| 1489 - 1492 |
Enhancement of structural and magnetic properties in sputtered half-metallic Fe3O4 films
Tang XL, Zhang HW, Su H, Zhong ZY, Jing YL |
| 1493 - 1499 |
Effect of wall conditions on the self-limiting deposition of metal oxides by pulsed plasma-enhanbed chemical vapor deposition
Szymanski SF, Seman MT, Wolden CA |
| 1500 - 1504 |
Electronic band gap of Si/SiO2 quantum wells: Comparison of ab initio calculations and photoluminescence measurements
Wagner JM, Seino K, Bechstedt F, Dymiati A, Mayer J, Rolver R, Forst M, Berghoff B, Spangenberg B, Kurz H |
| 1505 - 1511 |
Epitaxial growth of SrO on Si(001): Chemical and thermal stability
El Kazzi M, Delhaye G, Merckling C, Bergignat E, Robach Y, Grenet G, Hollinger G |
| 1512 - 1518 |
Temperature programed desorption of C2H4 from pure and graphite-covered Pt(111)
Vermang B, Juel M, Raaen S |
| 1519 - 1523 |
Surface interactions of C-3 radicals during the deposition of fluorocarbon and hydrocarbon films
Liu D, Fisher ER |
| 1524 - 1528 |
High-flux ion irradiation with energy of similar to 20 eV affecting phase segregation and low-temperature growth of nc-TiN/a-Si3N4 nanocomposite films
Li ZG, Wu YX, Miyake S |
| 1529 - 1533 |
Molecular dynamics simulations of Ar+ bombardment of Si with comparison to experiment
Humbird D, Graves DB, Stevens AAE, Kessels WMM |
| 1534 - 1538 |
Effect of nitrogen doping on bonding state of ZnO thin films
Hirai M, Kumar A |
| 1539 - 1546 |
Phase configuration, nanostructure evolution, and mechanical properties of unbalanced magnetron-sputtered Ti-C-x-N-y thin films
Lu YH, Shen YG, Zhou ZF, Li KY |
| 1547 - 1551 |
Study of dye molecule orientation and configuration in dye molecule doped polythiophene films
Kato H, Takemura S, Watanabe Y, Nara T, Hayashi T, Sugiyama T, Hiramatsu T, Nanba N, Nishikawa O, Taniguchi M |
| 1552 - 1556 |
Effect of growth conditions on the structure and properties of tungsten films prepared using a thermal evaporation process
Hsieh CT, Ting JM |
| 1557 - 1561 |
Polarized infrared reflectance study of wurtzite GaN thin film: The effects of angle of incidence on the optical phonon modes
Ng SS, Hassan Z, Abu Hassan H |
| 1562 - 1566 |
Understanding tin plasmas in vacuum: A new approach to tin whisker risk assessment
Mason MS, Eng G |
| 1567 - 1576 |
Factors affecting the reproducibility of the accommodation coefficient of the spinning rotor gauge
Chang RF, Abbott PJ |
| 1577 - 1586 |
Factors influencing charge capacity of vanadium pentoxide thin films during lithium ion intercalation/deintetcalation cycles
Alamarguy D, Castle JE, Ibris N, Salvi AM |
| 1587 - 1593 |
High sensitivity permeation measurement system for "ultrabarrier" thin films
Zhang XD, Lewis JS, Wolter SD, Parker CB, Glass JT |
| 1594 - 1598 |
Real-time monitoring of successive sparks in high-density plasma chambers
Sato M, Ohtake H, Suzuki K, Samukawa S |
| 1599 - 1603 |
X-ray photoelectron spectroscopy of rubber compounds: Temperature dependence and cross-link distribution
Hammer GE |
