Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.24, No.6 Entire volume, number list

ISSN: 1071-1023 (Print)

In this Issue (148 articles)

L27 - L30	Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist Kozawa T, Tagawa S, Oizumi H, Nishiyama I
2485 - 2498	On the use of alloying elements for Cu interconnect applications Barmak K, Cabral C, Rodbell KP, Harper JME
2499 - 2508	Micromechanical resonators and filters for microelectromechanical system applications Motiee M, Mansour RR, Khajepour A
2509 - 2517	Microscopic approach to an equation for the heat flow between wafer and E-chuck Klick M, Bernt M
2518 - 2522	Metal-insulator-metal capacitors using atomic-layer-deposited Al2O3/HfO2/Al2O3 sandwiched dielectrics for wireless communications Ding SJ, Huang YJ, Li YB, Zhang DW, Zhu C, Li MF
2523 - 2532	Area selective atomic layer, deposition of titanium dioxide: Effect of precursor chemistry Sinha A, Hess DW, Henderson CL
2533 - 2537	Focused ion beam fabrication of two dimensional photonic crystals in silicon-on-insulator Balasubramanian K, Heard PJ, Cryan MJ
2538 - 2543	Development of a regeneration-type neural interface: A microtube guide for axon growth of neuronal cells fabricated using focused-ion-beam chemical vapor deposition Hoshino T, Ozasa A, Kometani R, Suzuki T, Matsui S, Mabuchi K
2544 - 2552	Generalized model of the metal/n-GaN Schottky interface and improved performance by electrochemical Pt deposition Cojocari O, Hartnagel HL
2553 - 2559	Chemical lithography Yao P, Schneider GJ, Murakowski J, Prather DW
2560 - 2565	Direct correlation of negative magnetoresistance with concentrations of localized holes in Be delta-doped GaAs structures Noh JP, Iwasaki S, Jung DW, Islam AZMT, Otsuka N
2566 - 2569	Direct-write electron-beam lithography of an IR antenna-coupled microbolometer onto the surface of a hemispherical lens Middlebrook CT, Zummo G, Boreman GD
2570 - 2574	Effect of the addition of argon to reactive nitrogen gas on field emission properties of amorphous carbon nitride films Li JJ, Mimura H, Neo Y, Gu CZ, Li HJ, Chen SX
2575 - 2580	Field electron emission characteristics of diamond films with different grain morphologies Lu X, Yang Q, Chen W, Xiao C, Hirose A
2581 - 2585	InAs/AlSb high-electron-mobility transistors by molecular-beam epitaxy for low-power applications Lange MD, Tsai RS, Deal WR, Nam PS, Lee LJ, Sandhu RS, Hsing R, Poust BD, Kraus JL, Gutierrez-Aitken AL, Bennett BR, Boos JB, Noori AM, Hayashi SL, Goorsky MS
2586 - 2591	Epitaxial growth and strain relaxation of MgO thin films on Si grown by molecular beam epitaxy Niu F, Meier AL, Wessels BW
2592 - 2596	Controlled electroplating for high-aspect-ratio zone-plate fabrication Holmberg A, Lindblom M, Hertz HM
2597 - 2600	Mobility and charge density tuning in double delta-doped pseudomorphic high-electron-mobility transistors grown by metal organic chemical vapor deposition Lee CY, Shiao HP, Kuo KC, Wu HY, Lin WH
2601 - 2605	Fabrication and characterization of high breakdown voltage AlGaN/GaN heterojunction field effect transistors on sapphire substrates Choi YC, Pophristic M, Peres B, Spencer MG, Eastman LF
2606 - 2611	Proposal of a new microreactor for vertical chemical operation Utsumi Y, Asano T, Ukita Y, Matsui K, Takeo M, Negoro S
2612 - 2615	Vertical-via interconnection for infrared antennas Mandviwala TA, Lail BA, Boreman GD
2616 - 2620	Electron-beam lithography of Co/Pd multilayer with hydrogen silsesquioxane and amorphous Si intermediate layer Wi JS, Lee TY, Jin KB, Hong DH, Shin KH, Kim KB
2621 - 2626	Electrical properties of fluorine-doped silicon-oxycarbide dielectric barrier for copper interconnect Huang CC, Huang JL, Wang YL, Chang JJ
2627 - 2630	Magnetization losses in submicrometer CoFeB dots etched in a high ion density Cl-2-based plasma Fabrie CGCHM, Kohlhepp JT, Swagten HJM, Koopmans B, Andriesse MSP, van der Drift E
2631 - 2635	Actinic extreme ultraviolet lithography mask blank defect inspection by photoemission electron microscopy Lin JQ, Neuhaeusler U, Slieh J, Brechling A, Kleineberg U, Heinzmann U, Oelsner A, Valdaitsev D, Schoenhense G, Weber N, Escher M, Merkel M
2636 - 2639	Efficient fabrication and characterization of cobalt nanoparticles embeddedin metal/oxide/semiconductor structures for the application of nonvolatile memory Yang JY, Yoon KS, Choi WJ, Do YH, Kim JH, Kim CO, Hong JP
2640 - 2644	Study of diffusion barriers for Au metal on liquid phase oxidized GaAs Sze PW, Huang JJ, Chou DW, Wang YH
2645 - 2652	Effects of various plasma pretreatments on 193 nm photoresist and linewidth roughness after etching Kim MC, Shamiryan D, Jung Y, Boullart W, Kang CJ, Cho HK
2653 - 2658	Mobility study of a new naphthalenetetracarboxylic dilmide derivative Yang D, Shrestha RP, Li YX, Yan L, Irene EA
2659 - 2667	Immersion lithography for laser mask writing Bassett DW, Bonnecaze RT
2668 - 2671	Suppression of surface segregation of silicon dopants during molecular beam epitaxy of (411)A In0.75Ga0.25As/In0.52Al0.48As pseudomorphic high electron mobility transistor structures Sagisaka H, Kitada T, Shimomura S, Hiyamizu S, Watanabe I, Matsui T, Mimura T
2672 - 2677	Anisotropic high aspect ratio etch for perfluorcyclobutyl polymers with stress relief technique Rahmanian N, Kim S, Nordin GP
2678 - 2688	Plasma oxidation of polyhedral oligomeric silsesquioxane polymers Eon D, Raballand V, Cartry G, Cardinaud C, Vourdas N, Argitis P, Gogolides E
2689 - 2694	Effects of SiO2/Si3N4 hard masks on etching properties of metal gates Hwang WS, Cho BJ, Chan DSH, Bliznetsov V, Yoo WJ
2695 - 2701	Time of flight secondary ion mass spectroscopy investigation of ultralow-k dielectric modifications in hydrogen and deuterium plasmas Lazzeri P, Stueber GJ, Oehrlein GS, McGowan R, Busch E
2702 - 2705	Thin-film transistors with amorphous indium gallium oxide channel layers Chiang HQ, Hong D, Hung CM, Presley RE, Wager JF, Park CH, Keszler DA, Herman GS
2706 - 2715	Demonstration of spatially programmable chemical vapor deposition: Model-based uniformity/nonuniformity control Sreenivasan R, Adomaitis RA, Rubloff GW
2716 - 2722	Quantifying release in step-and-flash imprint lithography Chan EP, Crosby AJ
2723 - 2725	Low-resistance Ohmic contacts developed on undoped AlGaN/GaN-based high electron mobility transistors with AlN interlayer Sun YJ, Eastman LF
2726 - 2730	Electron cyclotron plasma etching damage investigated by InGaAs/GaAs quantum well photoluminescence Mestanza SNM, Frateschi NC
2731 - 2736	Characterization and optimization of a P-channel poly(o-methoxyaniline) based thin film transistor Shrestha RP, Yang DX, Li YX, Yan L, Irene EA
2737 - 2740	Effects of Zn content on structural and transparent conducting properties of indium-zinc oxide films grown by rf magnetron sputtering Park JS, Song JI, Heo YW, Lee JH, Kim JJ, Lim WT, Stafford L, Norton DP, Pearton SJ
2741 - 2747	Deviations from ideal nucleation-limited relaxation in high-Ge content compositionally graded SiGe/Si Isaacson DM, Dohrman CL, Fitzgerald EA
2748 - 2754	Mechanisms of isotropic and selective etching between SiGe and Si Caubet V, Beylier C, Borel S, Renault O
2755 - 2760	Custom design of optical-grade thin films of silicon oxide by direct-write electron-beam-induced deposition Wanzenboeck HD, Fischer M, Svagera R, Wernisch J, Bertagnolli E
2761 - 2764	Coulomb blur in a multi-electron-beam system Sohda Y, Kamimura O, Ohta H
2765 - 2768	Interconnecting single nano-objects on surfaces for transport experiments Della Torre A, Pompa PP, del Mercato LL, Cingolani R, Rinaldi R, Shankar SS, Sastry M
2769 - 2771	Fabrication of nanoelectromechanical resonators using a cryogenic etching technique Nelson-Fitzpatrick N, Westra K, Li P, McColman S, Wilding N, Evoy S
2772 - 2775	Reverse transfer of nanostencil patterns using intermediate sacrificial layer and lift-off process Park CW, Mena OV, van den Boogaart MAF, Brugger J
2776 - 2778	Enabling in situ atomic scale surface imaging for vertical molecular beam epitaxy machines Kim DJ, Cha D, Salamo GJ, Yang H
2788 - 2788	Papers from the 50th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Preface Wind SJ
2789 - 2797	Immersion patterning down to 27 nm half pitch Bloomstein TM, Fedynyshyn TH, Pottebaum I, Marchant MF, Deneault SJ, Rothschild M
2798 - 2802	Effect of resist surface characteristics on film-pulling velocity in immersion lithography Schuetter S, Shedd T, Nellis G, Romano A, Dammel R, Padmanaban M, Houlihan F, Krawicz A, Lin G, Rahman D, Chakrapani S, Neisser M, Van Peski C
2803 - 2807	Impact of stray light depending on image quality: An approximation using total integrated scatter Kim YC, De Bisschop P, Vandenberghe G, Van Den Hove L, Cho H, Moon J
2808 - 2814	Phase shift mask interferometric birefringence monitor McIntyre GR, Neureuther A
2815 - 2819	Generation of isofocal target patterns using process modeling during optical proximity correction Melvin LS, Croffie E, Biswas A
2820 - 2823	Novel absorber stack for minimizing shadow effect in extreme ultraviolet mask Kim TG, Kim BH, Kang IY, Chung YC, Ahn J, Lee SY, Park IS, Kim CY, Lee NE
2824 - 2828	Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements Goldberg KA, Barty A, Liu YW, Kearney P, Tezuka Y, Terasawa T, Taylor JS, Han HS, Wood OR
2829 - 2833	Distortion of chucked extreme ultraviolet reticles from entrapped particles Ramaswamy V, Engelstad RL, Turner KT, Mikkelson AR, Veeraraghavan S
2834 - 2839	Electrostatic chucking for extreme ultraviolet lithography: Simulations and experiments Nataraju M, Sohn J, Veeraraghavan S, Mikkelson AR, Turner KT, Engelstad RL, Van Peski CK, Orvek KJ
2840 - 2843	Three-dimensional patterning using fine step motion in synchrotron radiation lithography Fukuda M, Deguchi K, Suzuki M, Utsumi Y
2844 - 2847	Properties of zone plates used for lithography Zheng R, Jiang L, Feldman M
2848 - 2851	Pulse reverse plating for uniform nickel height in zone plates Lindblom M, Hertz HM, Holmberg A
2852 - 2856	Spatial light modulator for maskless optical projection lithography Watson GP, Aksyuk V, Simon ME, Tennant DM, Cirelli RA, Mansfield WM, Pardo F, Lopez DO, Bolle CA, Papazian AR, Basavanhally N, Lee J, Fullowan R, Klemens F, Miner J, Kornblit A, Sorsch T, Fetter L, Peabody M, Bower JE, Weiner JS, Low YL
2857 - 2860	Integrated multi-electron-beam blanker array for sub-10-nm electron beam induced deposition Zhang YX, Heerkens CTH, van Bruggen MJ, Kruit P
2861 - 2865	Electrostatic chuck fringe field simulation and its impact on electron beam extreme ultraviolet mask patterning Ruan JR, Hartley J
2866 - 2870	Predicting electron projection lithography mask membrane image placement errors Boruszewski MJ, Engelstad RL, Sakaue H, Arimoto H, Eguchi H
2871 - 2874	Helium ion microscope: A new tool for nanoscale microscopy and metrology Ward BW, Notte JA, Economou NP
2875 - 2880	Real-time determination of electron-beam probe shape using an in situ fiducial grid Hastings JT
2881 - 2885	Orientation dependence of linewidth variation in sub-50-nm Gaussian e-beam lithography and its correction Lu M, Tennant DM, Jacobsen CJ
2886 - 2891	Photoelectron emission studies in CsBr at 257 nm Maldonado JR, Liu Z, Sun Y, Pianetta PA, Pease FW
2892 - 2896	Arrayed miniature electron beam columns for mask making Spallas JP, Silver CS, Muray LP
2897 - 2901	Comparison of parameters for Schottky and cold field emission sources Schwind GA, Magera G, Swanson LW
2902 - 2906	High brightness inductively coupled plasma source for high current focused ion beam applications Smith NS, Skoczylas WP, Kellogg SM, Kinion DE, Tesch PP, Sutherland O, Aanesland A, Boswell RW
2907 - 2910	Using laser-cooled atoms as a focused ion beam source Hanssen JL, Dakin EA, McClelland JJ, Jacka M
2911 - 2914	Mechanical characteristics and applications of diamondlike-carbon cantilevers fabricated by focused-ion-beam chemical vapor deposition Igaki J, Nakamatsu KI, Kometani R, Kanda K, Haruyama Y, Kaito T, Matsui S
2915 - 2919	Estimation of scattered particle exposure in ion beam aperture array lithography Parekh V, Ruiz A, Ruchhoeft P, Nounu H, Litvinov D, Wolfe JC
2920 - 2925	Electron beam lithography for magnetic recording heads: Characterization and optimization of critical components Yang XM, Zhou JY, Xiao SG, Mountfield K
2926 - 2930	Two-dimensional Bragg grating lasers defined by electron-beam lithography DeRose GA, Zhu L, Choi JM, Poon JKS, Yariv A, Scherer A
2931 - 2935	Predicted effect of shot noise on contact hole dimension in e-beam lithography Kruit P, Steenbrink S, Wieland M
2936 - 2939	Process optimization and proximity effect correction for gray scale e-beam lithography Murali R, Brown DK, Martin KP, Meindl JD
2940 - 2944	Electron-beam patterning and process optimization for magnetic sensor fabrication Xiao SG, Yang XM
2945 - 2950	Sub-100-nm lithography with miniature electron beam columns Muray LP, Silver CS, Spallas JP
2951 - 2955	Silicon photodiodes for low-voltage electron detection in scanning electron microscopy and electron beam lithography Silver CS, Spallas JP, Muray LP
2956 - 2959	Technique to automatically measure electron-beam diameter and astigmatism: BEAMETR Babin S, Gaevski M, Joy D, Machin M, Martynov A
2960 - 2963	Replication of diffractive-optical arrays via photocurable nanoimprint lithography Galus MD, Moon E, Smith HI, Menon R
2964 - 2967	Nanowire fin field effect transistors via UV-based nanoimprint lithography Fuchs A, Bender M, Plachetka U, Kock L, Wahlbrink T, Gottlob HDB, Efavi JK, Moeller M, Schmidt M, Mollenhauer T, Moormann C, Lemme MC, Kurz H
2968 - 2972	Hybrid mold reversal imprint for three-dimensional and selective patterning Peng C, Pang SW
2973 - 2978	Evidence for internal stresses induced by nanoimprint lithography Ro HW, Ding YF, Lee HJ, Hines DR, Jones RL, Lin EK, Karim A, Wu WL, Soles CL
2979 - 2983	Direct die-to-database electron beam inspection of fused silica imprint templates Resnick DJ, Myron LJ, Thompson E, Hasebe T, Tokumoto T, Yan C, Yamamoto M, Wakamori H, Inoue M, Ainley E, Nordquist KJ, Dauksher WJ
2984 - 2987	Multiple level nanochannels fabricated using reversal UV nanoimprint Yang B, Pang SW
2988 - 2992	Atomic force microscopy local anodic oxidation of thin Si3N4 ayers for robust prototyping of nanostructures Fernandez-Cuesta I, Borrise X, Perez-Murano F
2993 - 2997	Deposition and patterning of diamondlike carbon as antiwear nanoimprint templates Ramachandran S, Tao L, Lee TH, Sant S, Overzet LJ, Goeckner MJ, Kim MJ, Lee GS, Hu W
2998 - 3001	Thermal imprint with negligibly low residual layer Bogdanski N, Wissen M, Mollenbeck S, Scheer HC
3002 - 3005	Submicron three-dimensional structures fabricated by reverse contact UV nanoimprint lithography Kehagias N, Reboud V, Chansin G, Zelsmann M, Jeppesen C, Reuther F, Schuster C, Kubenz M, Gruetzner G, Torres CMS
3006 - 3010	Influence of light polarization on UV stabilization of prepatterned resists Wissen M, Bogdanski N, Moellenbeck S, Helm P, Scheer HC
3011 - 3015	Influence of mold depth on capillary bridges in nanoimprint lithography Chaix N, Landis S, Hermelin D, Leveder T, Perret C, Delaye V, Gourgon C
3016 - 3020	Layer thickness-induced lens distortions during thermal nanoimprint Scheer HC, Bogdanski N, Mollenbeck S, Wissen M, Nishilata M, Hirai Y
3021 - 3024	Epoxy-containing ArF resists with narrow molecular weight distribution Shirai M, Manabe M, Tsuji S, Itani T
3025 - 3030	Pattern noise in electron beam resists: PMMA, KRS-XE, TOK, HSQ Miller MA, Poppe WJ, Neureuther AR, Liddle A, Harteneck B
3031 - 3039	Contribution of photoacid generator to material roughness Fedynyshyn TH, Pottebaum I, Astolfi DK, Cabral A, Roberts J, Meagley R
3040 - 3043	Three-dimensional resist development simulation with discrete models Schnattinger T, Bar E, Erdmann A
3044 - 3047	Exposure dose effects on the reaction-diffusion process in model extreme ultraviolet photoresists Lavery KA, Vogt BD, Prabhu VM, Lin EK, Wu WL, Satija SK, Choi KW
3048 - 3054	Scanning x-ray microscopy investigations into the electron-beam exposure mechanism of hydrogen silsesquioxane resists Olynick DL, Liddle JA, Tivanski AV, Gilles MK, Tyliszczak T, Salmassi F, Liang K, Leone SR
3055 - 3060	Analysis of acid yield generated in chemically amplified electron beam resist Kozawa T, Shigaki T, Okamoto K, Saeki A, Tagawa S, Kai T, Shimokawa T
3061 - 3065	Effect of cold development on improvement in electron-beam nanopatterning resolution and line roughness Ocola LE, Stein A
3066 - 3072	Correlation between proton. dynamics and line edge roughness in chemically amplified resist for post-optical lithography Saeki A, Kozawa T, Tagawa S, Cao HB
3073 - 3076	Time-dependent exposure dose of hydrogen silsesquioxane when used as a negative electron-beam resist Clark N, Vanderslice A, Grove R, Krchnavek RR
3077 - 3082	Transmission electron microscopy: A linewidth measurement technique for lithography Warren JB, Stein A
3083 - 3087	N.anometer-precision pattern registration for scanning-probe lithographies using interferometric-spatial-phase imaging Smith HI
3088 - 3093	Integrated aerial image sensor: Design, modeling, and assembly Xue J, Moen K, Spanos CJ
3094 - 3100	From nanoscale displacement sensing and estimation to nanoscale alignment Gao J, Picciotto C, Wu W, Tong WM
3101 - 3104	Study of overlay metrology in atomic force microscope lithography (overlaying lithography with atomic force microscope) Li XN, Han L, Gu WQ
3105 - 3109	Impact of registration error of reticle on total overlay error budget Lee DY, Chun YJ, Yoon JB, Lee SH, Lee SJ, Cho HK, Moon JT
3110 - 3114	Pattern reconstruction of scanning electron microscope images using long-range content complexity analysis of the edge ridge signal Feng HY, Ye J, Pease RF
3115 - 3120	True three-dimensional proximity effect correction in electron-beam lithography Anbumony K, Lee SY
3121 - 3124	Modeling of linewidth measurement in scanning electron microscopes using advanced Monte Carlo software Babin S, Borisov S, Ivanchikov A, Ruzavin I
3125 - 3127	Reversing the hydrogen silsesquioxane image by silicon nitride and silicon oxide chemical mechanical polishing van Delft FCMJM, van der Kruis FJH, van Eerd PPJ, van Esch HA, van de Laar HWJJ
3128 - 3132	Thin membrane self-alignment using nanomagnets for three-dimensional nanomanufacturing Nichol AJ, Arora WJ, Barbastathis G
3133 - 3138	Microelectrical noise detector for rapid, specific, and sensitive identification of bacteria Seo S, Kim HC, Cheng MS, Ruan XC, Ruan W
3139 - 3143	Robust shadow-mask evaporation via lithographically controlled undercut Cord B, Dames C, Berggren KK
3144 - 3147	Direct wiring of carbon nanotubes for integration in nanoelectromechanical systems Bauerdick S, Linden A, Stampfer C, Helbling T, Hierold C
3148 - 3151	Micromachined piezoresistive proximal probe with integrated bimorph actuator for aligned single ion implantation Persaud A, Ivanova K, Sarov Y, Ivanov T, Volland BE, Rangelow IW, Nikolov N, Schenkel T, Djakov V, Jenkins DWK, Meijer J, Vogel T
3152 - 3156	Characterization of hydrogen silsesquioxane as a Cl-2/BCl3 inductively coupled plasma etch mask for air-clad InP-based quantum well waveguide fabrication Park D, Stievater TH, Rabinovich WS, Green N, Kanakaraju S, Calhoun LC
3157 - 3161	Enhancing etch resistance of hydrogen slisesquioxane via postdevelop electron curing Yang JKW, Anant V, Berggren KK
3162 - 3164	Etching of Pyrex glass substrates by inductively coupled plasma reactive ion etching for micro/nanofluidic devices Jung HC, Lu W, Wang SN, Lee LJ, Hu X
3165 - 3168	Electron beam induced deposition of low resistivity platinum from Pt(PF3)(4) Barry JD, Ervin M, Molstad J, Wickenden A, Brintlinger T, Hoffman P, Meingailis J
3169 - 3172	Mechanical property evaluation of Au-coated nanospring fabricated by combination of focused-ion-beam chemical vapor deposition and sputter coating Nakamatsu K, Kanda K, Haruyama Y, Ichihashi T, Kaito T, Matsui S
3173 - 3178	Precise positioning of single-walled carbon nanotubes by ac dielectrophoresis Banerjee S, White BE, Huang LM, Rego BJ, O'Brien S, Herman IP
3179 - 3183	Control of an electrospinning jet using electric focusing and jet-steering fields Bellan LM, Craighead HG
3184 - 3187	Contactless capturing of particles in liquid using pulsed alternating dielectrophoresis Luo CP, Heeren A, Henschel W, Fleischer M, Kern DP
3188 - 3191	Highly porous silicon membrane fabrication using polymer self-assembly Black CT, Guarini KW, Breyta G, Colburn MC, Ruiz R, Sandstrom RL, Sikorski EM, Zhang Y
3192 - 3195	Nanoscale floating-gate characteristics of colloidal Au nanoparticles electrostatically assembled on Si nanowires Jeon HS, Cho CW, Lim CH, Park B, Ju H, Kim S, Lee SB
3196 - 3199	Gold nanoparticle wires made using RNA-based self-assembly Cumming DRS, Bates AD, Callen BP, Cooper JM, Cosstick R, Geary C, Glidle A, Jaeger L, Pearson JL, Proupin-Perez M, Xu C
3200 - 3204	Extensions of molecular ruler technology for nanoscale patterning Srinivasan C, Anderson ME, Carter EM, Hohman JN, Bharadwaja SSN, Trolier-McKinstry S, Weiss PS, Horn MW
3205 - 3208	Ultrafast patterning of nanoparticles by electrostatic lithography Joo J, Moon S, Jacobson JM
3209 - 3212	Approach to variable frequency measurements of carbon nanotube transistors Amlani I, Lewis J, Zhang R, Nordquist K, Rockwell S
3213 - 3216	1-to 2-nm-wide nanogaps fabricated with single-walled carbon nanotube shadow masks De Poortere EP, Stormer HL, Huang LM, Wind SJ, O'Brien S, Huang M, Hone J
3217 - 3220	Fabrication and characterization of novel cross point structures for molecular electronic integrated circuits Chen W, Liu XQ, Tan ZK, Likharev KK, Lukens JE, Mayr A
3221 - 3226	Threshold voltage adjustment on spherical, single-crystal silicon substrates by focused ion beam implantation Zomorrodian V, Craver B, Radhakrishnan G, Patel M, Charlson EJ, Ruchhoeft P, Wolfe JC
3227 - 3229	Chemically responsive molecular transistors fabricated by self-aligned lithography and chemical self-assembly Tang J, Wang Y, Nuckolls C, Wind SJ
3230 - 3233	Super-self-aligned back-gate/double-gate planar transistors: Novel fabrication approach Lin H, Liu HT, Kumar A, Avci U, Van Delden JS, Tiwari S
3234 - 3238	Directly patterning ferroelectric films by nanoimprint innography with low temperature and low pressure Hsieh KC, Chen HL, Lin CH, Lee CY
3239 - 3243	Characterization and operation of a mechanically actuated silicon microgripper Blideran MM, Fleischer M, Henschel W, Kern DP, Sterr J, Schock K, Kleindiek S, Langer MG, Loffler K, Grauvogel F
3244 - 3247	Accurate resonant frequency spacing of microring filters without postfabrication trimming Holzwarth CW, Barwicz T, Popovic MA, Rakich PT, Ippen EP, Kartner FX, Smith HI
3248 - 3251	Reproduction of the Morpho blue by nanocasting lithography Saito A, Miyamura Y, Nakajima M, Ishikawa Y, Sogo K, Kuwahara Y, Hirai Y
3252 - 3257	Wafer-scale fabrication of polymer distributed feedback lasers Christiansen MB, Scholer M, Balslev S, Nielsen RB, Petersen DH, Kristensen A
3258 - 3262	Progress towards tubes with regular nanopatterned inner surfaces Seunarine K, Tormen M, Gadegaard N, Riehle M, Wilkinson CDW, Businaro L, Romanato F