Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.141, No.3 Entire volume, number list

ISSN: 0013-4651 (Print)

In this Issue (54 articles)

603 - 611	The Correlation Between the Surface-Chemistry and the Performance of Li-Carbon Intercalation Anodes for Rechargeable Rocking-Chair Type Batteries Aurbach D, Eineli Y, Chusid O, Carmeli Y, Babai M, Yamin H
611 - 614	Influence of Electrolyte on Lithium Cycling Efficiency with Pressurized Electrode Stack Hirai T, Yoshimatsu I, Yamaki J
614 - 618	Capacitive-Type Humidity Sensors Using Polymerized Vinyl Carboxylate Matsuguchi M, Sadaoka Y, Nuwa Y, Shinmoto M, Sakai Y, Kuroiwa T
619 - 621	Rotating-Disk Studies in Molten Carbonates .1. Electrode Design Ramaswami K, Selman JR
622 - 629	Rotating-Disk Studies in Molten Carbonates .2. Meniscus and Film Effects Ramaswami K, Selman JR
629 - 635	Surface-Analysis and Electrochemistry of MoS2 Thin-Films Prepared by Intercalation-Exfoliation Techniques Santiago Y, Cabrera CR
636 - 642	Pitting Corrosion of Titanium Casillas N, Charlebois S, Smyrl WH, White HS
643 - 647	Surface Characterization of RuO2-IrO2-TiO2 Coated Titanium Electrodes Kameyama K, Tsukada K, Yahikozawa K, Takasu Y
648 - 651	Room-Temperature Coloration of Stainless-Steel by Alternating Potential Pulse Method Ogura K, Sakurai K, Uehara S
652 - 660	Application of an Electrochemical Quartz-Crystal Microbalance to a Study of the Anodic Deposition of Pbo2 and Bi-Pbo2 Films on Gold Electrodes Gordon JS, Young VG, Johnson DC
660 - 663	Photoelectrochemical Properties of Anatase and Rutile Films Prepared by the Sol-Gel Method Hamasaki Y, Ohkubo S, Murakami K, Sei H, Nogami G
664 - 669	Effects of Temperature and Powder Morphologies on the Cementation Rate of Copper in Alkaline Zinc Solution Masse N, Piron DL
669 - 673	Electrolytic Codeposition of Ni-Gamma-Al2O3 Thin-Films Webb PR, Robertson NL
674 - 679	Crystallinity and Photoluminescence in Stain-Etched Porous Si Steckl AJ, Xu J, Mogul HC
679 - 689	Anisotropic Chemical-Pattern Etching of Copper Foil .3. Mathematical-Model Georgiadou M, Alkire R
689 - 690	Electrical Charge and HF Concentration-Effect on Porous Silicon Formation Difrancia G, Salerno A
691 - 697	Metal Distribution in Jet Plating Karakus C, Chin DT
697 - 702	On the Electrical-Impedance Due to the Anodic-Dissolution of Silicon in HF Solutions Vanmaekelbergh D, Searson PC
703 - 708	Magnetic-Field Effects in High-Power Batteries .1. The Penetration of an Electric-Field into a Cylindrical Conductor Battaglia V, Newman J
708 - 713	Magnetic-Field Effects in High-Power Batteries .2. Time Constant of a Radial Circuit Terminated by a Cylindrical Cell with Inductance Battaglia V, Newman J
713 - 717	Effect of Iron on the Electrochemical Properties of the Nickel-Hydroxide Electrode Demourguesguerlou L, Delmas C
718 - 724	Rotating-Ring-Disk Electrode and Spectroelectrochemical Studies on the Oxidation of Iron in Alkaline-Solutions Zhang HY, Park SM
725 - 730	Electrocatalytic Oxidation of Glycerol .1. Behavior of Palladium Electrode in Alkaline-Medium Yildiz G, Kadirgan F
730 - 733	Electroless Copper Deposition Process Using Glyoxylic-Acid as a Reducing Agent Honma H, Kobayashi T
734 - 736	Improved Phosphosilicate Glass Passivation Against Cu Contamination Using the Rapid Thermal Annealing Process Miyazaki H, Kojima H, Hiraiwa A, Homma Y, Murakami K
737 - 741	Substrate Doping and Microroughness Effects in Rtp Temperature-Measurement by in-Situ Ellipsometry Sampson RK, Conrad KA, Massoud HZ, Irene EA
742 - 746	C-V Characteristics of Amorphous-Silicon Nitride Films Prepared by Hydrogen Radical-Assisted Plasma Chemical-Vapor-Deposition Yasui K, Takahashi H, Akahane T
747 - 750	Hopping Conduction in Molecular-Beam Epitaxial GaAs Grown at Very-Low Temperatures Look DC, Fang ZQ, Look JW, Sizelove JR
750 - 754	Insight into Gate Oxide Thinning Bellutti P, Lui A
754 - 758	Rapid Thermal Annealing of P-Type Silicon - Correlation Between Deep-Level Transient Spectroscopy and Lifetime Measurements Poggi A, Susi E, Butturi MA, Carotta MC
759 - 765	A Point-Defect Based 2-Dimensional Model of the Evolution of Dislocation Loops in Silicon During Oxidation Park HY, Jones KS, Law ME
765 - 771	Morphological Structure of Silicon-Carbide Grown by Chemical-Vapor-Deposition on Titanium Carbide Using Silane and Ethylene Kruaval GB, Parsons JD
771 - 777	Morphological Structure of Silicon-Carbide, Chemically Vapor-Deposited on Titanium Carbide, Using Ethylene, Carbon-Tetrachloride, and Silicon Tetrachloride Parsons JD, Kruaval GB
778 - 781	Photoelectrochemical Etching of 6H-SiC Shor JS, Kurtz AD
782 - 786	Electronic Conductivity in the La(Cr, Ni)O3 Perovskite System Hofer HE, Schmidberger R
787 - 795	A Kinetic-Study of Titanium Nitride Chemical-Vapor-Deposition Using Nitrogen, Hydrogen, and Titanium Tetrachloride Dekker JP, Vanderput PJ, Veringa HJ, Schoonman J
796 - 801	Characterization of Si-Si Bonding by Wright Etching Horning RD, Mirza A, Martin RR
802 - 806	Chemical Bath Deposition of ZnSe and Cuse Thin-Films Using N,N-Dimethylselenourea Estrada CA, Nair PK, Nair MT, Zingaro RA, Meyers EA
807 - 809	A Galvanic Series for Thin-Film Metallizations and Barrier Layers Commonly Used in the Microelectronics Industry Griffin AJ, Hernandez SE, Brotzen FR, Dunn CF
810 - 815	Thermal Component of the Optical-Response of Thin-Film High-T(C) Superconductors Phelan PE, Hijikata K
816 - 824	The Influence of Thermal Treatments on the Adhesion of Electrolessly Deposited Ni(P) Layers on Alumina Ceramic Severin JW, Hokke R, Vanderwel H, Dewith G
824 - 842	Chemical-Vapor-Deposition of Silicon from Disilane Under Reduced Pressure in a Circular Impinging Jet Reactor - Simulation and Experiments Wang YB, Teyssandier F, Simon J, Feurer R
843 - 848	The Dependence of the Stress of Chemical-Vapor-Deposited Tungsten Films on Deposition Parameters Schmitz J, Kang S, Wolters R, Vandenaker K
849 - 853	Low-Temperature Deposition of Tin Using Tetrakis(Dimethylamido)-Titanium in an Electron-Cyclotron-Resonance Plasma Process Weber A, Nikulski R, Klages CP, Gross ME, Brown WL, Dons E, Charatan RM
853 - 858	Ellipsometric Examination of Structure and Growth-Rate of Metalloorganic Chemical-Vapor-Deposited Ta2O5 Films on Si(100) An CH, Sugimoto K
L19 - L21	The Ternary HCl-Imcl-AlCl3 Ambient-Temperature Molten-Salt System - Expansion of the Electrochemical Window on Proton Addition to a Weakly Basic AlCl3-Imcl Ionic Liquid Campbell JL, Johnson KE
L21 - L22	Reversible Lithium-Graphite Anodes in Room-Temperature Chloroaluminate Melts Carlin RT, Fuller J, Hedenskoog M
L23 - L24	Preparation of Microarray Electrodes by Sonochemical Ablation of Polymer-Films Madigan NA, Hagan CR, Coury LA
L25 - L26	V2O5 Xerogel Films as Intercalation Hosts for Lithium Park HK, Smyrl WH
L26 - L28	Redox Cyclability of a Self-Doped Polyaniline Kim EY, Lee MH, Moon BS, Lee CJ, Rhee SB
L29 - L30	A Novel Synthetic Route to Nb2O5 Thin-Films for Electrochromic Devices Faria RC, Bulhoes LO
L30 - L33	Double-Layer Effects Associated with Surface Reconstruction on a Au (100) Electrode Fawcett WR, Fedurco M, Kovacova Z
L34 - L34	The Early-Stage Oxidation-Kinetics of CeO2 Solcoated Nickel (Vol 140, Pg 2606, 1993) Czerwinski F
L34 - L34	Effects of the Anodic Decomposition of GaAs Particles at the Pt Electrode Interface (Vol 140, Pg 2568, 1993) Chun JH