Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.145, No.5 Entire volume, number list

ISSN: 0013-4651 (Print)

In this Issue (70 articles)

L73 - L74	A 400 mAh/g aerogel-like V2O5 cathode for rechargeable lithium batteries Coustier F, Passerini S, Smyrl WH
L75 - L78	Influence of residual point defect supersaturation on the formation of grown-in oxide precipitate nuclei in CZ-Si Kissinger G, Vanhellemont J, Lambert U, Graf D, Dornberger E, Richter H
L79 - L81	Improvement of pitting corrosion resistance of type 304 stainless steel by modification of passive film with ultraviolet light irradiation Fujimoto S, Yamada T, Shibata T
L82 - L84	Photoelectrochemical reduction of CO2 at high current densities at p-InP electrodes Hirota K, Tryk DA, Hashimoto K, Okawa M, Fujishima A
L85 - L88	Structural, spectroscopic, and electrochemical characterization of boron-doped diamond films from different provenances Li LF, Totir DA, Vinokur N, Miller B, Chottiner G, Evans EA, Angus JC, Scherson DA
L88 - L90	Selective wet etching of lithium gallate Kropewnicki TJ, Doolittle WA, Carter-Coman C, Kang S, Kohl PA, Jokerst NM, Brown AS
1415 - 1420	Charge-discharge properties of composite of synthetic graphite and poly(3-n-hexylthiophene) as an anode active material in rechargeable lithium-ion batteries Kuwabata S, Tsumura N, Goda S, Martin CR, Yoneyama H
1421 - 1426	The correlation between charge/discharge rates and morphology, surface chemistry, and performance of Li electrodes and the connection to cycle life of practical batteries Aurbach D, Weissman I, Yamin H, Elster E
1426 - 1430	Behavior of silver in physiological solutions Djokic SS, Burrell RE
1430 - 1434	Adhesion mechanism of electroless copper film formed on ceramic substrates using ZnO thin film as an intermediate layer Yoshiki H, Hashimoto K, Fujishima A
1434 - 1441	Evidence for direct gamma-NiOOH <->beta-Ni(OH)(2) transitions during electrochemical cycling of the nickel hydroxide electrode Sac-Epee N, Palacin MR, Delahaye-Vidal A, Chabre Y, Tarascon JM
1442 - 1449	Formation of thin films of CdTe, CdSe, and CdS by electrochemical atomic layer epitaxy Colletti LP, Flowers BH, Stickney JL
1449 - 1454	Utilization of hydrogen sulfide in an intermediate-temperature ceria-based solid oxide fuel cell Peterson DR, Winnick J
1454 - 1461	A neutron reflectivity study of [Os(bipy)(2)(PVP)(10)Cl](+) polymer film modified electrodes : Effect of pH and counterion Wilson RW, Cubitt R, Glidle A, Hillman AR, Saville PM, Vos JG
1462 - 1469	Examination of the role of molybdenum in passivation of stainless steels using AC impedance spectroscopy Jargelius-Pettersson RFA, Pound BG
1469 - 1477	Electrochemical promotion of Pt catalyst electrodes deposited on Na2Zr2Si2PO12 during ethylene oxidation Petrolekas PD, Brosda S, Vayenas CG
1478 - 1482	Evaluation of Zr(Ni,Mn)(2) Laves phase alloys as negative active material for Ni-MH electric vehicle batteries Knosp B, Jordy C, Blanchard P, Berlureau T
1483 - 1488	Electrochemical quartz crystal microbalance studies of polypyrrole growth on self-assembled nucleation sites Wurm DB, Zong K, Kim YH, Kim YT, Shin M, Jeon IC
1489 - 1501	Electrochemical-calorimetric studies of lithium-ion cells Hong JS, Maleki H, Al Hallaj S, Redey L, Selman JR
1502 - 1506	Application of hydrogen diffusion anodes in electrolytic processes using methanol-water mixtures Cabot PL, Centelles M, Segarra L, Casado J
1506 - 1510	Chemical formation of a solid electrolyte interface on the carbon electrode of a Li-Ion cell Scott MG, Whitehead AH, Owen JR
1511 - 1517	Model of cathode reaction resistance in molten carbonate fuel cells Morita H, Mugikura Y, Izaki Y, Watanabe T, Abe T
1518 - 1520	Tuning the position of the redox couples in materials with NASICON structure by anionic substitution Padhi AK, Manivannan V, Goodenough JB
1521 - 1527	Network polymer electrolytes with free chain ends as internal plasticizer Kono M, Hayashi E, Watanabe M
1527 - 1536	Effect of aging on yttria-stabilized zirconia I. A study of its electrochemical properties Kondoh J, Kawashima T, Kikuchi S, Tomii Y, Ito Y
1536 - 1550	Effect of aging on yttria-stabilized zirconia II. A study of the effect of the microstructure on conductivity Kondoh J, Kikuchi S, Tomii Y, Ito Y
1550 - 1560	Effect of aging on yttria-stabilized zirconia III. A study of the effect of local structures on conductivity Kondoh J, Kikuchi S, Tomii Y, Ito Y
1561 - 1565	Blocking inhibitors in cathodic leveling III. Electrochemical impedance spectroscopy study Madore C, Agarwal P, Landolt D
1566 - 1571	The pitting behavior of iron-chromium thin film alloys in hydrochloric acid Ryan MP, Laycock NJ, Newman RC, Isaacs HS
1571 - 1577	Detection of localized corrosion of aluminum alloys using fluorescence microscopy Alodan MA, Smyrl WH
1578 - 1585	Profiles and performance curves in a parallel-plate reactor for the electrochemical fluorination of hydrocarbons Drake JA, Radke CJ, Newman J
1586 - 1592	Transport property and Raman spectroscopic studies of the polymer electrolyte system P(EO)(n)-NaTFSI Ferry A, Doeff MM, De Jonghe LC
1592 - 1598	Anomalous current rise and electrochemical reduction in Fe2O3-TiO2 ceramics Sheng J, Fukami T, Karasawa J
1598 - 1607	Microelectrode evaluation of transition metal-aluminum alloy electrodepositions in chloroaluminate ionic liquids Carlin RT, De Long HC, Fuller J, Trulove PC
1607 - 1614	Amorphous Nb/Fe-oxide ion-storage films for counter electrode applications in electrochromic devices Orel B, Macek M, Lavrencic-Stangar U, Pihlar B
1614 - 1623	An in situ electrochemical quartz crystal microbalance study of the dissolution process of a gold electrode in perchloric acid solution containing chloride ion Ye S, Ishibashi C, Shimazu K, Uosaki K
1624 - 1631	Comparative study of the electrochemical behavior of polycrystalline and nanocrystalline Ru powder in NaOH solution Roue L, Blouin M, Guay D, Schulz R
1632 - 1639	Denuded zone thickness from surface photovoltage measurements -Comparison with microscopy techniques Polignano ML, Brambilla M, Cazzaniga F, Pavia G, Zanderigo F
1640 - 1644	Effect of fluorine on surface morphology in selective epitaxial TiSi2 growth by plasma-enhanced chemical vapor deposition Saito K, Arita Y
1645 - 1649	Ultraclean Si/Si interface formation by surface preparation and direct bonding in ultrahigh vacuum Hermansson K, Grey F, Bengtsson S, Sodervall U
1649 - 1653	Novel low k dielectrics based on diamondlike carbon materials Grill A, Patel V, Jahnes C
1653 - 1659	Optimization of polysilicon encapsulated local oxidation of silicon - Cavity dimension effects on mechanical stress and gate oxide integrity Badenes G, Rooyackers R, Jones SK, Bazley D, Beanland R, De Wolf I, Deferm L
1659 - 1664	Tungsten chemical mechanical polishing Elbel N, Neureither B, Ebersberger B, Lahnor P
1664 - 1667	Field oxide thinning behavior in local oxidation of silicon process under enhanced oxidation conditions Jang SA, Yeo IS, Kim YB
1668 - 1671	A low temperature silicon-on-insulator fabrication process using Si MBE on double-layer porous silicon Zheng DW, Cui Q, Huang YP, Zhang XJ, Kwor R, Li AZ, Tang TA
1672 - 1677	Kinetics of the formation of titanium nitride layers by rapid thermal low pressure chemical vapor deposition from TiCl4-NH3-H-2 Imhoff L, Bouteville A, Remy JC
1677 - 1679	The effect of low-pressure and plasma-enhanced chemical vapor deposited tetraethylorthosilicate oxide film on a boron implant profile Tsang YL, Fitzgibbon G
1679 - 1683	Characterization of high quality nitrided gate dielectric films manufactured in reduced pressure furnace for ultralarge scale integration complementary metal oxide semiconductor applications Yoon G, Epstein Y
1684 - 1687	Excellent electrical characteristics of ultrafine trench isolation Shiozawa K, Oishi T, Maeda H, Murakami T, Yasumura K, Abe Y, Tokuda Y
1688 - 1692	An optical method for monitoring metal contamination during aqueous processing of silicon wafers Chopra D, Suni II
1692 - 1695	Segregation of oxygen at a solid/liquid interface in silicon Kakimoto K, Ozoe H
1696 - 1701	Effect of mixed-conducting interfacial layers on solid oxide fuel cell anode performance Tsai TP, Barnett SA
1701 - 1708	Power measurements for radio-frequency discharges with a parallel-plate-type reactor Kawata H, Kubo T, Yasuda M, Murata K
1708 - 1714	Tribochemical polishing of silicon nitride Hah SR, Fischer TE
1715 - 1719	Quantitative evaluation of precipitated oxygen in silicon by infrared spectroscopy - Still an open problem Sassella A, Borghesi A, Abe T
1720 - 1723	Thickness measurements of epitaxial layers of double epitaxial silicon wafers by far-infrared reflection Shirai H, Akai K, Abe T
1724 - 1729	Effect of surface iron on photoconductivity carrier recombination lifetime of p-type silicon Park HS, Helms CR, Ko DH
1729 - 1734	Deposition temperature dependence of optical gap and coloration efficiency spectrum in electrochromic tungsten oxide films Kubo T, Nishikitani Y
1735 - 1737	Extension of dose window for low-dose separation by implanted oxygen Ogura A
1738 - 1743	The realization of silicon-on-insulator utilizing trench-before-bond and polish stop technology Baine PT, Gay DL, Armstrong BM, Gamble HS
1744 - 1748	Sensing properties of an oxygen sensor using BaCe0.8Gd0.2O3-alpha ceramics as electrolytes Taniguchi N, Yasumoto E, Nakagiri Y, Gamo T
1748 - 1755	Surface states and photovoltaic effects in CdSe quantum dot films Kronik L, Ashkenasy N, Leibovitch M, Fefer E, Shapira Y, Gorer S, Hodes G
1755 - 1762	Ion drift processes in pyrex-type alkali-borosilicate glass during anodic bonding Nitzsche P, Lange K, Schmidt B, Grigull S, Kreissig U, Thomas B, Herzog K
1762 - 1767	Chemical diffusion through grain boundaries in mixed conductors Jamnik J, Maier J
1767 - 1771	Dry etching of deep Si trenches for released resonators in a Cl-2 plasma Weigold JW, Juan WH, Pang SW
1772 - 1779	Steady-state and transient behavior of thick-film tin oxide sensors in the presence of gas mixtures Llobet E, Vilanova X, Brezmes J, Sueiras JE, Alcubilla R, Correig X
1780 - 1786	The effects of dopants and A : B site nonstoichiometry on properties of perovskite-type proton conductors Guan J, Dorris SE, Balachandran U, Liu M
1786 - 1790	Determination of the trap density in amorphous silicon by quasi-static capacitance-voltage measurements Fahrner WR, Loffler S, Chan Y, Kwong S, Man K
1790 - 1794	Substrate effects on hardness and polishing of SiO2 thin films Kallingal CG, Tomozawa M, Murarka SP
1795 - 1800	Recombination centers created by Ar+-ion implantation into SIMOX substrates Takahashi M, Sakakibara Y, Ohno T