Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.26, No.1 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (25 articles)

1 - 4	Conventional triode ionization gauge with carbon nanotube cold electron emitter Xiao L, Qian L, Wei Y, Liu L, Fan SS
5 - 7	Thermotunnel refrigerator with vacuum/insulator tunnel barrier: A theoretical analysis Tavkhelidze A, Svanidze V, Tsakadze L
8 - 16	Damage-free microwave-excited plasma etching without carrier deactivation of heavily doped Si under thin silicide layer Goto T, Ikenaga K, Teramoto A, Hirayarna M, Sugawa S, Ohmi T
17 - 22	Experimental studies of Ge1-xCx and Ge1-x-yCxAly thin films Soukup RJ, Huguenin-Love JL, Ianno NJ, Thompson DW
23 - 28	Physical vapor deposition synthesis of tungsten monocarbide (WC) thin films on different carbon substrates Weigert EC, Humbert MP, Mellinger ZJ, Ren Q, Beebe TP, Bao L, Chen JG
29 - 35	Thermal stability and thermo-mechanical properties of magnetron sputtered Cr-Al-Y-N coatings Rovere F, Mayrhofer PH
36 - 43	Fundamental reliability of 1.5-nm-thick silicon oxide gate films grown at 150 degrees C by modified reactive ion beam deposition Yamada H
44 - 51	Stress evolution and defect diffusion in Cu during low energy ion irradiation: Experiments and modeling Chan WL, Chason E
52 - 61	Silicon etch in the presence of a fluorocarbon overlayer: The role of fluorocarbon cluster ejection Vegh JJ, Humbird D, Graves DB
62 - 67	Oxygen adsorption on Ag/Si(111)-7x7 surfaces Zhang Z, Jiao J, Jiang ZQ, Tan DL, Fu Q, Bao XH, Liu X, Jia JF, Xue QK
68 - 77	Tritium migration along the cryopumping section Malyshev OB
78 - 82	Quantitative determination of reaction products by in-line thermal desorption spectroscopy: The system methanol/Pd(111) Dernirci E, Winkler A
83 - 89	Growth of ordered SrO layers on Si(100) using metal-organic surface reactions Willis BG, Mathew A
90 - 96	Effects of interfacial layer structures on crystal structural properties of ZnO films Park JS, Minegishi T, Lee SH, Irn IH, Park SH, Hanada T, Goto T, Cho MW, Yao T, Hong SK, Chang JH
97 - 102	Charge-state distributions of metallic electron cyclotron resonance plasmas Kumar P, Rodrigues G, Lakshmy PS, Kanjilal D, Kumar R
103 - 113	Numerical investigation via three-dimensional Monte Carlo modeling of sputtering and deposition processes in a direct current unbalanced magnetron discharge Sobbia R, Browning PK, Bradley JW
114 - 122	Lithium manganese oxide films fabricated by electron beam directed vapor deposition Jin SW, Wadley HNG
123 - 127	Characterization of gaseous species in scanning atmospheric rf plasma with transmission infrared spectroscopy Kim SH, Kim JH, Kang BK
128 - 132	Two-stage flow-dividing system for the calibration of vacuum gauges Yoshida H, Arai K, Akimichi H, Hirata M
133 - 139	Growth and characterization of vanadium dioxide thin films prepared by reactive-biased target ion beam deposition West KG, Lu JW, Yu J, Kirkwood D, Chen W, Pei YH, Claassen J, Wolf SA
140 - 145	Synthesis and characteristics of new quaternary Ti-Mo-Si-N coatings by a hybrid coating system Jeon JW, Hong SG, Kim KR, Kim KH
146 - 150	Synthesis and mechanical properties of CrMoCxN1-x coatings deposited by a hybrid coating system Yun JH, Heo SJ, Kim KR, Kim KH
151 - 160	Surface roughening of silicon, thermal silicon dioxide, and low-k dielectric coral films in argon plasma Yin YP, Sawin HH
161 - 173	Angular etching yields of polysilicon and dielectric materials in Cl-2/Ar and fluorocarbon plasmas Yin YP, Sawin HH
174 - 183	Lithium phosphorous oxynitride films synthesized by a plasma-assisted directed vapor deposition approach Kim YG, Wadley HNG