Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.28, No.4 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (97 articles)

L5 - L8	Microplasma-assisted growth of colloidal Ag nanoparticles for point-of-use surface-enhanced Raman scattering applications Chang FC, Richmonds C, Sankaran RM
505 - 509	Correlation of structure and hardness of rf magnetron sputtered silicon carbonitride films Bhattacharyya AS, Mishra SK, Mukherjee S
510 - 514	Surface analysis of polyimide bombarded by charged water droplets Hiraoka K, Sakai Y, Iijima Y
515 - 522	Deposition of aluminum-doped zinc oxide thin films for optical applications using rf and dc magnetron sputter deposition Sivakumar K, Rossnagel SM
523 - 527	Properties of thin N-type Yb0.14Co4Sb12 and P-type Ce0.09Fe0.67Co3.33Sb12 skutterudite layers prepared by laser ablation Zeipl R, Walachova J, Lorincik J, Leshkov S, Josiekova M, Jelinek M, Kocourek T, Jurek K, Navratil J, Benes L, Plechacek T
528 - 535	Investigation on structure and properties of arc-evaporated HfAlN hard coatings Franz R, Mitterer C, Lechthaler M, Polzer C
536 - 540	Growth of epitaxial iron nitride ultrathin film on zinc-blende gallium nitride Pak J, Lin W, Wang K, Chinchore A, Shi M, Ingram DC, Smith AR, Sun K, Lucy JM, Hauser AJ, Yang FY
541 - 551	Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti-Zr-N and Ti-Ta-N Abadias G, Koutsokeras LE, Dub SN, Tolmachova GN, Debelle A, Sauvage T, Villechaise P
552 - 558	Surface morphology of Kr+-polished amorphous Si layers van den Boogaard AJR, Louis E, Zoethout E, Mullender S, Bijkerk F
559 - 563	Investigation of the surface chemical and electronic states of pyridine-capped CdSe nanocrystal films after plasma treatments using H-2, O-2, and Ar gases Wang SJ, Kim H, Park HH, Lee YS, Jeon H, Chang HJ
564 - 567	Making modified fluoropolymer films with low surface energy Ye XD, Duan YG, Ding YC, Liu HZ
568 - 572	Lithium phosphorus oxynitride solid-state thin-film electrolyte deposited and modified by bias sputtering and low temperature annealing Chiu KF, Chen CC, Lin KM, Lo CC, Lin HC, Ho WH, Jiang CS
573 - 577	Safely mounting glass viewports to elastomer sealed vacuum flanges Abbott PJ, Scace B
578 - 582	Sensitivity enhancement in hydrogen permeation measurements Nemanic V, Zajec B, Zumer M
583 - 589	Thickness inhomogeneities and growth mechanisms of GaP heteroepitaxy by organometallic chemical vapor deposition Liu X, Aspnes DE
590 - 594	Epitaxial growth and chemical lift-off of GaInN/GaN heterostructures on c- and r-sapphire substrates employing ZnO sacrificial templates Liu HF, Liu W, Chua SJ
595 - 599	Growth, electrical, and optical properties of nanocrystalline VO2 (011) thin films prepared by thermal oxidation of magnetron sputtered vanadium films Luo ZF, Wu ZM, Xu XD, Wang T, Jiang YD
600 - 602	Crucible aperture: An effective way to reduce source oxidation in oxide molecular beam epitaxy process Kim YS, Bansal N, Oh S
603 - 612	Numerical analysis of the Poiseuille flow and the thermal transpiration of a rarefied gas through a pipe with a rectangular cross section based on the linearized Boltzmann equation for a hard sphere molecular gas Doi T
613 - 621	Time-resolved Fourier transform infrared spectroscopy of the gas phase during atomic layer deposition Sperling BA, Kimes WA, Maslar JE, Chu PM
622 - 624	Identification at high mass resolution of the positive ion at m/z 19 produced by electron-stimulated desorption: F+ (rather than H3O+) Williams P, Franzreb K
625 - 626	Simple flash evaporator for making thin films of compounds Hemanadhan M, Bapanayya C, Agarwal SC
627 - 628	Ultraviolet curing adhesive-based optical fiber feedthrough for ultrahigh vacuum systems Clement JF, Bacquet D, Szriftgiser P
632 - 632	Papers from the AVS 56th International Symposium and Exhibition 8-13 November 2009 San Jose, California PREFACE Lucovsky G
634 - 638	Surface analyses of electropolished niobium samples for superconducting radio frequency cavity Tyagi PV, Nishiwaki M, Saeki T, Sawabe M, Hayano H, Noguchi T, Kato S
639 - 642	Charging/discharging dynamics of CdS and CdSe films under photoillumination using dynamic x-ray photoelectron spectroscopy Sezen H, Suzer S
643 - 646	Hot-electron transport studies of the Ag/Si(001) interface using ballistic electron emission microscopy Garramone JJ, Abel JR, Sitnitsky IL, LaBella VP
647 - 651	Ultrashort pulse laser ablation for depth profiling of bacterial biofilms Milasinovic S, Liu YM, Gasper GL, Zhao YB, Johnston JL, Gordon RJ, Hanley L
652 - 657	Effectiveness of passivation techniques on hydrogen desorption in a tritium environment Woodall S, Pines E, Valles-Rosales D
658 - 661	Novel nanoporous carbon materials for adsorption gibberellic acid from solution Li J, Xia JT, Zhang JH, Liang T
662 - 664	Monoclinic textured HfO2 films on GeOxNy/Ge(100) stacks using interface reconstruction by controlled thermal processing Bastos KP, Miotti L, Lucovsky G, Chung KB, Nordlund D
665 - 670	Imaging characterization techniques applied to Cu(In,Ga)Se-2 solar cells Johnston S, Unold T, Repins I, Sundaramoorthy R, Jones KM, To B, Call N, Ahrenkiel R
671 - 674	Evaluation of indium tin oxide films grown at room temperature by pulsed electron deposition Nampoori HV, Rincon V, Chen MW, Kotru S
675 - 678	Scaling behaviors of silicon-nitride layer for charge-trapping memory Li DH, Yun JG, Lee JH, Park BG
679 - 683	Fabrication of Bi2Te3/Sb2Te3 and Bi2Te3/Bi2Te2Se multilayered thin film-based integrated cooling devices Xiao Z, Hedgemen K, Harris M, DiMasi E
684 - 688	Schottky metal-GaN interface KOH pretreatment for improved device performance Shah PB, Batyrev I, Derenge MA, Lee U, Nyguen C, Jones KA
689 - 692	Chemical-etch-assisted growth of epitaxial zinc oxide Adles EJ, Aspnes DE
693 - 696	Ge doped HfO2 thin films investigated by x-ray absorption spectroscopy Miotti L, Bastos KP, Lucovsky G, Radtke C, Nordlund D
697 - 701	Investigations of magnetic overlayers at the Advanced Photon Source Tobin JG, Yu SW, Butterfield MT, Komesu T, Waddill GD
702 - 705	Studies of Al2O3 barriers for use in tunnel junctions for nonlocal spin detection experiments Abel J, Garramone JJ, Sitnitsky IL, LaBella VP
706 - 712	Imprinting of guide structure to weave nylon fibers Mekaru H, Takahashi M
713 - 718	Effect of polyhedral oligomeric silsesquioxane concentration on the friction and wear of dental polymers Bhushan B, Palacio M, Schricker S
719 - 725	Cryogenic inductively coupled plasma etching for fabrication of tapered through-silicon vias Kamto A, Divan R, Sumant AV, Burkett SL
726 - 729	Electron microscopy characterization of hexagonal molybdenum trioxide (MoO3) nanorods Ramana CV, Troitskaia IB, Atuchin VV, Ramos M, Ferrer D
730 - 734	Fabrication of quantum dots using multicoated self-assembled monolayer Kwon N, Kim K, Chung I
735 - 740	Fabrication of vertically aligned Si nanowires on Si (100) substrates utilizing metal-assisted etching Hong J, Kim K, Kwon N, Lee J, Whang D, Chung I
741 - 744	Orientation-dependent ion beam sputtering at normal incidence conditions in FeSiAl alloy Batic BS, Jenko M
745 - 749	Fabrication of ZnO photonic crystals by nanosphere lithography using inductively coupled-plasma reactive ion etching with CH4/H-2/Ar plasma on the ZnO/GaN heterojunction light emitting diodes Chen SJ, Chang CM, Kao JS, Chen FR, Tsai CH
750 - 754	Dielectrophoresis-assisted deposition and alignment of single-walled carbon nanotubes for electronic-device fabrication Xiao Z, Sharma H, Zhu MY, Pearson T
755 - 760	Infinitely high etch selectivity during CH2F2/H-2 dual-frequency capacitively coupled plasma etching of silicon nitride to chemical vapor-deposited a-C Kim JS, Kwon BS, Heo W, Jung CR, Park JS, Shon JW, Lee NE
761 - 765	Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography Park YR, Ahn JH, Kim JS, Kwon BS, Lee NE, Kang HY, Hwangbo CK, Ahn J, Seo HS
766 - 773	Coating growth behavior during the plasma electrolytic oxidation process Hussein R, Northwood DO, Nie X
774 - 778	Microstructure and corrosion resistance of nanocrystalline TiZrN films on AISI 304 stainless steel substrate Lin YW, Huang JH, Yu GP
779 - 782	Identification of carbon sensitization for the visible-light photocatalytic titanium oxide Chen YJ, Jhan GY, Cai GL, Lin CS, Wong MS, Ke SC, Lo HH, Cheng CL, Shyue JJ
783 - 790	Deposition rates of high power impulse magnetron sputtering: Physics and economics Anders A
791 - 794	Effects of deposition and annealing temperatures on the electrical and optical properties of Ag2O and Cu2O-Ag2O thin films Tseng CC, Hsieh JH, Lin CH, Wu W
795 - 798	Disposition of the axial ligand in the physical vapor deposition of organometallic complexes Kuck S, Prostak M, Funk M, Broring M, Hoffmann G, Wiesendanger R
799 - 806	Photon- and electron-stimulated desorption from laboratory models of interstellar ice grains Thrower JD, Abdulgalil AGM, Collings MP, McCoustra MRS, Burke DJ, Brown WA, Dawes A, Holtom PJ, Kendall P, Mason NJ, Jamme F, Fraser HJ, Rutten FJM
807 - 813	Surface three-dimensional velocity map imaging: A new technique for the study of photodesorption dynamics Ji YY, Koehler SPK, Auerbach DJ, Wodtke AM
814 - 817	Nonlinear femtosecond laser processing of alkylsiloxane monolayers on surface-oxidized silicon substrates Franzka S, Koch J, Chichkov BN, Hartmann N
818 - 823	Electrical, optical, and structural studies of shallow-buried Au-polymethylmethacrylate composite films formed by very low energy ion implantation Teixeira FS, Salvadori MC, Cattani M, Brown IG
824 - 828	Tungsten oxide (WO3) thin films for application in advanced energy systems Gullapalli SK, Vemuri RS, Manciu FS, Enriquez JL, Ramana CV
829 - 833	Study of silicon strain in shallow trench isolation Belyansky M, Klymko N, Conti R, Chidambarrao D, Liu F
834 - 837	Photothermally induced bromination and decomposition of alkylsiloxane monolayers on surface-oxidized silicon substrates Klingebiel B, Schroeter A, Franzka S, Hartmann N
838 - 841	Synergistic Ag (111) and Cu (111) texture evolution in phase-segregated Cu1-xAgx magnetron sputtered composite thin films Filoti DI, Bedell AR, Harper JME
842 - 845	Spatial resistivity distribution of transparent conducting impurity-doped ZnO thin films deposited on substrates by dc magnetron sputtering Minami T, Oda J, Nomoto J, Miyata T
846 - 850	In situ analyses on negative ions in the sputtering process to deposit Al-doped ZnO films Tsukamoto N, Watanabe D, Saito M, Sato Y, Oka N, Shigesato Y
851 - 855	Electrical and optical properties of Nb-doped TiO2 films deposited by dc magnetron sputtering using slightly reduced Nb-doped TiO2-x ceramic targets Sato Y, Sanno Y, Tasaki C, Oka N, Kamiyama T, Shigesato Y
856 - 860	Electrical resistivity change in Al:ZnO thin films dynamically deposited by bipolar pulsed direct-current sputtering and a remote plasma source Yang W, Joo J
861 - 866	Resistivity characteristics of transparent conducting impurity-doped ZnO films for use in oxidizing environments at high temperatures Nomoto J, Konagai M, Miyata T, Minami T
867 - 872	Design and fabrication of optical thin films for remote sensing instruments Hsiao CN, Chen HP, Chiu PK, Cho WH, Lin YW, Chen FZ, Tsai DP
873 - 878	Fabrication and characterization of ink jet processed organic thin film transistors with poly-4-vinylphenol gate dielectric Eum K, Kim K, Han J, Chung I
879 - 885	Study on Ohmic contact improvement of organic Schottky diode utilizing self-assembled monolayer and PEDOT:PSS layers Kwon J, Seol YG, Lee NE, Chung I
886 - 889	Study on MoO3-x films deposited by reactive sputtering for organic light-emitting diodes Oka N, Watanabe H, Sato Y, Yamaguchi H, Ito N, Tsuji H, Shigesato Y
890 - 894	High rate reactive magnetron sputter deposition of Al-doped ZnO with unipolar pulsing and impedance control system Nishi Y, Hirohata K, Tsukamoto N, Sato Y, Oka N, Shigesato Y
895 - 900	Spatial distribution of electrical properties for Al-doped ZnO films deposited by dc magnetron sputtering using various inert gases Sato Y, Ishihara K, Oka N, Shigesato Y
901 - 905	Photoluminescence properties of SrAl2O4:Eu2+,Dy3+ thin phosphor films grown by pulsed laser deposition Ntwaeaborwa OM, Nsimama PD, Pitale S, Nagpure IM, Kumar V, Coetsee E, Terblans JJ, Swart HC, Sechogela PT
906 - 911	Influence of nanostructure on charge transport in RuO2 thin films Steeves MM, Lad RJ
912 - 915	Morphology of TiN thin films grown on MgO(001) by reactive dc magnetron sputtering Ingason AS, Magnus F, Olafsson S, Gudmundsson JT
916 - 924	Direct simulation Monte Carlo modeling of e-beam metal deposition Venkattraman A, Alexeenko AA
925 - 930	Controlled formation of condensed frost layers in cryogenic high vacuum pumps Syssoev SE, Eacobacci MJ, Bartlett AJ
931 - 936	New spiral molecular drag stage design for high compression ratio, compact turbomolecular-drag pumps Giors S, Campagna L, Emelli E
937 - 941	Effect of surface material and roughness on conductance of channel between parallel disks at molecular flow Yoshida H, Shiro M, Arai K, Hirata M, Akimichi H
942 - 946	Vacuum system of the 3 GeV Taiwan photon source Chen JR, Hsiung GY, Chang CC, Chen CL, Chan CK, Cheng CM, Yang CY, Wu LH, Hsueh HP
947 - 952	Numerical ellipsometry: Analysis of thin metal layers using n-k-d twisted curve methods with multiple incidence angles Urban FK, Barton D, Tiwald T
953 - 957	Temporal stability of photothermally fabricated micropatterns in supported phospholipid multilayers Mathieu M, Schunk D, Franzka S, Mayer C, Hartmann N
958 - 962	Thickness monitoring of graphene on SiC using low-energy electron diffraction Fisher PJ, Luxmi, Srivastava N, Nie S, Feenstra RM
963 - 968	Fabrication of plastic biochips Saaem I, Ma KS, Alam SM, Tian JD
969 - 972	Ferrimagnetic ordering of single crystal Fe1-xGax thin films McClure A, Arenholz E, Idzerda YU
973 - 978	Magnetic tunnel junctions with Co-based perpendicular magnetic anisotropy multilayers Tadisina ZR, Natarajarathinam A, Gupta S
979 - 983	Nanopatterning of ultrananocrystalline diamond thin films via block copolymer lithography Ramanathan M, Darling SB, Sumant AV, Auciello O
984 - 988	Synthesis and structural characterization of Fe-O nanonetworks Carbajal-Franco G, Ramana CV
989 - 995	Hydrogen-dominated plasma, due to silane depletion, for microcrystalline silicon deposition Howling AA, Sobbia R, Hollenstein C
996 - 1001	Deposited nanorod films for photonic crystal biosensor applications Zhang W, Kim SM, Ganesh N, Block ID, Mathias PC, Wu HY, Cunningham BT
1002 - 1009	Influence of substrate temperature on glancing angle deposited Ag nanorods Khare C, Patzig C, Gerlach JW, Rauschenbach B, Fuhrmann B
1010 - 1017	Interactions of nerve agents with model surfaces: Computational approach Michalkova A, Leszczynski J
1018 - 1028	Triboelectrification studies of skin and skin cream using Kelvin probe microscopy Tang W, Bhushan B, Ge SR