Silapunt R, Wendt AE, Kirmse KHR
1888 - 1891	Thermal model for a superstrate cooling apparatus for an integrated in-line manufacturing process for thin film photovoltaic devices Enzenroth RA, Barth KL, Sampath WS, Manivannan V
1892 - 1895	Structure and magnetic property of c-axis oriented L1(0)-FePt nanoparticles on TiN/a-Si underlayers Tsuji Y, Noda S, Yamaguchi Y
1896 - 1898	Influence of different surface-passivation dielectrics on high-temperature strain relaxation of AlGaN in AlGaN/GaN heterostructures Chen DJ, Tao YQ, Chen C, Xie ZL, Zhai ZY, Wu XS, Han P, Zhang R, Zheng YD
1899 - 1902	Effects of surface plasmon resonant scattering on the power conversion efficiency of organic thin-film solar cells Chang YC, Chou FY, Yeh PH, Chen HW, Chang SH, Lan YC, Guo TF, Tsai TC, Lee CT
1903 - 1908	Optimized plasma-deposited fluorocarbon coating for dry release and passivation of thin SU-8 cantilevers Keller S, Haefliger D, Boisen A
1909 - 1915	Structural characteristics of single-crystal nanowires grown by self-catalytic chemical vapor deposition method He MQ, Mohammad SN
1916 - 1921	Atomic diffusion and electronic structure in Al0.52In0.48P/GaAs heterostructures Smith PE, Lueck M, Ringel SA, Brillson LJ
1922 - 1927	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures Kim S, Woo S, Kim H, Jeong W, Park T, Kim H, Kim SB, Jeon H
1928 - 1940	Mechanisms of porous dielectric film modification induced by reducing and oxidizing ash plasmas Posseme N, Chevolleau T, David T, Darnon M, Louveau O, Joubert O
1953 - 1957	Graphoepitaxial cylindrical block copolymer nanodomains evaluated as bit patterned media template Xiao SG, Yang XM
1958 - 1962	Imaging layers for the directed assembly of block copolymer films: Dependence of the physical and chemical properties of patterned polymer brushes on brush molecular weight Stuen KO, In I, Han E, Streifer JA, Hamers RJ, Nealey PF, Gopalan P
1963 - 1968	Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching Liu CC, Nealey PF, Ting YH, Wendt AE
1969 - 1975	Exploring the manufacturability of using block copolymers as resist materials in conjunction with advanced lithographic tools Craig GSW, Nealey PF
1976 - 1981	Submicron aligned wafer bonding via capillary forces Tupek MR, Turner KT
1982 - 1984	Creation of sub-20-nm contact using diblock copolymer on a 300 mm wafer for complementary metal oxide semiconductor applications Li WK, Yang S
1985 - 1988	Nanostructures using self-assembled multilayers as molecular rulers and etch resists Srinivasan C, Hohman JN, Anderson ME, Weiss PS, Horn MW
1989 - 1992	Rapid partial melt crystallization of silicon for monolithic three-dimensional integration Witte DJ, Pickard DS, Crnogorac F, Pianetta P, Pease RFW
1993 - 1997	Surface energy induced patterning of organic and inorganic materials on heterogeneous Si surfaces Tao L, Crouch A, Yoon F, Lee BK, Guthi JS, Kim J, Gao J, Hu W
1998 - 2003	Influence of the development process on ultimate resolution electron beam lithography, using ultrathin hydrogen silsesquioxane resist layers Grigorescu AE, van der Krogt MC, Hagen CW, Kruit P
2004 - 2007	Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications Feng Y, Feser M, Lyon A, Rishton S, Zeng XH, Chen S, Sassolini S, Yun WB
2008 - 2012	Accurate control of remaining resist depth for nanoscale three-dimensional structures in electron-beam grayscale lithography Lee SY, Anbumony K
2013 - 2016	Optimal temperature for development of poly(methylmethacrylate) Cord B, Lutkenhaus J, Berggren KK
2017 - 2019	Imaging with surface sensitive backscattered electrons Luo T, Khursheed A
2020 - 2024	Novel magnetic microstigmator for electron beam astigmatism correction in the electron beam microcolumn system Rong R, Kim HS, Park SS, Hwang NW, Park KW, Jin SW, Ahn CH
2025 - 2029	Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography Yang JKW, Berggren KK
2030 - 2033	Sub-30-nm hybrid lithography (electron beam/deep ultraviolet) and etch process for fully depleted metal oxide semiconductor transistors Pauliac-Vaujour S, Brianceau P, Landis S, Chiaroni J, Faynot O
2034 - 2037	Enhanced stitching for the fabrication of photonic structures by electron beam lithography Gnan M, Macintyre DS, Sorel M, De la Rue RM, Thoms S
2038 - 2040	Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications Hohle C, Arndt C, Choi KH, Kretz J, Lutz T, Thrum F, Keil K
2041 - 2044	Patterning issues in superconducting nanowire single photon detector fabrication Constancias C, de Lamaestre RE, Cavalier OLP, Villegier JC
2045 - 2048	Influence of temperature on HSQ electron-beam lithography Haffner M, Haug A, Heeren A, Fleischer M, Peisert H, Chasse T, Kern DP
2049 - 2054	Extracting the Boersch effect contribution from experimental energy spread measurements for Schottky electron emitters Bronsgeest MS, Barth JE, Schwind GA, Swanson LW, Kruit P
2055 - 2058	Multilayer phase-only diffraction gratings: Fabrication and application to extreme ultraviolet optics Salmassi F, Gullikson EM, Anderson EH, Naulleau PP
2059 - 2063	Process characterization of inductively coupled plasma etched silicon nanopillars by micro-Raman Laws GM, Handugan A, Eschrich T, Boland P, Sinclair C, Myhajlenko S, Poweleit CD
2064 - 2067	Improving electron beam resist sensitivity by preexposure to deep ultraviolet radiation Murali R, Brown D, Martin KP, Meindl JD
2068 - 2071	Fabrication of spiral-phase diffractive elements using scanning-electron-beam lithography Tsai HY, Smith HI, Menon R
2072 - 2076	Real-time spatial-phase locking for vector-scan electron beam lithography Yang Y, Hastings JT
2077 - 2080	Metal-semiconductor-metal electron detectors Aldana R, Pease RF
2081 - 2084	Nanometer-scale gaps in hydrogen silsesquioxane resist for T-gate fabrication Jin N, Choi S, Wang L, Chen G, Kim D, Kumar V, Adesida I
2085 - 2088	Effects of developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense silicon nanowire fabrication Choi S, Jin N, Kumar V, Adesida I, Shannon M
2089 - 2093	Extreme ultraviolet lithography: From research to manufacturing La Fontaine B, Deng Y, Kim RH, Levinson HJ, Okoroanyanwu U, Sandberg R, Wallow T, Wood O
2094 - 2097	Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers Wachulak PW, Capeluto MG, Marconi MC, Patel D, Menoni CS, Rocca JJ
2098 - 2103	Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks Liang T, Ultanir E, Zhang G, Park SJ, Anderson E, Gullikson E, Naulleau P, Salmassi F, Mirkarimi P, Spiller E, Baker S
2104 - 2109	Evaluation of surface roughness of Zerodur (R) substrates machined by Ar+ ion beam with energy of 3-10 keV Kurashima Y, Uozumi R, Miyamoto I, Ando M, Numata A
2110 - 2113	Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics Kanaoka M, Liu C, Nomura K, Ando M, Takino H, Fukuda Y, Mimura H, Yamauchi K, Mori Y
2114 - 2117	Estimation of diffusion lengths of acid and quencher in chemically amplified resist on the basis of extreme ultraviolet exposure results Tanaka Y, Kikuchi Y, Goo D, Oizumi H, Nishiyama I
2118 - 2122	In situ x-ray absorption near-edge structure analysis for extreme ultraviolet lithography projection optics contamination Niibe M, Kakutani Y, Koida K, Matsunari S, Aoki T, Terashima S, Takase H, Murakami K, Fukuda Y
2123 - 2126	Bit-array patterns with density over 1 Tbit/in.(2) fabricated by extreme ultraviolet interference lithography Solak HH, Ekinci Y
2127 - 2131	Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy Lorusso GF, Goethals AM, Jonckheere R, Hermans J, Ronse K, Myers AM, Niroomand A, Kim I, Niroomand A, Iwamoto F, Ritter D
2132 - 2135	Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool Naulleau PP, Anderson CN, Dean K, Denham P, Goldberg KA, Hoef B, Niakoula D, La Fontaine B, Wallow T
2136 - 2139	Effects of photoacid generator incorporation into the polymer main chain on 193 nm chemically amplified resist behavior and lithographic performance Lee CT, Henderson CL, Wang MX, Gonsalves KE, Yueh W
2140 - 2144	Influence of solubility switching mechanism on resist performance in molecular glass resists Lawson RA, Lee CT, Henderson CL, Whetsell R, Tolbert L, Yueh W
2145 - 2150	Progress in extreme ultraviolet interferometric and holographic lithography Isoyan A, Cheng YC, Jiang F, Wallace J, Cerrinab F, Bollepalli S
2151 - 2154	Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool Anderson CN, Naulleau PP, Denham P, Kemp D, Rekawa S
2155 - 2161	Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance for extreme ultraviolet lithography Sogard MR, Mikkelson AR, Nataraju M, Turner KT, Engelstad RL
2162 - 2167	Production of noble gas ion beams in a focused ion beam machine using an electron beam ion trap Ullmann F, Grossmann F, Ovsyannikov VP, Gierak J, Bourhis E, Ferre J, Jamet JP, Mougin A, Zschornack G
2168 - 2170	Fabrication of zinc nanotip arrays by ion beam sputtering Chao LC, Liau CC, Lee JW, Tsai FC
2171 - 2174	Fabrication of three-dimensional structures of resist by proton beam writing Furuta Y, Uchiya N, Nishikawa H, Haga J, Sato T, Oikawa M, Ishii Y, Kamiya T
2175 - 2179	Focused ion beam iodine-enhanced etching of high aspect ratio holes in InP photonic crystals Callegari V, Nellen PM, Kaufmann J, Strasser P, Robin F
2180 - 2183	Deposition of carbonaceous structures using focused Au and Si ion-beam-induced chemical vapor deposition methods Okada R, Yo T, Yanagisawa J, Matsui S
2184 - 2187	Membrane folding by helium ion implantation for three-dimensional device fabrication Arora WJ, Sijbrandij S, Stern L, Notte J, Smith HI, Barbastathis G
2188 - 2191	Design studies for a high brightness, energetic neutral atom source for proximity lithography Guo HJ, Craver B, Reynolds J, Wolfe JC
2192 - 2195	Mechanical nanostepping for atom beam lithography Craver B, Roy A, Nounu H, Wolfe JC
2196 - 2201	Fabrication of a needle array using a Si gray mask for x-ray lithography Mekaru H, Takano T, Awazu K, Takahashi M, Maeda R
2202 - 2209	Challenges in 1 Teradot/in.(2) dot patterning using electron beam lithography for bit-patterned media Yang X, Xiao S, Wu W, Xu Y, Mountfield K, Rottmayer R, Lee K, Kuo D, Weller D
2210 - 2214	In situ monitoring and control of material growth for high resolution electron beam induced deposition van Dorp WF, Hagen CW, Crozier PA, Kruit P
2215 - 2218	Redeposition characteristics of focused ion beam milling for nanofabrication Winter DAM, Mulders JJL
2219 - 2223	Resolution in focused electron- and ion-beam induced processing Utke I, Friedli V, Purrucker M, Michler J
2224 - 2227	Fabrication of 22 nm half-pitch silicon lines by single-exposure self-aligned spatial-frequency doubling Raub AK, Li D, Frauenglass A, Brueck SRJ
2228 - 2232	Focused electron beam induced deposition of nickel Perentes A, Sinicco G, Boero G, Dwir B, Hoffmann P
2233 - 2238	Oxygen assisted focused electron beam induced deposition of Si-containing materials: Growth dynamics Perentes A, Hoffmann P
2239 - 2244	High brightness 100-electron-beam source for high-resolution applications Zhang Y, Kruit P
2245 - 2249	Cathode ray tube type electron gun as a source for multibeam electron lithography van den Brom AJ, van Veen AHV, Weeda WM, Berglund GZM, Wieland M, Kruit P
2250 - 2254	Annealing of electron beam induced deposits of platinum from Pt(PF3)(4) Ervin MH, Chang D, Nichols B, Wickenden A, Barry J, Melngailis J
2255 - 2257	Electrospun DNA nanofibers Bellan LM, Strychalski EA, Craighead HG
2258 - 2265	Multiple beam sub-80-nm lithography with miniature electron beam column arrays Silver CS, Spallas JP, Muray LP
2266 - 2270	CsBr/GaN heterojunction photoelectron source Maldonado JR, Liu Z, Sun Y, Schuetter S, Pianetta P, Pease RFW
2271 - 2276	Subwavelength proximity nanolithography using a plasmonic lens Seo S, Kim HC, Ko H, Cheng M
2277 - 2283	Monolithic multichannel secondary electron detector for distributed axis electron beam lithography and inspection Pickard DS, Kenney C, Tanimoto S, Crane T, Groves T, Pease RFW
2284 - 2287	Atomic-force lithography with interferometric tip-to-substrate position metrology Moon EE, Kupec J, Mondol MK, Smith HI, Berggren KK
2288 - 2294	Electron beam and optical proximity effect reduction for nanolithography: New results Peckerar M, Sander D, Srivastava A, Foli A, Vishkin U
2295 - 2300	Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography Kozawa T, Tagawa S, Santillan JJ, Toriumi M, Itani T
2301 - 2306	Study of the assist features effect on the through focus behavior in isoline with an innovative method Li JL, Yan QL, Melvin LS
2307 - 2311	Pattern matching, simulation, and metrology of complex layouts fabricated by electron beam lithography Tsikrikas N, Drygiannakis D, Patsis GP, Raptis I, Gerardino A, Stavroulakis S, Voyiatzis E
2312 - 2316	Visualization of mold filling stages in thermal nanoimprint by using pressure gradients Schift H, Bellini S, Mikkelsen MB, Gobrecht J
2317 - 2320	Ultrastiff stage for imprint lithography Jeon Y, Feldman M, Jiang L
2321 - 2324	Chemical nanoimprint lithography for step-and-repeat Si patterning Namatsu H, Oda M, Yokoo A, Fukuda M, Irisa K, Tsurumi S, Komatsu K
2325 - 2328	Optimizing nanoimprint and transfer-bonding techniques for three-dimensional polymer microstructures Park H, Li HF, Cheng X
2329 - 2332	Fabrication of terahertz holograms Walsby ED, Alton J, Worrall CH, Beere HE, Ritchie DA, Leach J, Padgett M, Cumming DRS
2333 - 2336	UV-nanoimprint with the assistance of gas condensation at atmospheric environmental pressure Hiroshima H, Komuro M
2337 - 2340	Fabrication of 3D-photonic crystals via UV-nanoimprint lithography Glinsner T, Lindner P, Muhlberger M, Bergmair I, Schoftner R, Hingerl K, Schmid H, Kley EB
2341 - 2345	Time dependent analysis of the resist deformation in thermal nanoimprint Hirai Y, Onishi Y, Tanabe T, Nishihata M, Iwasaki T, Kawata H, Iriye Y
2346 - 2351	Nanoimprint lithography processes on 200 mm Si wafer for optical application: Residual thickness etching anisotropy Chaix N, Gourgon C, Perret C, Landis S, Leveder T
2352 - 2356	Stretching and selective immobilization of DNA in SU-8 micro- and nanochannels Yang B, Dukkipati VR, Li D, Cardozo BL, Pang SW
2357 - 2360	Fabrication of three dimensional structures for an UV curable nanoimprint lithography mold using variable dose control with critical-energy electron beam exposure Mohamed K, Alkaisi MM, Blaikie RJ
2361 - 2364	Sub-100-nm three-dimensional nanoimprint lithography Unno N, Taniguchi J, Ishii Y
2365 - 2369	Surface characterization of imprinted resist above glass transition temperature Leveder T, Landis S, Davoust L, Soulan S, Tortai JH, Chaix N
2370 - 2372	Micro-nano mixture patterning by thermal-UV novel nanoimprint Okuda K, Niimi N, Kawata H, Hirai Y
2373 - 2378	Benchmarking of 50 nm features in thermal nanoimprint Gourgon C, Chaix N, Schift H, Tormen M, Landis S, Torres CMS, Kristensen A, Pedersen RH, Christiansen MB, Fernandez-Cuesta I, Mendels D, Montelius L, Haatainen T
2379 - 2383	Coarse-grain simulation of viscous flow and stamp deformation in nanoimprint Sirotkin V, Svintsov A, Zaitsev S, Schift H
2384 - 2387	Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists Voisin P, Zelsmann M, Ridaoui H, Chouiki M, Gourgon C, Boussey J, Zahouily K
2388 - 2391	Bilayer metal wire-grid polarizer fabricated by roll-to-roll nanoimprint lithography on flexible plastic substrate Ahn SH, Kim JS, Guo LJ
2392 - 2395	Impact of glass temperature for thermal nanoimprint Scheer HC, Bogdanski N, Wissen M, Mollenbeck S
2396 - 2401	Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry Al-Assaad RM, Regonda S, Tao L, Pang SW, Hu WW
2402 - 2406	Nonresidual layer imprinting and new replication capabilities demonstrated for fast thermal curable polydimethysiloxanes Pina-Hernandez C, Kim JS, Fu PF, Guo LJ
2407 - 2411	Simple fabrication of UV nanoimprint templates using critical energy electron beam lithography Joo J, Jun K, Jacobson JM
2412 - 2418	Creating micro- and nanostructures on tubular and spherical surfaces Lima O, Tan L, Goel A, Negahban M, Li Z
2419 - 2424	Solid-state electrochemical nanoimprinting of copper Schultz PL, Hsu KH, Fang NX, Ferreira PM
2425 - 2429	Economic approximate models for backscattered electrons Rad LB, Downes I, Ye J, Adler D, Pease RFW
2430 - 2434	Improved release strategy for UV nanoimprint lithography Garidel S, Zelsmann M, Chaix N, Voisin P, Boussey J, Beaurain A, Pelissier B
2435 - 2438	Viscosity measurement of nanoimprint lithography resists with a rheological nanoindenter Svintsov AA, Trofimov OV, Zaitsev SI
2439 - 2443	Phase control in multiexposure spatial frequency multiplication Zhao Y, Chang CH, Heilmann RK, Schattenburg ML
2444 - 2446	Study of process contributions to total overlay error budget for sub-60-nm memory devices Shin J, Kang H, Choi S, Woo S, Kim H, Lee S, Lee J, Kang CJ
2447 - 2450	Deep ultraviolet photolithography capability of ZEP520A electron beam resist for mix and match lithography Brown DK
2451 - 2452	Photolithography using an optical microscope Gonski R, Melngailis J
2453 - 2460	Experimental demonstration of dark field illumination using contact hole features Crouse MM, Schmitt-Weaver E, Hansen SG, Routh R
2461 - 2465	Double patterning overlay budget for 45 nm technology node single and double mask approach Rigolli P, Turco C, Iessi U, Capetti G, Canestrari P, Fradilli A
2466 - 2470	Application of contrast enhancement layer to 193 nm lithography Kim RH, Levinson HJ
2471 - 2475	Lithography, plasmonics, and subwavelength aperture exposure technology Ngu Y, Peckerar M, Dagenais M, Barry J, Dutt BR
2476 - 2480	Laser interferometric nanolithography using a new positive chemical amplified resist Luttge R, van Wolferen HAGM, Abelmann L
2481 - 2485	Acid distribution in chemically amplified extreme ultraviolet resist Kozawa T, Tagawa S
2486 - 2489	Dissolution characteristics and reaction kinetics of molecular resists for extreme-ultraviolet lithography Toriumi M, Santillan J, Itani T, Kozawa T, Tagawa S
2490 - 2495	Are extreme ultraviolet resists ready for the 32 nm node? Petrillo K, Wei Y, Brainard R, Denbeaux G, Goldfarb D, Koay CS, Mackey J, Montgomery W, Pierson W, Wallow T, Wood O
2496 - 2503	Measurements of acid generation by extreme ultraviolet irradiation in lithographic films Glodde M, Goldfarb DL, Medeiros DR, Wallraff GM, Denbeaux GP
2504 - 2507	Geometry impact on ultrahigh resolution pattern collapse Jouve A, Simon J, Gonon L, Tortai JH
2508 - 2513	Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness La YH, Park SM, Meagley RP, Leolukman M, Gopalan P, Nealey PF
2514 - 2520	Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity Prabhu VM, Vogt BD, Kang S, Rao A, Lin EK, Satija SK
2521 - 2525	High throughput defect detection with multiple parallel electron beams Van Himbergen HMP, Nijkerk MD, De Jager PWH, Hosman TC, Kruit P
2526 - 2530	Photoresist cross-sectioning with negligible damage using a dual-beam FIB-SEM: A high throughput method for profile imaging Clarke JS, Michael BS, Orji NG
2531 - 2536	Hybrid semiconductor/nanoelectronic circuits: Freeing advanced lithography from the alignment accuracy burden Likharev KK
2537 - 2546	Photolithographic synthesis of high-density DNA probe arrays: Challenges and opportunities Pawloski AR, McGall G, Kuimelis RG, Barone D, Cuppoletti A, Ciccolella P, Spence E, Afroz F, Bury P, Chen C, Chen C, Pao D, Le M, Mcgee B, Harkins E, Savage M, Narasimhan S, Goldberg M, Rava R, Fodor SPA
2547 - 2552	Helium ion microscope invasiveness and imaging study for semiconductor applications Livengood RH, Greenzweig Y, Liang T, Grumski M
2553 - 2557	Dry etch release processes for micromachining applications Zhu T, Argyrakis P, Mastropaolo E, Lee KK, Cheung R
2558 - 2561	Mechanical properties of suspended graphene sheets Frank IW, Tanenbaum DM, Van der Zande AM, McEuen PL
2562 - 2567	Surface gate and contact alignment for buried, atomically precise scanning tunneling microscopy-patterned devices Fuechsle M, Ruea FJ, Reusch TCG, Mitic M, Simmons MY
2568 - 2571	Novel coexisted sol-gel derived poly-Si-oxide-nitride-oxide-silicon type memory You HC, Wu CC, Ko FH, Lei TF, Yang WL
2572 - 2576	Adaptive wiring for 20 nm scale epitaxial silicon Ohmic contacts to silicon nanowires Rooks MJ, Cohen GM, Chu JO, Solomon PM, Ott JA, Miller RJ, Viswanathan R, Haensch W
2577 - 2580	Hybrid carbon nanotube-silicon complementary metal oxide semiconductor circuits Meric I, Caruso V, Caldwell R, Hone J, Shepard KL, Wind SJ
2581 - 2585	Hydrogen plasma-enhanced atomic layer deposition of copper thin films Wu L, Eisenbraun E
2586 - 2592	Emission characteristics of Au60Be40 and Au62Si23Be15 liquid metal ion sources Schwind GA, Swanson LW
2593 - 2597	Fabrication of ultrahigh aspect ratio freestanding gratings on silicon-on-insulator wafers Ahn M, Heilmann RK, Schattenburg ML
2598 - 2602	Soft x-ray imaging of spin dynamics at high spatial and temporal resolution Mesler BL, Fischer P, Chao W, Anderson EH, Kim DH
2603 - 2606	Ultrathin magnetic multilayer films for low-field microwave notch filters Kuanr BK, Kuanr AV, Fal T, Camley RE, Celinski Z
2607 - 2610	Study of fluorine bombardment on the electrical properties of AlGaN/GaN heterostructures Basu A, Kumar V, Adesida I
2611 - 2615	Prospects for nanowire sculptured-thin-film devices Pursel SM, Horn MW
2616 - 2618	First-principles calculation of electronic structure and magnetic properties of copper adsorbed polar-ZnO surface Kim YS, Chung YC
2619 - 2623	Nickel nanowires for planer microwave circuit applications and characterization Marson RL, Kuanr BK, Mishra SR, Camley RE, Celinski Z
2624 - 2627	In situ visualization of local electric field in an ultrasharp tungsten emitter under a low voltage scanning transmission electron microscope Fujita J, Ikeda Y, Okada S, Higashi K, Nakasawa S, Ishida M, Matsui S
2628 - 2631	Fabrication and tuning of nanoscale metallic ring and split-ring arrays Sheridan AK, Clark AW, Glidle A, Cooper JM, Cumming DRS
2632 - 2636	Fabrication of two dimensional GaN nanophotonic crystals (31) Rong B, Salemink HWM, Roeling EM, Van der Heijden R, Karouta F, Van der Drift E
2637 - 2641	Semitransparent Cu electrode on a flexible substrate and its application in organic light emitting diodes Kang MG, Guo LJ
2642 - 2644	Photoluminescence enhancement in metallic nanocomposite printable polymer Reboud V, Kehagias N, Striccoli M, Placido T, Panniello A, Curri ML, Zelsmann M, Reuther F, Gruetzner G, Torres CMS
2645 - 2648	Fabrication of high aspect ratio Si nanogratings with smooth sidewalls for a deep UV-blocking particle filter Mukherjee P, Kang MG, Zurbuchen TH, Guo LJ, Herrero FA
2649 - 2653	V-groove plasmonic waveguides fabricated by nanoimprint lithography Fernandez-Cuesta I, Nielsen RB, Boltasseva A, Borrise X, Perez-Murano F, Kristensen A
2654 - 2657	58 nm half-pitch plastic wire-grid polarizer by nanoimprint lithography Chen L, Wang JJ, Walters F, Deng X, Buonanno M, Tai S, Liu XM
2658 - 2661	Optimization of hydrogen silsesquioxane for photonic applications Holzwarth CW, Barwicz T, Smith HI
2662 - 2664	Membrane stacking: A new approach for three-dimensional nanostructure fabrication Patel AA, Smith HI