Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.145, No.7 Entire volume, number list

ISSN: 0013-4651 (Print)

In this Issue (68 articles)

2209 - 2213	A study on the origin of nonfaradaic behavior of anodic contact glow discharge electrolysis - The relationship between power dissipated in glow discharges and nonfaradaic yields Sengupta SK, Singh R, Srivastava AK
2214 - 2218	Reactivation of passivated iron electrodes ino magnetic field Wang C, Chen SH, Ma HY
2219 - 2225	Study of the hydrogen evolution reaction on Ni-Mo-P electrodes in alkaline solutions Shervedani RK, Lasia A
2225 - 2230	The electrochromic behavior of indium tin oxide in propylene carbonate solutions Bressers PMMC, Meulenkamp EA
2231 - 2236	Electrochemical deposition of prussian blue from a single ferricyanide solution Yang R, Qian ZB, Deng JQ
2236 - 2240	The effect of nonstoichiometry of surface oxides formed during high temperature oxidation on the corrosion resistance of ferritic chromium steel Zimina T, Oshe E, Dubkov V, Zimin P, Zabrodskaya E
2241 - 2243	Structural and optical characterization of porous 3C-SiC Monguchi T, Fujioka H, Ono K, Oshima M, Serikawa T, Hayashi T, Horiuchi K, Yamashita S, Yoshii K, Baba Y
2244 - 2252	Morphological changes at the interface of the nickel-yttria stabilized zirconia point electrode Aaberg RJ, Tunold R, Mogensen M, Berg RW, Odegard R
2252 - 2257	On the reduction of lithium insertion capacity in hard-carbon anode materials with increasing heat-treatment temperature Buiel E, George AE, Dahn JR
2258 - 2264	Corrosion protection of untreated AA-2024-T3 in chloride solution by a chromate conversion coating monitored with Raman spectroscopy Zhao J, Frankel G, McCreery RL
2265 - 2275	The corrosion of Mo-Al alloys in a H-2/H2S/H2O gas mixture at 800-1000 degrees C Kai W, Bai CY
2276 - 2284	The effect of crevice-opening dimension on the stability of crevice corrosion for nickel in sulfuric acid Abdulsalam MI, Pickering HW
2285 - 2295	Characterization of AA2024-T3 by scanning Kelvin probe force microscopy Schmutz P, Frankel GS
2295 - 2306	Corrosion study of AA2024-T3 by scanning Kelvin probe force microscopy and in situ atomic force microscopy scratching Schmutz P, Frankel GS
2307 - 2313	Impedance studies of the oxygen reduction on thin porous coating rotating platinum electrodes Perez J, Gonzalez ER, Ticianelli EA
2314 - 2319	Electrochemical studies of carbon films from pyrolyzed photoresist Kim J, Song X, Kinoshita K, Madou M, White B
2320 - 2327	Surface studies of CuxCo3-xO4 electrodes for the electrocatalysis of oxygen evolution Fradette N, Marsan B
2327 - 2334	The thermal stability of lithium polymer batteries Song L, Evans JW
2334 - 2340	Spectroelectrochemical studies of indium hexacyanoferrate electrodes prepared by the sacrificial anode method Ho KC, Chen JC
2340 - 2348	Modification of the lithium metal surface by nonionic polyether surfactants : Quartz crystal microbalance studies Mori M, Naruoka Y, Naoi K, Fauteux D
2348 - 2353	Electrochemical synthesis of urea at gas-diffusion electrodes -IV. Simultaneous reduction of carbon dioxide and nitrate ions with various metal catalysts Shibata M, Yoshida K, Furuya N
2354 - 2358	Characterization of high-surface area electrocatalysts using a rotating disk electrode configuration Schmidt TJ, Gasteiger HA, Stab GD, Urban PM, Kolb DM, Behm RJ
2358 - 2362	Water electrolysis using diamond thin-film electrodes Katsuki N, Takahashi E, Toyoda M, Kurosu T, Iida M, Wakita S, Nishiki Y, Shimamune T
2362 - 2369	The mechanism of electropolishing of titanium in methanol-sulfuric acid electrolytes Piotrowski O, Madore C, Landolt D
2369 - 2377	Electrochemical behavior and surface morphologic changes of copper substrates in the presence of 2,5-dimercapto-1,3,4-thiadiazole - In situ EQCM and phase measurement interferometric microscopy Chi QJ, Tatsuma T, Ozaki M, Sotomura T, Oyama N
2377 - 2380	Super dense LiC2 as a high capacity Li intercalation anode Bindra C, Nalimova VA, Sklovsky DE, Benes Z, Fischer JE
2380 - 2385	Photochemical and photoelectrochemical behavior of a novel TiO2/Ni(OH)(2) electrode Kostecki R, Richardson T, McLarnon D
2386 - 2396	Quartz crystal microbalance investigation of electrochemical calcium carbonate scaling Gabrielli C, Keddam M, Khalil A, Maurin G, Perrot H, Rosset R, Zidoune M
2396 - 2404	Passivity and breakdown of carbon steel in organic solvent mixtures of propylene carbonate and dimethoxyethane Shifler DA, Kruger J, Moran PJ
2404 - 2411	The impact of the operation mode on pattern formation in electrode reactions - From potentiostatic to galvanostatic control Mazouz N, Flatgen G, Krischer K, Kevrekidis IG
2411 - 2418	Influence of nitrogen-containing precursors on the electrocatalytic activity of heat-treated Fe(OH)(2) on carbon black for O-2 reduction Cote R, Lalande G, Guay D, Dodelet JP, Denes G
2419 - 2424	Study of the structural change due to heat-treatment in high resistivity electroless NiPC film Osaka T, Higashikawa T, Iizuka A, Takai M, Kim M
2424 - 2431	Prediction of Li intercalation and battery voltages in layered vs. cubic LixCoO2 Wolverton C, Zunger A
2431 - 2438	Gas conversion impedance : A test geometry effect in characterization of solid oxide fuel cell anodes Primdahl S, Mogensen M
2439 - 2444	Changes in the environment of hydrogen in porous silicon with thermal annealing Ogata YH, Kato F, Tsuboi T, Sakka T
2445 - 2447	Room temperature operating solid-state sensor for chlorine gas Niizeki Y, Shibata S
2448 - 2452	Incorporation of cadmium sulfide into nanoporous silicon by sequential chemical deposition from solution Gros-Jean M, Herino R, Lincot D
2453 - 2456	Effect of the gas-phase reaction in metallorganic chemical vapor deposition of TiN from tetrakis(dimethylamido)titanium Yun JY, Park MY, Rhee SW
2456 - 2460	Fibrous and porous microstructure formation in 6H-SiC by anodization in HF solution Shin W, Hikosaka T, Seo WS, Ahn HS, Sawaki N, Koumoto K
2461 - 2464	Dry etching of SrS thin films Lee JW, Davidson MR, Pathangey B, Holloway PH, Pearton SJ
2465 - 2470	Tribochemical reactions of silicon : An in situ infrared spectroscopy characterization Muratov VA, Olsen JE, Gallois BM, Fischer TE, Bean JC
2471 - 2475	High-temperature diffusion of hydrogen and deuterium in titanium and Ti3Al Naito S, Yamamoto M, Doi M, Kimura M
2475 - 2479	Photoluminescence studies of cadmium selenide crystals in contact with group III trialkyl derivatives Winder EJ, Kuech TF, Ellis AB
2480 - 2485	Reduction in contact resistance with in situ O-2 plasma treatment Yonekura K, Sakamori S, Kawai K, Miyatake H
2486 - 2489	Measurements of VOCs with a semiconductor electronic nose Horrillo MC, Getino J, Ares L, Robla JI, Sayago I, Gutierrez FJ
2489 - 2493	Interface states distribution in electrical stressed oxynitrided gate-oxide Belkouch S, Nguyen TK, Landsberger LM, Aktik C, Jean C, Kahrizi M
2494 - 2498	Design of injection feed multiwafer low-pressure chemical vapor deposition reactors Zambov L, Popov C, Ivanov B
2499 - 2508	Aqueous KOH etching of silicon (110) - Etch characteristics and compensation methods for convex corners Kim B, Cho DID
2508 - 2512	Amorphous hydrogenated silicon films for solar cell application obtained with 55 kHz plasma enhanced Chemical vapor deposition Budaguan BG, Sherchenkov AA, Stryahilev DA, Sazonov AY, Radosel'sky AG, Chernomordic VD, Popov AA, Metselaar JW
2512 - 2516	Dry etch patterning of LaCaMnO3 and SmCo thin films Wang JJ, Childress JR, Pearton SJ, Sharifi F, Dahmen KH, Gillman ES, Cadieu FJ, Rani R, Qian XR, Chen L
2516 - 2522	Growth kinetics of chemical vapor deposition of beta-SiC from (CH3)(2)SiCl2/Ar Tago T, Kawase M, Yoshihara Y, Hashimoto K
2523 - 2529	Gravitational stress-induced dislocations in large-diameter silicon wafers studied by X-ray topography and computer simulation Shimizu H, Isomae S, Minowa K, Satoh T, Suzuki T
2530 - 2534	Boron in polycrystalline SixGe1-x films Mangelinck D, Hellberg PE, Zhang SL, d'Heurle FM
2534 - 2537	Enhanced diffusion of boron in Si during doping form borosilicate glass Miyake M
2538 - 2545	Barrier properties of very thin Ta and TaN layers against copper diffusion Wang MT, Lin YC, Chen MC
2545 - 2548	Investigation of boron penetration through thin gate dielectrics including role of nitrogen and fluorine Navi M, Dunham ST
2548 - 2552	Evaporation of oxygen-containing species from boron-doped silicon melts Maeda S, Kato M, Abe K, Nakanishi H, Hoshikawa K, Terashima K
2552 - 2558	Electric properties of [(Zro(2))(0.8)(CeO2)(0.2)](Ca-O)(0.1) solid solution Kawamura K, Watanabe K, Nigara Y, Kaimai A, Kawada T, Mizusaki J
2558 - 2562	Chemical reactions in plasma-assisted chemical vapor deposition of titanium Ohshita Y, Watanabe K
2563 - 2568	High temperature barrier electrode technology for high density ferroelectric memories with stacked capacitor structure Onishi S, Nagata M, Mitarai S, Ito Y, Kudo J, Sakiyama K, Desu SB, Bhatt HD, Vijay DP, Hwang Y
2569 - 2572	Irregular surface and porous structure of SiO2 films deposited at low temperature and low pressure Dultsev FN, Nenasheva LA, Vasilyeva LL
2572 - 2576	Electron field emission from chemical vapor deposited diamond films Obraztsov AN, Pavlovsky IY, Volkov AP, Rakova EV, Nagovitsyn SP
2576 - 2580	SiOF film deposition using FSi(OC2H5)(3) gas in a helicon plasma source Yun SM, Chang HY, Lee KM, Kim DC, Choi CK
2581 - 2585	Growth of III-nitrides on ZnO, LiGaO2, and LiAlO2 substrates MacKenzie JD, Donovan SM, Abernathy CR, Pearton SJ, Holloway PH, Linares R, Zavada J, Chai B
2585 - 2589	Copper dry etching with Cl-2/Ar plasma chemistry Lee JW, Park YD, Childress JR, Pearton SJ, Sharifi F, Ren F
2589 - 2594	Impact of iron contamination and roughness generated in ammonia hydrogen peroxide mixtures (SC1) on 5 nm gate oxides De Gendt S, Knotter DM, Kenis K, Mertens PW, Heyns MM
2595 - 2601	Impact of high-temperature dry local oxidation on gate oxide quality Bellutti P, Zorzi N
2602 - 2607	Detection of metallic contaminants on silicon by surface sensitive minority carrier lifetime measurements Norga GJ, Platero M, Black KA, Reddy AJ, Michel J, Kimerling LC