Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.18, No.4 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (185 articles)

A31 - A31	Papers from the 46th National Symposium of the American Vacuum Society, Part I - 25-29 October 1999 - Washington State Convention Center - Seattle, Washington - Preface Lucovsky G
1051 - 1055	Simulation and correction of geometric distortions in scanning Kelvin probe microscopy Efimov A, Cohen SR
1056 - 1060	Secondary ion mass spectrometry and x-ray photoelectron spectroscopy correlation study of nitrided gate oxide Bradbury CA, Blackmer C
1061 - 1065	Channeling effects during focused-ion-beam micromachining of copper Phillips JR, Griffis DP, Russell PE
1066 - 1071	Oxide-free phosphate films on copper probed by core and valence-band x-ray photoelectron spectroscopic studies in an anaerobic cell Rotole JA, Sherwood PMA
1072 - 1076	Core-level satellites and outer core-level multiplet splitting in Mn model compounds Nelson AJ, Reynolds JG, Roos JW
1077 - 1082	X-ray photoemission spectroscopy and scanning tunneling spectroscopy study on the thermal stability of WO3 thin films Santucci S, Cantalini C, Crivellari M, Lozzi L, Ottaviano L, Passacantando M
1083 - 1088	Consistent, combined quantitative Auger electron spectroscopy and x-ray photoelectron spectroscopy digital databases: Convergence of theory and experiment Seah MP, Gilmore IS, Spencer SJ
1089 - 1092	Adsorption probabilities of CO on O-ZnO: A molecular beam study Becker T, Boas C, Burghaus U, Woll C
1093 - 1095	Compositional heterogeneity in ceria-based mixed oxides observed by x-ray photoelectron spectroscopy Graham GW, Roe CL, Haack LP, Straccia AM
1096 - 1101	Characterization of zirconia coatings deposited by inductively coupled plasma assisted chemical vapor deposition Colpo P, Ceccone G, Sauvageot P, Baker M, Rossi F
1102 - 1106	Adhesion effect of polyimide passivation layer on lead-on-chip die attachment Jiang TT, Bradbury CA, Canavan M
1107 - 1113	Identification of surface chemical functional groups correlated to failure of reverse osmosis polymeric membranes Beverly S, Seal S, Hong S
1114 - 1118	Self-assembled monolayers for polymer and protein cationization with time-of-flight secondary ion mass spectrometry Michel R, Luginbuhl R, Graham DJ, Ratner BD
1119 - 1124	Sputter deposition and annealing of Ta, TaSix and TaBx composite films and their application in next generation lithography masks Racette K, Brooks C, Guarnieri CR, Hendy D
1125 - 1129	Model for detection of immobilized superparamagnetic nanosphere assay labels using giant magnetoresistive sensors Tondra M, Porter M, Lipert RJ
1130 - 1134	Selective area growth of GaN on Si(111) by chemical beam epitaxy Kim E, Tempez A, Medelci N, Berishev I, Bensaoula A
1135 - 1138	High breakdown voltage Au/Pt/GaN Schottky diodes Dang GT, Zhang AP, Mshewa MM, Ren F, Chyi JI, Lee CM, Chuo CC, Chi GC, Han J, Chu SNG, Wilson RG, Cao XA, Pearton SJ
1139 - 1143	Inductively coupled plasma-induced etch damage of GaN p-n junctions Shul RJ, Zhang L, Baca AG, Willison CG, Han J, Pearton SJ, Ren F
1144 - 1148	Schottky diode measurements of dry etch damage in n- and p-type GaN Cao XA, Zhang AP, Dang GT, Ren F, Pearton SJ, Shul RJ, Zhang L
1149 - 1152	Effect of N-2 discharge treatment on AlGaN/GaN high electron mobility transistor ohmic contacts using inductively coupled plasma Zhang AP, Dang GT, Ren F, Van Hove JM, Klaassen JJ, Chow PP, Cao XA, Pearton SJ
1153 - 1157	Scanning tunneling microscopy study of surface morphology of Si(111) after synchrotron radiation stimulated desorption of SiO2 Gao Y, Mekaru H, Miyamae T, Urisu T
1158 - 1162	Investigation of titanium nitride gates for tantalum pentoxide and titanium dioxide dielectrics Gilmer D, Hobbs C, Hegde R, La L, Adetutu O, Conner J, Tiner M, Prabhu L, Bagchi S, Tobin P
1163 - 1168	Separate and independent reductions in direct tunneling in oxide/nitride stacks with monolayer interface nitridation associated with the (i) interface nitridation and (ii) increased physical thickness Lucovsky G, Wu Y, Niimi H, Yang H, Keister J, Rowe JE
1169 - 1172	Comparison of plasma chemistries for dry etching of Ta2O5 Lee KP, Jung KB, Singh RK, Pearton SJ, Hobbs C, Tobin P
1173 - 1175	Study of the impact of the time-delay effect on the critical dimension of a tungsten silicide/polysilicon gate after reactive ion etching Lin SP, Ou CH, Lee S, Tien YC, Hsu CF
1176 - 1179	Formation of Ni silicides on (001)Si with a thin interposing Pt layer Cheng LW, Cheng SL, Chen LJ, Chien HC, Lee HL, Pan FM
1180 - 1183	Silicon nanodots fabricated on a Si(100) surface via thermal nitridation and oxygen etching reactions Ha JS, Park KH, Yun WS
1184 - 1189	Real-time optical characterization of heteroepitaxy by organometallic chemical vapor deposition Bell KA, Ebert M, Yoo SD, Flock K, Aspnes DE
1190 - 1195	Real-time thickness and compositional control of Ga1-xInxP growth using p-polarized reflectance Woods V, Dietz N, Ito K, Lauko I
1196 - 1201	Deposition of polycrystalline Si and SiGe by ultra-high vacuum chemical molecular epitaxy Chen KM, Huang HJ, Chang CY, Chen LP, Huang GW
1202 - 1206	Strength of nanoscale copper under shear Heino P, Holloway P, Ristolainen E
1207 - 1210	Effects of a new combination of additives in electroplating solution on the properties of Cu films in ULSI applications Hu JC, Chang TC, Wu CW, Chen LJ, Hsiung CS, Hsieh WY, Lur W, Yew TR
1211 - 1215	Surface modification and cleaning enhancement of TaSi(N) films with dilute hydrofluoric acid Mangat PJS, Dauksher WJ, Whig R, O'Brien WL
1216 - 1219	Low-k Si-O-C-H composite films prepared by plasma-enhanced chemical vapor deposition using bis-trimethylsilylmethane precursor Kim YH, Lee SK, Kim HJ
1220 - 1224	Advanced selective dry etching of GaAs/AlGaAs in high density inductively coupled plasmas Lee JW, Devre MW, Reelfs BH, Johnson D, Sasserath JN, Clayton F, Hays D, Pearton SJ
1225 - 1229	Characterization of plasma enhanced chemical vapor deposited SiC and its application in advanced reticle technology-scattering with angular limitation in projection electron beam lithography membrane Han SI, Mangat PJS, Smith SM, Dauksher WJ, Convey D, Gregory RB
1230 - 1233	New approach for the fabrication of device-quality Ge/GeO2/SiO2 interfaces using low temperature remote plasma processing Johnson RS, Niimi H, Lucovsky G
1234 - 1238	Multicolor-emitting thin-film electroluminescent devices using Ga2O3 phosphors co-doped with Mn and Cr Minami T, Nakatani T, Miyata T
1239 - 1246	Intrinsic and extrinsic magnetic properties of the naturally layered manganites Berger A, Mitchell JF, Miller DJ, Jiang JS, Bader SD
1247 - 1253	Ferromagnetic semiconductor heterostructures based on (GaMn)As Tanaka M, Shimizu H, Hayashi T, Shimada H, Ando K
1254 - 1258	Low-temperature gaseous nitriding and subsequent oxidation of epitaxial Ni/Fe bilayers Mijiritskii AV, Boerma DO
1259 - 1263	Surface-sensitive, element-specific magnetometry with x-ray linear dichroism Schumann FO, Willis RF, Tobin JG
1264 - 1268	Exchange bias in Fe/Cr double superlattices Jiang JS, Felcher GP, Inomata A, Goyette R, Nelson CS, Bader SD
1269 - 1272	Magnetic stability of novel exchange coupled systems Inomata A, Jiang JS, You CY, Pearson JE, Bader SD
1273 - 1277	Effects of ultraviolet illumination on dry etch rates of NiFe-based magnetic multilayers Cho H, Lee KP, Hahn YB, Lambers ES, Pearton SJ
1278 - 1281	Growth of ultrathin Co/Cu/Si(110) films Maat S, Liu C, Eads W, Umlor MT, Mankey GJ
1282 - 1286	Generation of positively charged particles at an anode and transport to device wafers in a real radio frequency plasma etching chamber for tungsten etch-back process Moriya T, Ito N, Uesugi F, Hayashi Y, Okamura K
1287 - 1296	Multizone uniformity control of a chemical mechanical polishing process utilizing a pre- and postmeasurement strategy El Chemali C, Moyne J, Khan K, Nadeau R, Smith P, Colt J, Chapple-Sokol J, Parikh T
1297 - 1302	Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch tool Garvin C, Grizzle JW
1303 - 1307	Real time control of plasma deposited optical filters by multiwavelength ellipsometry Heitz T, Hofrichter A, Bulkin P, Drevillon B
1308 - 1312	Effects of trapped charges on Hg-Schottky capacitance-voltage measurements of n-type epitaxial silicon wafers Wang Q, Liu D, Virgo JT, Yeh J, Hillard RJ
1313 - 1320	Plasma etch-back planarization coupled to chemical mechanical polishing for sub 0.18 mu m shallow trench isolation technology Schiltz A, Palatini L, Paoli M, Rivoire M, Prola A
1321 - 1325	Experimental and theoretical results of room-temperature single-electron transistor formed by the atomic force microscope nano-oxidation process Gotoh Y, Matsumoto K, Maeda T, Cooper EB, Manalis SR, Fang H, Minne SC, Hunt T, Dai H, Harris J, Quate CF
1326 - 1328	Fabrication of bismuth nanowires with a silver nanocrystal shadowmask Choi SH, Wang KL, Leung MS, Stupian GW, Presser N, Morgan BA, Robertson RE, Abraham M, King EE, Tueling MB, Chung SW, Heath JR, Cho SL, Ketterson JB
1329 - 1332	Fabrication of metal nanowire using carbon nanotube as a mask Yun WS, Kim J, Park KH, Ha JS, Ko YJ, Park K, Kim SK, Doh YJ, Lee HJ, Salvetat JP, Forro L
1333 - 1337	Fabrication of a nanosize metal aperture for a near field scanning optical microscopy sensor using photoresist removal and sputtering techniques Jung MY, Lyo IW, Kim DW, Choi SS
1338 - 1344	Nondestructive one-dimensional scanning capacitance microscope dopant profile determination method and its application to three-dimensional dopant profiles Kang ES, Kang JW, Hwang HJ, Lee JH
1345 - 1348	Scanning probe microscopy tip-sample interactions in primary alcohols of varying chain length Ralich RM, Wu Y, Ramsier RD, Henriksen PN
1349 - 1353	Isolating, imaging, and electrically characterizing individual organic molecules on the Si(100) surface with the scanning tunneling microscope Hersam MC, Guisinger NP, Lyding JW
1354 - 1358	Etching characteristics of SrBi(2)Ya(2)O(9) film with Ar/CHF3 plasma Seo JW, Lee DH, Lee WJ, Yu BG, Kwon KH, Yeom GY, Chang EG, Kim CI
1359 - 1365	Optical emission studies and neutral stream characterization of a surface reflection materials processing source Tang XM, Manos DM
1366 - 1372	Estimation of surface kinetic parameters and two-dimensional simulation of InP pattern features during CH4-H-2 plasma etching Rhallabi A, Houlet L, Turban G
1373 - 1376	Effects of BCl3 addition on Ar/Cl-2 gas in inductively coupled plasmas for lead zirconate titanate etching An TH, Park JY, Yeom GY, Chang EG, Kim CI
1377 - 1380	Roles of N-2 gas in etching of platinum by inductively coupled Ar/Cl-2/N-2 plasmas Ryu JH, Kim NH, Kim HS, Yeom GY, Chang EG, Kim CI
1381 - 1384	Etching mechanism of (Ba,Sr)TiO3 films in high density Cl-2/BCl3/Ar plasma Kim SB, Lee YH, Kim TH, Yeom GY, Kim CI
1385 - 1389	Deceleration of silicon etch rate at high aspect ratios Kiihamaki J
1390 - 1394	Magnetized inductively coupled plasma etching of GaN in Cl-2/BCl3 plasmas Lee YH, Sung YJ, Yeom GY, Lee JW, Kim TI
1395 - 1400	Diagnostic of rf discharge plasma by Thomson scattering with gated intensified charge coupled device detectors Moshkalyov SA, Thompson C, Morrow T, Graham WG
1401 - 1410	Plasma enhanced chemical vapor deposition Si-rich silicon oxynitride films for advanced self-aligned contact oxide etching in sub-0.25 mu m ultralarge scale integration technology and beyond Kim JH, Yu JS, Ku JC, Ryu CK, Oh SJ, Kim SB, Kim JW, Hwang JM, Lee SY, Kouichiro I
1411 - 1419	Transfer etching of bilayer resists in oxygen-based plasmas Mahorowala AP, Babich K, Lin Q, Medeiros DR, Petrillo K, Simons J, Angelopoulos M, Sooriyakumaran R, Hofer D, Reynolds GW, Taylor JW
1420 - 1424	Integration of metal masking and etching for deep submicron patterning Gabriel CT, Kim RY, Baker DC
1425 - 1430	Reactive ion etch of 150 nm Al lines for interconnections in dynamic random access memory Stojakovic G, Ning XJ
1431 - 1436	Characterization of process-induced charging damage in scaled-down devices and reliability improvement using time-modulated plasma Noguchi K, Samukawa S, Ohtake H, Mukai T
1437 - 1442	Insertion process and electrical conduction of conjugated molecules in n-alkanethiol self-assembled monolayers on Au(111) Ishida T, Mizutani W, Tokumoto H, Choi N, Akiba U, Fujihira M
1443 - 1447	Decomposition of 1,3-butadiene on Ru(001): Evidence for a (CH)(4) metallacycle Weiss MJ, Hagedorn CJ, Weinberg WH
1448 - 1454	Study of boron effects on the reaction of Co and Si1-xGex at various temperatures Huang HJ, Chen KM, Chang CY, Huang TY, Chang TC, Chen LP, Huang GW
1455 - 1459	The adsorption and desorption of CO on the W(111) surface Lee SY, Kim YD, Yang TS, Boo JH, Park SC, Lee SB, Park CY, Kwak HT
1460 - 1463	Surface structure of MnO/Rh(100) studied by scanning tunneling microscopy and low-energy electron diffraction Nishimura H, Tashiro T, Fujitani T, Nakamura J
1464 - 1468	In situ study of the formation of SiC thin films on Si(111) surfaces with 1,3-disilabutane: Adsorption properties and initial deposition characteristics Yoon HG, Boo JH, Liu WL, Lee SB, Park SC, Kang H, Kim Y
1469 - 1472	Site preferences of oxygen and boron atoms during dissociative reaction of HBO2 molecules onto the Si(111)-7x7 surface Kaikoh T, Miyake K, Li YJ, Morita R, Yamashita M, Shigekawa H
1473 - 1477	Cesium-induced structural transformation from the Si(113)3x2 to the 3x1 surface Hwang CC, An KS, Kim SH, Kim YK, Park CY, Kwon SN, Song HS, Jung KH, Kinoshita T, Kakizaki A, Kang TH, Kim B
1478 - 1483	Cyclic voltammetry, x-ray photoelectron spectroscopy, secondary-ion-mass spectrometry, and ion-scattering spectrometry examination of zirconium passive film breakdown in the presence of sulfate Schennach R, Mamun A, Kunamneni N, Cocke DL
1484 - 1487	Ultrahigh vacuum compatible matrix assisted laser desorption/ionization time-of-flight mass spectrometer Porter TL, Hermann S
1488 - 1491	Na- and Li-induced Ge(111)3x1 reconstruction: Different electronic configurations revealed by scanning tunneling microscopy images Lee G, Kim J, Mai H, Chizhov I, Willis RF
1492 - 1496	Reflection high-energy electron diffraction and scanning tunneling microscopy study of InP(001) surface reconstructions LaBella VP, Ding Z, Bullock DW, Emery C, Thibado PM
1497 - 1502	Reactions of gas-phase atomic hydrogen and deuterium with chemically modified Ir(111) surfaces Hagedorn CJ, Weiss MJ, Weinberg WH
1503 - 1508	Reaction between NO and CO on rhodium (100): How lateral interactions lead to auto-accelerating kinetics Hopstaken MJP, Niemantsverdriet JW
1509 - 1513	Coverage dependence of activation barriers: Nitrogen on Ru(0001) Diekhoner L, Mortensen H, Baurichter A, Luntz AC
1514 - 1519	Microreactor for studies of low surface area model catalysts made by electron-beam lithography Johansson S, Fridell E, Kasemo B
1520 - 1525	Water adsorption structures on flat and stepped Ru(0001) surfaces Hoffmann W, Benndorf C
1526 - 1531	Monte Carlo derived diffusion parameters for Ga on the GaAs(001)-(2x4) surface: A molecular beam epitaxy-scanning tunneling microscopy study LaBella VP, Bullock DW, Ding Z, Emery C, Harter WG, Thibado PM
1533 - 1537	Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge Macak K, Kouznetsov V, Schneider J, Helmersson U, Petrov I
1538 - 1545	Origin and evolution of sculptured thin films Messier R, Venugopal VC, Sunal PD
1546 - 1549	Ionized physical-vapor deposition using a hollow-cathode magnetron source for advanced metallization Klawuhn E, D'Couto GC, Ashtiani KA, Rymer P, Biberger MA, Levy KB
1550 - 1554	Effects of copper seedlayer deposition method for electroplating Cooney EC, Strippe DC, Korejwa JW
1555 - 1560	Steel coating by self-induced ion plating, a new high throughput metallization ion plating technique Brande PV, Weymeersch A
1561 - 1566	Effect of HCl catalyst in the formation of flat structures of Ta2O5 thin films by sol-gel technique Cantalini C, Pelino M, Phani RA, Passacantando M, Picozzi P, Santucci S
1567 - 1570	Mechanical properties and residual stress in AlN films prepared by ion beam assisted deposition Watanabe Y, Kitazawa N, Nakamura Y, Li CL, Sekino T, Niihara K
1571 - 1578	Oxidation and chemical state analysis of polycrystalline magnetron sputtered (Ti,Al)N films at ambient and liquid N-2 temperatures Seal S, Kale A, Sundaram KB, Jimenez D
1579 - 1583	Improved light stability of colored SiO2 coatings containing organic and metalorganic dye molecules Diaz-Flores LL, Perez-Bueno JJ, Ramirez-Bon R, Espinoza-Beltran FJ, Vorobiev YV, Gonzalez-Hernandez J
1584 - 1589	Origin of electrical property distribution on the surface of ZnO : Al films prepared by magnetron sputtering Minami T, Miyata T, Yamamoto T, Toda H
1590 - 1594	Low-temperature growth of Ti(C,N) thin films on D2 steel and Si(100) substrates by plasma-enhanced metalorganic chemical vapor deposition Boo JH, Heo CH, Cho YK, Han JG
1595 - 1598	Study on the characteristics of TiN thin film deposited by the atomic layer chemical vapor deposition method Jeon H, Lee JW, Kim YD, Kim DS, Yi KS
1599 - 1603	Alternative procedure for the fabrication of close-spaced sublimated CdTe solar cells Moutinho HR, Dhere RG, Ballif C, Al-Jassim MM, Kazmerski LL
1604 - 1608	CdS/CdTe interface analysis by transmission electron microscopy Dhere RG, Al-Jassim MM, Yan Y, Jones KM, Moutinho HR, Gessert TA, Sheldon P, Kazmerski LL
1609 - 1612	Synthesis of highly oriented piezoelectric AlN films by reactive sputter deposition Engelmark F, Fucntes G, Katardjiev IV, Harsta A, Smith U, Berg S
1613 - 1618	Surface morphology analysis in correlation with crystallinity of CeO2(110) layers on Si(100) substrates Inoue T, Nakamura T, Nihei S, Kamata S, Sakamoto N, Yamamoto Y
1619 - 1631	X-ray photoelectron spectroscopy and Anger electron spectroscopy investigation on the oxidation resistance of plasma-treated copper leadframes Wong ASW, Krishnan RG, Sarkar G
1632 - 1637	Optimization of the reflectivity of magnetron sputter deposited silver films Vergohl M, Malkomes N, Szyszka B, Neumann F, Matthee T, Brauer G
1638 - 1641	Preparation and characterization of rf-sputtered SrTiO3 thin films Radhakrishnan K, Tan CL, Zheng HQ, Ng GI
1642 - 1648	Organic films prepared by polymer sputtering Biederman H
1649 - 1652	Preparation of Co and CoNx thin films by unbalanced radio frequency magnetron sputtering Tanaka T, Kawabata K, Kitabatake A
1653 - 1658	Chemical vapor deposition of alpha aluminum oxide for high-temperature aerospace sensors Niska RH, Constant AP, Witt T, Gregory OJ
1659 - 1662	Phase development of radio-frequency magnetron sputter-deposited Pb(Mg1/3Nb2/3)O-3-PbTiO3 (90/10) thin films Lee JK, Park D, Cheong DS, Park JW, Park CS
1663 - 1667	Electrical properties and surface morphology of heteroepitaxial-grown tin-doped indium oxide thin films deposited by molecular-beam epitaxy Taga N, Shigesato Y, Kamei M
1668 - 1671	Influence of the target-substrate distance on the properties of indium tin oxide films prepared by radio frequency reactive magnetron sputtering Meng LJ, dos Santos MP
1672 - 1676	p-type transparent conducting In2O3-Ag2O thin films prepared by reactive electron beam evaporation technique Asbalter J, Subrahmanyam A
1677 - 1680	Mott-Schottky analysis of thin ZnO films Windisch CF, Exarhos GJ
1681 - 1689	Structural determination of wear debris generated from sliding wear tests on ceramic coatings using Raman microscopy Constable CP, Yarwood J, Hovsepian P, Donohue LA, Lewis DB, Munz WD
1690 - 1693	Effect of rapid thermal annealing temperature on the formation of CoSi studied by x-ray photoelectron spectroscopy and micro-Raman spectroscopy Zhao J, Ballast LK, Hossain TZ, Trostel RE, Bridgman WC
1694 - 1700	Temperature dependence of structure and electrical properties of germanium-antimony-tellurium thin film Gonzalez-Hernandez J, Prokhorov E, Vorobiev Y
1701 - 1703	In-situ characterization of thin films by the focused ion beam Choi SH, Li R, Pak M, Wang KL, Leung MS, Stupian GW, Presser N
1704 - 1708	Integrated measurement of Ti and TiN thickness and optical constants using reflectance data through a vacuum chamber window Tabet MF, Kelkar U, McGahan WA
1709 - 1712	Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics Vergohl M, Hunsche B, Malkomes N, Matthee T, Szyszka B
1713 - 1717	Growth of SiC thin films on graphite for oxidation-protective coating Boo JH, Kim MC, Lee SB, Park SJ, Han JG
1718 - 1723	Enhanced adhesion through local epitaxy of transition-metal nitride coatings on ferritic steel promoted by metal ion etching in a combined cathodic arc/unbalanced magnetron deposition system Schonjahn C, Donohue LA, Lewis DB, Munz WD, Twesten RD, Petrov I
1724 - 1729	Compact wide-range cold-cathode gauges Kendall BRF, Drubetsky E
1730 - 1735	New enhanced performance low-pressure capacitance manometer Grudzien CP, Lischer DJ
1736 - 1745	Evolution of integrated-circuit vacuum processes: 1959-1975 Waits RK
1746 - 1750	History of industrial and commercial ion implantation 1906-1978 Yarling CB
1751 - 1754	Application of porcelain enamel as an ultra-high-vacuum-compatible electrical insulator Biscardi C, Hseuh H, Mapes M
1755 - 1757	Fundamental functions of a new type of leak detector using oxygen-ion conductor Tatenuma K, Noguchi T, Uchida K, Saeki H, Ando A, Momose T
1758 - 1765	Review of pumping by thermal molecular pressure Hobson JP, Salzman DB
1766 - 1771	Inner pressure measurement of turbo molecular pump Cheng HP, Jou RY, Lin JC, Chen CJ, Huang WH
1772 - 1776	Measurement of axial pressure distribution on a rotor of a helical grooved molecular drag pump Sawada T, Sugiyama W, Takano K
1777 - 1781	Dry vacuum pumps for semiconductor processes: Guidelines for primary pump selection Lessard PA
1782 - 1788	Dry vacuum pumps: A method for the evaluation of the degree of dry Davis RP, Abreu RA, Chew AD
1789 - 1793	Experiments with a thin-walled stainless-steel vacuum chamber Nemanic V, Setina J
1794 - 1799	Laser Interferometer Gravitational-Wave Observatory beam tube component and module leak testing Carpenter WA, Shaw PB, Jones L, Weiss R
1800 - 1803	Decay rate of photoresist outgassing from ion implantation Perel AS, Horsky TN
1804 - 1808	Evolution of the corrosion process on thin-film media Ying JF, Anoikin T, Martner C
1809 - 1817	Tribochemistry of monodispersed ZDOL with hydrogenated carbon overcoats Chen CY, Bogy DB, Bhatia CS
1818 - 1822	New field-emission device with improved vacuum features Mammana VP, Degasperi FT, Monteiro OR, Vuolo JH, Salvadori MC, Brown IG
1823 - 1829	Excimer laser processing for a-Si and poly-Si thin film transistors for imager applications Lu JP, Mei P, Fulks RT, Rahn J, Ho J, Wang Y, Boyce JB, Street RA
1830 - 1833	Pinhole decoration in magnetic tunnel junctions Allen D, Schad R, Zangari G, Zana I, Yang D, Tondra MC, Wang D
1834 - 1837	Characterization and analysis of a novel hybrid magnetoelectronic device for magnetic field sensing Schaadt DM, Yu ET, Sankar S, Berkowitz AE
1838 - 1844	Periodic magnetic microstructures by glancing angle deposition Dick B, Brett MJ, Smy TJ, Freeman MR, Malac M, Egerton RF
1845 - 1847	Variable temperature and ex situ spin-polarized low-energy electron microscope Tober ED, Witte G, Poppa H
1848 - 1852	Cryogenic etching of deep narrow trenches in silicon Aachboun S, Ranson P, Hilbert C, Boufnichel M
1853 - 1858	Polycrystalline silicon thin films with hydrofluoric acid permeability for underlying oxide etching and vacuum encapsulation Kageyama Y, Tsuchiya T, Funabashi H, Sakata J
1859 - 1863	Etching of organic low dielectric constant material SiLK (TM) on the Lam Research Corporation 4520XLE (TM) Janowiak C, Ellingboe S, Morey I
1864 - 1868	Growth of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition at low temperature Choi YC, Bae DJ, Lee YH, Lee BS, Park GS, Choi WB, Lee NS, Kim JM
1869 - 1874	Influence of copper phthalocynanine on the charge injection and growth modes for organic light emitting diodes Forsythe EW, Abkowitz MA, Gao YL, Tang CW
1875 - 1880	Growth and characterization of poly(arylamine) thin films prepared by vapor deposition Szulczewski GJ, Selby TD, Kim KY, Hassenzahl JD, Blackstock SC
1881 - 1886	Desorption species from fluorocarbon film by Ar+ ion beam bombardment Hayashi M, Karahashi K
1887 - 1892	Reactions of maleic anhydride over TiO2 (001) single crystal surfaces Wilson JN, Titheridge DJ, Kieu L, Idriss H
1893 - 1899	Interaction of HCOOH with stoichiometric and reduced SrTiO3(100) surfaces Wang LQ, Ferris KF, Herman GS, Engelhard MH
1900 - 1905	Reactions of acetic acid on UO2(111) single crystal surfaces Chong SV, Idriss H
1906 - 1914	Surface reduction of Cr-V2O3 by CO Toledano DS, Henrich VE, Metcalf P
1915 - 1918	Optimized structural properties of wurtzite GaN on SiC(0001) grown by molecular beam epitaxy Ramachandran V, Feenstra RM, Sarney WL, Salamanca-Riba L, Greve DW
1919 - 1922	Increase of electrical conductivity in p-GaN by immersion in H2O2 solution Liu B, Ahonen MH, Holloway PH
1923 - 1927	Oxidation of Ni3Al(111) at 600, 800, and 1050 K investigated by scanning tunneling microscopy Rosenhahn A, Schneider J, Becker C, Wandelt K
1928 - 1932	Deposition and characterization of highly oriented Mg-3(VO4)(2) thin film catalysts Ruffner JA, Sault AG, Rodriguez MA, Tissot RG
1933 - 1936	How to fabricate a defect free Si(001) surface Hata K, Kimura T, Ozawa S, Shigekawa H
1937 - 1940	Intermixing in Stranski-Krastanov germanium overlayer on Si(100) Kahng SJ, Ha YH, Moon DW, Kuk Y
1941 - 1945	Motion of atomic steps on ultraflat Si(111): Constructive collisions Finnie P, Homma Y
1946 - 1949	Origin, symmetry, and temperature dependence of the perturbation induced by Si extrinsic defects on the Sn/Si(111) alpha surface: A scanning tunneling microscopy study Ottaviano L, Crivellari M, Profeta G, Continenza A, Lozzi L, Santucci S
1950 - 1954	Surface morphology and electronic structure of Ni/Ag(100) Hite DA, Kizilkaya O, Sprunger PT, Howard MM, Ventrice CA, Geisler H, Zehner DM
1955 - 1958	Resonant Auger studies of metallic systems Coulthard I, Antel WJ, Frigo SP, Freeland JW, Moore J, Calaway WS, Pellin MJ, Mendelsohn M, Sham TK, Naftel SJ, Stampfl APJ
1959 - 1964	1,3-dipolar cycloadditions on Si(100)-2x1: Theoretical studies of novel attachment chemistry for organic monolayers Barriocanal JA, Doren DJ
1965 - 1970	Reactions of substituted aromatic hydrocarbons with the Si(001) surface Coulter SK, Hovis JS, Ellison MD, Hamers RJ
1971 - 1976	Gas-phase chemistry in up-scaled plasma enhanced metal-organic chemical-vapor deposition of TiN and Ti(C,N) on tool steel Driessen JPAM, Kuypers AD, Schoonman J
1977 - 1982	Effect of nondiamond carbon on electron transport path of field-emitted electrons from undoped polycrystalline diamond films Shim JY, Baik HK, Song KM
1983 - 1986	Effects of interface mixing on adhesion of amorphous carbon films synthesized by variable-energy direct carbon ion beam deposition Sohn MH, Kim SI
1987 - 1992	Synthesis of diamondlike carbon films with superlow friction and wear properties Erdemir A, Eryilmaz OL, Fenske G
1993 - 1997	Surface acoustic wave propagation properties of nitrogenated diamond-like carbon films Kim JY, Chung HJ, Kim HJ, Cho HM, Yang HK, Park JC
1998 - 2002	Sputtered coatings for microfluidic applications Matson DW, Martin PM, Bennett WD, Johnston JW, Stewart DC, Bonham CC
2003 - 2005	Novel proton exchange membrane thin-film fuel cell for microscale energy conversion Morse JD, Jankowski AF, Graff RT, Hayes JP
2006 - 2011	Low-temperature polysilicon deposition by ionized magnetron sputtering Joo J
2012 - 2016	Study of the mechanical behavior of plasma-deposited silica films on polycarbonate and steel Hofrichter A, Constantinescu A, Benayoun S, Bulkin P, Drevillon B
2017 - 2022	Carburizing of tantalum by radio-frequency plasma assisted chemical vapor deposition Rubinshtein A, Shneck R, Raveh A, Klemberg-Sapieha JE, Martinu L
2023 - 2026	Subnanometer scale tribological properties of nitrogen containing carbon coatings used in magnetic storage devices Wienss A, Persch-Schuy G, Hartmann R, Joeris P, Hartmann U
2027 - 2032	Air bearing collision dynamics Stupp SE, Blanco RJ, Strom BD, Chen L
2033 - 2038	Angle-resolved ESCA methods: Distribution and molecular conformation of perfluoropolyether lubricant Karplus MA, Pocker D