Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.27, No.4 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (85 articles)

595 - 600	Low temperature grown polycrystalline La0.7Sr0.3MnO3 thin films on amorphous SiO2 substrates by rf magnetron sputtering Choi SG, Reddy AS, Park HH, Yang WS, Ryu H, Yu BG
601 - 610	Collisionless gas flows over a flat cryogenic pump plate Cai CP, Khasawneh K
611 - 613	Surface effects on the luminescence degradation of hydride vapor-phase epitaxy-grown GaN induced by electron-beam irradiation Wang Y, Dierre B, Sekiguchi T, Yao YZ, Yuan XL, Xu FJ, Shen B
614 - 619	Fabrication of surface plasmon waveguides on thin CYTOP membranes Fong N, Berini P, Tait R
620 - 625	Large crystal grain niobium thin films deposited by energetic condensation in vacuum arc Zhao X, Valente-Feliciano AM, Xu C, Geng RL, Phillips L, Reece CE, Seo K, Crooks R, Krishnan M, Gerhan A, Bures B, Elliott KW, Wright J
626 - 630	Studies on hard TaN thin film deposition by R C-Mag technique Valleti K
631 - 642	Relationship between gas-phase chemistries and surface processes in fluorocarbon etch plasmas: A process rate model Sant SP, Nelson CT, Overzet LJ, Goeckner MJ
643 - 647	Effect of cesium assistance on the electrical and structural properties of indium tin oxide films grown by magnetron sputtering Song J, Hwang CS, Park SJ, Yoon NK
648 - 652	Thermal stability of sputter deposited nanomosaic rutile TiO2 Aita CR
653 - 659	Rotation magnet sputtering: Damage-free novel magnetron sputtering using rotating helical magnet with very high target utilization Goto T, Matsuoka T, Ohmi T
660 - 667	Characterization of ALD copper thin films on palladium seed layers Hsu IJ, McCandless BE, Weiland C, Willis BG
668 - 671	Particle-induced x-ray emission in stainless steel using 30 keV Ga+ focused ion beams Giannuzzi LA, Gorman BP
672 - 680	Structure and mechanical properties of nanoscale multilayered CrN/ZrSiN coatings Zhang ZG, Rapaud O, Allain N, Baraket M, Dong C, Coddet C
681 - 685	Inductively coupled plasma-reactive ion etching of InSb using CH4/H-2/Ar plasma Zhang GD, Sun WG, Xu SL, Zhao HY, Su HY, Wang HZ
686 - 695	Establishment of very uniform gas-flow pattern in the process chamber for microwave-excited high-density plasma by ceramic shower plate Goto T, Inokuchi A, Ishibashi K, Yasuda S, Nakanishi T, Kohno M, Okesaku M, Sasaki M, Nozawa T, Hirayama M, Ohmi T
696 - 699	Low-temperature growth of InN on Si(100) by femtosecond pulsed laser deposition Hafez MA, Elsayed-Ali HE
700 - 705	Silicon-oxide-high-kappa-oxide-silicon memory using a high-kappa Y2O3 nanocrystal film for flash memory application Pan TM, Yeh WW
706 - 711	Effects of interelectrode gap on high frequency and very high frequency capacitively coupled plasmas Bera K, Rauf S, Ramaswamy K, Collins K
712 - 715	Nitrogen stabilized reactive sputtering of optimized TiO2-x photocatalysts with visible light reactivity Chen L, Graham ME, Gray KA
716 - 724	Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals Rayner GB, George SM
725 - 730	Physical and optical properties of room temperature microwave plasma anodically grown TiO2 Busani T, Devine RAB
731 - 733	Ge nanocrystals embedded in a GeOx matrix formed by thermally annealing of Ge oxide films Vijayarangamuthu K, Rath S, Kabiraj D, Avasthi DK, Kulriya PK, Singh VN, Mehta BR
736 - 736	Papers from the 55th International Symposium of AVS - Preface Lucovsky G
738 - 742	Scanning Auger of a specific via interface in an integrated circuit using a novel focused ion beam sample preparation technique Liu W, Ramirez H, Schauer S, Theodore ND
743 - 747	X-ray photoelectron spectroscopy analysis of organic materials etched by charged water droplet impact Sakai Y, Iijima Y, Takaishi R, Asakawa D, Hiraoka K
748 - 753	Surface characterization of polymethylmetacrylate bombarded by charged water droplets Hiraoka K, Takaishi R, Asakawa D, Sakai Y, Iijima Y
754 - 760	Atomic force microscopy measurement of boundary slip on hydrophilic, hydrophobic, and superhydrophobic surfaces Wang YL, Bhushan B, Maali A
761 - 766	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition Rowlette PC, Allen CG, Bromley OB, Wolden CA
767 - 769	Synthesis, characterization, and luminescent properties of ZnO-SiO2:PbS Ntwaeaborwa OM, Swart HC, Kroon RE, Terblans JJ, Holloway PH
770 - 775	Structural and magnetic properties of epitaxial Fe25Pt75 Lu Z, Walock MJ, LeClair PR, Mankey GJ, Mani P, Lott D, Klose F, Ambaye H, Lauter V, Wolff M, Schreyer A, Christen HM, Sales BC
776 - 784	Integrated aluminum nitride piezoelectric microelectromechanical system for radio front ends Piazza G
785 - 792	Ultrasonic nanoimprint on engineering plastics Mekaru H, Takahashi M
793 - 798	Fabrication of a highly oriented line structure on an aluminum surface and the nanoscale patterning on the nanoscale structure using highly functional molecules Watanabe Y, Kato H, Takemura S, Watanabe H, Hayakawa K, Kimura S, Okumura D, Sugiyama T, Hiramatsu T, Nanba N, Nishikawa O, Taniguchi M
799 - 802	Structural and morphological evolution of gallium nitride nanorods grown by chemical beam epitaxy Kuo SY, Lai FI, Chen WC, Hsiao CN, Lin WT
803 - 807	Fabrication of ordered anodic aluminum oxide with matrix arrays of pores using nanoimprint Kwon N, Kim K, Heo J, Chung I
808 - 812	Fabrication and characterization of metal-semiconductor-metal nanorod using template synthesis Kim K, Kwon N, Hong J, Chung I
813 - 817	Substrate temperature effects on amorphous carbon film growth, investigated by infrared spectroscopy in multiple internal reflection geometry Shinohara M, Cho K, Matsuda Y, Inayoshi T, Kawazoe H, Fujiyama H, Nitta Y, Nakatani T
818 - 820	Dry etching of CoFe films using a CH4/Ar inductively coupled plasma for magnetic random access memory application Um DS, Kim DP, Woo JC, Kim CI, Lee SK, Jung TW, Moon SC
821 - 825	Temperature dependence on dry etching of Al2O3 thin films in BCl3/Cl-2/Ar plasma Yang X, Kim DP, Um DS, Kim GH, Kim CI
826 - 830	Characterization of platinum catalyst supported on carbon nanoballs prepared by solution plasma processing Ichin Y, Mitamura K, Saito N, Takai O
831 - 835	Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4/O-2 and SF6/O-2 plasmas Miwa K, Takada N, Sasaki K
836 - 843	Sidewall damage in plasma etching of Si/SiGe heterostructures Ding R, Klein LJ, Friesen MG, Eriksson MA, Wendt AE
844 - 848	CoSix contact resistance after etching and ashing plasma exposure Katahira K, Fukasawa M, Kobayashi S, Takizawa T, Isobe M, Hamaguchi S, Nagahata K, Tatsumi T
849 - 854	Capillary jet injection of SiH4 in the high density plasma chemical vapor deposition of SiO2 Botha R, Novikova T, Bulkin P
855 - 861	Effect of Ar and N-2 addition on CH4-H-2 based chemistry inductively coupled plasma etching of HgCdTe Boulard F, Baylet J, Cardinaud C
862 - 866	Role of carbon in titania as visible-light photocatalyst prepared by flat-flame chemical vapor condensation method Chen YJ, Wu JM, Lin CS, Jhan GY, Wong MS, Ke SC, Lo HH
867 - 872	Thermal stability and tribological properties of CrZr-Si-N films synthesized by closed field unbalanced magnetron sputtering Lee SY, Kim YS, Kim GS
873 - 879	Comparative studies on the thermal stability and corrosion resistance of CrN, CrSiN, and CrSiN/AlN coatings Kim GS, Kim SM, Lee SY, Lee BY
880 - 884	Investigation of photocatalytic activity of TiO2/WO3 bilayered thin films with various amounts of WO3 exposed surface Biswas S, Hossain MF, Shahjahan M, Takahashi K, Takahashi T, Fujishima A
885 - 888	Structural, optical, and photocatalytic properties of ZnO:Al nanowall structure deposited on glass substrate by spray pyrolysis Shahjahan M, Khan MKR, Hossain MF, Biswas S, Takahashi T
889 - 894	Ultrathin K/p-Si(001) Schottky diodes as detectors of chemically generated hot charge carriers Huba K, Krix D, Meier C, Nienhaus H
895 - 899	Effect of Al2O3 support on morphology and NO reactivity of Rh Nakamura I, Fujitani T
900 - 906	Surface characterization of hydrophobic thin films deposited by inductively coupled and pulsed plasmas Kim Y, Lee JH, Kim KJ, Lee Y
907 - 912	Efficient translational excitation of a solid metal surface: State-to-state translational energy distributions of vibrational ground state HCl scattering from Au(111) Cooper R, Rahinov I, Yuan C, Yang XM, Auerbach DJ, Wodtke AM
913 - 917	Kinetics of hydride front in Zircaloy-2 and H release from a fractional hydrided surface Diaz M, Gonzalez-Gonzalez A, Moya JS, Remartinez B, Perez S, Sacedon JL
918 - 922	Chemicurrent measurements using alkali metal covered Pd/p-Si(001) Schottky diodes Krix D, Huba K, Nienhausa H
923 - 928	Atomic layer deposition of GaN using GaCl3 and NH3 Kim OH, Kim D, Anderson T
929 - 936	Mechanical and tribological property comparison of melt-compounded nanocomposites of atomic-layer-deposition-coated polyamide particles and commercial nanofillers Nevalainen K, Suihkonen R, Etelaaho P, Vuorinen J, Jarvela P, Isomaki N, Hintze C, Leskela M
937 - 942	High-resolution Rutherford backscattering spectrometry study on process dependent elemental depth profile change of hafnium silicate on silicon Ichihara C, Yasuno S, Takeuchi H, Kobayashi A, Mure S, Fujikawa K, Sasakawa K
943 - 950	Chemical vapor deposition of WNxCy using the tungsten piperidylhydrazido complex Cl-4(CH3CN)W(N-pip): Deposition, characterization, and diffusion barrier evaluation Kim D, Kim OH, Anderson T, Koller J, McElwee-White L, Leu LC, Tsai JM, Norton DP
951 - 955	Vanadium oxide thin films for bolometric applications deposited by reactive pulsed dc sputtering Fieldhouse N, Pursel SM, Carey R, Horn MW, Bharadwaja SSN
956 - 961	Correlation of temperature response and structure of annealed VOx thin films for IR detector applications Venkatasubramanian C, Cabarcos OM, Allara DL, Horn MW, Ashok S
962 - 969	Thin films by metal-organic precursor plasma spray Schulz DL, Sailer RA, Payne S, Leach J, Molz RJ
970 - 974	Latest innovations in large area web coating technology via plasma enhanced chemical vapor deposition source technology George MA, Chandra H, Morse P, Madocks J
975 - 978	Thermally stable very thin Ag films for electrodes Kawamura M, Fukuda D, Inami Y, Abe Y, Sasaki K
979 - 985	High rate sputtering deposition of silicon oxide thin films from new SiO2:Si target composition Fan QH, Zhou LQ, Stevenson D
986 - 995	Molecularly thick dicationic ionic liquid films for nanolubrication Palacio M, Bhushan B
996 - 1000	Structural, electrical, and optical properties of antimony-doped tin oxide films prepared at room temperature by radio frequency magnetron sputtering for transparent electrodes Lee SU, Hong B, Choi WS
1001 - 1005	Transparent conducting Si-codoped Al-doped ZnO thin films prepared by magnetron sputtering using Al-doped ZnO powder targets containing SiC Nomoto J, Miyata T, Minami T
1006 - 1011	Transparent conducting impurity-doped ZnO thin films prepared using oxide targets sintered by millimeter-wave heating Minami T, Okada K, Miyata T, Nomoto J, Hara Y, Abe H
1012 - 1016	Surface slope distribution with mathematical molding on Au(111) thin film growth Gonzalez-Gonzalez A, Sacedon JL, Polop C, Rodriguez-Canas E, Aznarez JA, Vasco E
1017 - 1023	Introduction to MOLFLOW plus : New graphical processing unit-based Monte Carlo code for simulating molecular flows and for calculating angular coefficients in the compute unified device architecture environment Kersevan R, Pons JL
1024 - 1028	Compact deposition system for device-based ultrathin crystalline film growth Lake RE, Puls JR, Ray MP, Sosolik CE
1029 - 1034	Reflectance anisotropy spectroscopy: A probe to explore organic epitaxial growth Bussetti G, Cirilli S, Violante A, Chiostri V, Goletti C, Chiaradia P, Sassella A, Campione M, Raimondo L, Braga D, Borghesi A
1035 - 1041	Characterization of microwave plasmas for deposition of polyparylene Franz G, Rauter F, Dribinskiy SF
1042 - 1046	Fabrication of dye-sensitized solar cells with TiO2 photoelectrode prepared by sol-gel technique with low annealing temperature Hossain MF, Biswas S, Shahjahan M, Majumder A, Takahashi T
1047 - 1051	Study of sol-gel derived porous ZnO photoelectrode for the application of dye-sensitized solar cells Hossain MF, Biswas S, Shahjahan M, Takahashi T
1052 - 1057	Tunneling spectroscopy of graphene and related reconstructions on SiC(0001) Nie S, Feenstra RM
1058 - 1061	In situ electron diffraction characterization of the deformation of nanobelts: Gallium oxide Vaughn JM, Kordesch ME
1062 - 1066	Preparation and properties of perpendicular CoPt magnetic nanodot arrays patterned by nanosphere lithography Li X, Tadisina ZR, Gupta S, Ju GP
1067 - 1070	Controlling magnetic anisotropy in epitaxial FePt(001) films Lu ZH, Walock MJ, LeClair P, Butler WH, Mankey GJ
1071 - 1075	Large-scale production and metrology of vertically aligned carbon nanotube films Dai L, Wang P, Bosnick K
1076 - 1079	Quantitative evaluation of carbon nanotubes by the scanning atom probe Nishikawa O, Taniguchi M
1080 - 1095	Deposition of various metal, ceramic, and cermet coatings by an industrial-scale large area filtered arc deposition process Gorokhovsky V, Bowman C, VanVorous D, Wallace J
1096 - 1103	Characterization of surface damage in AlSi alloys Su J, Nie X, Stoilov V, Yang Q