Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.24, No.6 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (39 articles)

L11 - L14	Influence of background gas pressure charging potential and target distance on the spot size ablated by single pulsed electron beam Aga SJ, Cox C, Ueda A, Jackson E, Collins WE, Mu R
1979 - 1984	Quadrupole mass spectrometry desorption analysis of Ga adsorbate on AIN (0001) Brown JS, Koblmuller G, Averbeck R, Riechert H, Speck JS
1985 - 1991	Effects of oxygen pressure on the microstructure of LaNiO3 conductive thin film monitored by in situ reflection high energy diffraction Zhu J, Zheng L, Wei XH, Zhang Y, Li YR
1992 - 1998	Parametric study of sputtered Sr-deficient SrBi2Ta2O9 thin films Zhang S, Li YB, Fei WD, Gan ZH, Mhaisalkar S, Li XM
1999 - 2002	Nitriding of a tool, steel with an electron-beam-excited plasma Shoyama H, Hishida T, Hara T, Dake Y, Mori T, Nagai H, Hori M, Goto T
2003 - 2007	Writing and erasing efficiency analysis on optical-storage media using scanning surface potential microscopy Chen SH, Hou SP, Hsieh J'H, Chen HK, Tsai DP
2008 - 2020	Integrated framework for the flux calculation of neutral species inside trenches and holes during plasma etching Kokkoris G, Boudouvis AG, Gogolides E
2021 - 2024	Effects of low-temperature-grown buffers on pulsed-laser deposition of GaN on LiNbO3 Tsuchiya Y, Oshima M, Kobayashi A, Ohta J, Fujioka H
2025 - 2040	Improved volume-averaged model for steady and pulsed-power electronegative discharges Kim S, Lieberman MA, Lichtenberg AJ, Gudmundsson JT
2041 - 2048	Strain mediated reconstructions and indium segregation on InGaAs/GaAs(001) alloy-surfaces at intermediate lattice mismatch Riposan A, Millunchick JM, Pearson C
2049 - 2053	Comparison of saturation current characteristics for ultrathin silicon oxides grown on n- and p-type silicon substrates simultaneously Wang TM, Chang CH, Chang SJ, Hwu JG
2054 - 2060	Mosaic nanostructure of TiO2 with rutile short-range atomic order Aita CR
2061 - 2069	Interface broadening due to ion mixing during thin film growth at the radio-frequency-biased electrode in a plasma-enhanced chemical vapor deposition environment Amassian A, Svec M, Desjardins P, Martinu L
2070 - 2075	Influence of substrate properties and annealing temperature on the stress state of magnetron sputtered tungsten thin films Oliveira JC, Cavaleiro A
2076 - 2081	Characterization of fluorine-modified organosilicate glass Liu CW, Wang YL, Juang Y, JangJean SK, Lee WH
2082 - 2086	SiO2-like film deposition by dielectric barrier discharge plasma gun at ambient temperature under an atmospheric pressure Chen Q, Zhang YF, Han EL, Ge YJ
2087 - 2093	Heat transfer through a rarefied gas confined between two coaxial cylinders with high radius ratio Sharipov F, Bertoldo G
2094 - 2099	Thermal stability of sputter deposited nanocrystalline W2N/amorphous Si3N4 coatings Fu T, Shen YG, Zhou ZF, Li KY
2100 - 2104	Measurement of Cu atom density in a magnetron sputtering plasma source using an YBaCuO target by laser-induced fluorescence imaging spectroscopy Gao JS, Nafarizal N, Sasaki K
2105 - 2112	Interfacial characterization and residual stress analysis in diamond films on LiNbO3 Jagannadham K, Watkins TR, Lance MJ
2113 - 2116	Nitriding of AISI 4140 steel by a low energy broad ion source Ochoa EA, Figueroa CA, Alvarez F
2117 - 2121	Photon stimulated ion desorption from condensed thiophene photoexcited around the S 1s-edge Rocco MLM, Sekiguchi T, Baba Y
2122 - 2127	Reactive sputter-deposition of AlN films by dense plasma focus Sadiq M, Ahmad S, Shafiq M, Zakaullah M, Ahmad R, Waheed A
2128 - 2132	Development of a low pressure microwave excited plasma and its application to the formation of microcrystalline silicon films Kikukawa D, Hori M, Honma K, Yamamoto M, Goto T, Takahashi S, Den S
2133 - 2138	Lifetime measurement of metastable fluorine atoms using electron cyclotron resonance plasma source Shimizu M, Ohmi H, Kakiuchi H, Yasutake K
2139 - 2146	Influence of thermal annealing on the resistivity of titanium/platinum thin films Schmid U, Seidel H
2147 - 2150	Thermally induced structural changes in nanoporous silicon dioxide from x-ray photoelectron spectroscopy Soh MTK, Thomas JH, TaIghader JJ
2151 - 2158	Time-resolved measurements of the E-to-H mode transition in electronegative pulse-modulated inductively coupled plasmas Edamura M, Benck EC, Wang YC
2159 - 2163	New design for indentation measurement using fiber Bragg grating Chen J, Kahrizi M
2164 - 2171	Microstructural differences in thin film ZnGa2O4 : Mn phosphor produced by differences in sputtering gas pressure Kim JH, Holloway PH
2172 - 2175	Real-time monitoring of charge accumulation during pulse-time-modulated plasma Ohtake H, Jinnai B, Suzuki Y, Soda S, Shimmura T, Sarnukawa S
2176 - 2186	In situ measurement of the ion incidence angle dependence of the ion-enhanced etching yield in plasma reactors Belen RJ, Gomez S, Kiehlbauch M, Aydil ES
2187 - 2191	Thin film deposition of barium strontium oxide by rf magnetron sputtering Liu Y, Day CM, Little SA, Jin F
2192 - 2198	Vapor phase reactions in polymerization plasma for divinyisiloxane-bis-benzocyclobutene film deposition Kinoshita K, Nakano A, Kawahara J, Kunimi N, Hayashi Y, Kiso O, Saito N, Nakamura K, Kikkawa T
2199 - 2205	Structural, electrical, optical, and photoelectrochemical properties of thin titanium oxinitride films (TiO2-2xNx with 0 <= x <= 1) Koslowski U, Ellmer K, Bogdanoff P, Dittrich T, Guminskaya T, Tributsch H
2206 - 2211	Deposition profile of Ti film inside a trench and its correlation with gas-phase ionization in high-pressure magnetron sputtering Nafarizal N, Takada N, Nakamura K, Sago Y, Sasaki K
2212 - 2216	Effects of the growth conditions on the roughness of amorphous hydrogenated carbon films deposited by plasma enhanced chemical vapor deposition Capote G, Prioli R, Freire FL
2217 - 2222	Measurement of desorbed products during organic polymer thin film etching by plasma beam irradiation Kurihara K, Karahashi K, Egami A, Nakamura M
2223 - 2228	Heat trapping for fast pumping of very hot gases Petit EJ