D7 - D12 |
Electrochemical conversion of primary alkyl halides to alkenes at platinum cathodes Simonet J, Peters DG |
B33 - B38 |
Corrosion inhibition by thiol-derived SAMs for enhanced wire bonding on Cu surfaces Whelan CM, Kinsella M, Ho HM, Maex K |
B39 - B44 |
Semiconductive properties of passive films formed on Fe-18Cr in borate buffer solution Tsuchiya H, Fujimoto S, Shibata T |
B45 - B52 |
Kinetic model for aluminum dissolution in corrosion pits Muthukrishnan K, Hebert KR |
B53 - B58 |
Electrochemical behavior of the active surface layer on rolled aluminum alloy sheet Ambat R, Davenport AJ, Afseth A, Scamans G |
B59 - B70 |
Chromate conversion coating on aluminum alloys - I. Formation mechanism Campestrini P, Goeminne G, Terryn H, Vereecken J, de Wit JHW |
B71 - B76 |
Corrosion behavior and passive film characteristics formed on Ti, Ti3SiC2, and Ti4AlN3 in H2SO4 and HCl Jovic VD, Barsoum MW |
B77 - B81 |
The effects of chloride implantation on pit initiation in aluminum Wall FD, Johnson CM, Barbour JC, Martinez MA |
B82 - B89 |
Graph theory and the passivity of binary alloys - More examples McCafferty E |
B90 - B97 |
Parameter sensitivity analysis of pit initiation at single sulfide inclusions in stainless steel Kamrunnahar M, Braatz RD, Alkire RC |
B98 - B104 |
Electrodegradation of chlorofluorocarbons in a laboratory-scale flow cell with a hydrogen diffusion anode Cabot PL, Segarra L, Casado J |
D13 - D23 |
Electrochemical codeposition of copper-strontium hydroxide films from dimethylsulfoxide solutions Lepiller C, Poissonnet S, Bonnaillie P, Giunchi G, Legendre F |
D24 - D29 |
Synthesis and oxidation of V2AlC and (Ti-0.5, V-0.5)(2)AlC in air Gupta S, Barsoum MW |
E41 - E45 |
Switching potentials and conductivity of polypyrrole films prepared in the ionic liquid 1-butyl-3-methylimidazolium hexafluorophosphate Boxall DL, Osteryoung RA |
E46 - E50 |
Structural analysis of Ce1-xMxO2-0.5x-delta (M 5 Gd,Sm,Y) by high temperature XRD under various oxygen partial pressures Wang SR, Oikawa E, Hashimoto T |
E51 - E55 |
An interface-free-energy approach to semiconductor electrode chemistry - Examples of Si and Ge Chazalviel JN, Maroun F, Ozanam F |
E56 - E60 |
Evaluation of in situ electroenzymatic regeneration of coenzyme NADH in packed bed membrane reactors - Biosynthesis of lactate Chen X, Fenton JM, Fisher RJ, Peattiec RA |
E61 - E68 |
Electrochemistry of conductive polymers - XXIX. Polyfluorene growth in dichloromethane and acetonitrile: A comparative study Sharma HS, Park SM |
E69 - E79 |
Oxidation of hydroxylamine on the rotating solid electrodes - I. Oxidation of hydroxylamine in protonated form Piela B, Wrona PK |
E80 - E83 |
Electrochemical deposition of a pyrrole-1-yl substituted perylene diimide for photoluminescence and electrochromism Choi W, Ko HC, Moon B, Lee H |
F11 - F16 |
Nanocomposite low-k SiCOH films by direct PECVD using vinyltrimethylsilane Kwak SK, Jeong KH, Rhee SW |
F17 - F21 |
Improved characteristics of ultrathin CeO2 by using postnitridation annealing Wang JC, Hung YP, Lee CL, Lei TF |
F22 - F28 |
Stability of advanced gate stack devices Kim I, Han SK, Osburn CM |
F29 - F35 |
Effect of post-metallization annealing for alternative gate stack devices Kim I, Han SK, Osburn CM |
G85 - G88 |
Arrhenius characterization of ILD and copper CMP processes Sorooshian J, DeNardis D, Charns L, Li Z, Shadman F, Boning D, Hetherington D, Philipossiana A |
G89 - G92 |
TDDB reliability improvement of Cu damascene with a bilayer-structured alpha-SiC : H dielectric barrier Chiang CC, Chen MC, Wu ZC, Li LJ, Jang SM, Yu CH, Liang MS |
G93 - G97 |
Leakage and breakdown mechanisms of Cu comb capacitors with bilayer-structured alpha-SiCN/alpha-SiC Cu-cap barriers Chiang CC, Ko IH, Chen MC, Wu ZC, Lu YC, Jang SM, Liang MS |
G98 - G103 |
The effects of residual RTOs on formation of CoSi2 and its properties for 0.18 mu m CMOS Lee WG |
H27 - H32 |
Full color screen by EPD combined with photolithography for flat panel displays Yum JH, Sung YE |
H33 - H39 |
Fabricating conducting polymer electrochromic devices using ionic liquids Lu W, Fadeev AG, Qi BH, Mattes BR |
H40 - H43 |
Invariable cathodoluminescent intensity of ZnS : Mn phosphor operated at low-energy fluorescent display devices Shin SH, You YC, Lee SH |
H44 - H48 |
Surface charge analysis of ultrathin HfO2, SiO2, and Si3N4 Takeuchi H, King TJ |
H49 - H51 |
Cathodoluminescence of Eu3+, Tb3+, and Tb3+-Eu3+ pair-activated Zn3Ta2O8 Jiao H, Wang JG, Liao FH, Tian SJ, Jing XP |
J15 - J20 |
Electrochemical preparation and structural characterization of a graphite B[OC(CF3)(2)C(O)O](2)(-) intercalation compound Yan W, Lerner MM |
A185 - A195 |
Edge effects on reference electrode measurements in PEM fuel cells He WS, Van Nguyen T |
A196 - A203 |
Development of first principles capacity fade model for Li-ion cells Ramadass P, Haran B, Gomadam PM, White R, Popov BN |
A204 - A208 |
Factors influencing the capacity fade of spinel lithium manganese oxides Shin YJ, Manthiram A |
A209 - A215 |
Complexes of lithium imide salts with tetraglyme and their polyelectrolyte composite materials Pappenfus TM, Henderson WA, Owens BB, Mann KR, Smyrl WH |
A216 - A223 |
Inorganic-organic polymer electrolytes based on PEG400 and Al[OCH(CH3)(2)](3) I. Synthesis and vibrational characterizations Di Noto V, Zago V |
A224 - A231 |
Inorganic-organic polymer electrolytes based on PEG400 and Al[OCH(CH3)(2)](3) II. Morphology, thermal stability, and conductivity mechanism Di Noto V, Zago V, Pace G, Fauri M |
A232 - A237 |
High-performance anode for H2S-Air SOFCs Wei GL, Luo JL, Sanger AR, Chuang KT |
A238 - A245 |
PEO-LiN(SO2CF2CF3)(2) polymer electrolytes - V. Effect of fillers on ionic transport properties Shin JH, Passerini S |
A246 - A251 |
Soft X-ray absorption spectroscopic study of a LiNi0.5Mn0.5O2 cathode during charge Yoon WS, Balasubramanian M, Yang XQ, Fu ZG, Fischer DA, McBreen J |
A252 - A259 |
Synthesis and characterization of (La0.75Sr0.25)Cr0.5Mn0.5O3-delta, a redox-stable, efficient perovskite anode for SOFCs Tao SW, Irvine JTS |
A260 - A264 |
Alkaline fuel cell with intrinsic energy storage Wang CS, Appleby AJ, Cocke DL |
A265 - A272 |
Numerical simulation on fast charging nickel metal hydride traction batteries Yang XG, Liaw BY |
A273 - A280 |
In situ investigation of the volume change in li-ion cell with charging and discharging - Satellite power applications Wang XM, Sone Y, Kuwajima S |
A281 - A290 |
How to achieve maximum utilization of hydrous ruthenium oxide for supercapacitors Hu CC, Chen WC, Chang KH |
A291 - A295 |
Investigation on the first-cycle charge loss of graphite anodes by coating of the pyrolytic carbon using tumbling CVD Han YS, Jung JH, Lee JY |
A296 - A303 |
Topotactic two-phase reactions of Li[Ni1/2Mn3/2]O-4 (P4(3)32) in nonaqueous lithium cells Ariyoshi K, Iwakoshi Y, Nakayama N, Ohzuku T |
A304 - A310 |
Polymer electrolyte fuel cells based on phosphoric acid-impregnated poly(2,5-benzimidazole) membranes Asensio JA, Borro S, Gomez-Romero P |
A311 - A325 |
Transport in polymer-electrolyte membranes - II. Mathematical model Weber AZ, Newman J |
A326 - A339 |
Transport in polymer-electrolyte membranes - III. Model validation in a simple fuel-cell model Weber AZ, Newman J |
C103 - C111 |
Influence of additives and pulse electrodeposition parameters on production of nanocrystalline zinc from zinc chloride electrolytes Youssef KMS, Koch CC, Fedkiw PS |
C112 - C118 |
Magnetohydrodynamic analysis of silver electrocrystallization from a nitric and tartaric solution Aaboubi O, Amblard J, Chopart JP, Olivier A |
C119 - C126 |
Simulation of pulsed electrodeposition for giant magnetoresistance FeCoNiCu/Cu multilayers Huang Q, Podlaha EJ |
C127 - C132 |
Ruthenium bottom electrode prepared by electroplating for a high density DRAM capacitor Kwon OJ, Cha SH, Kim JJ |
C133 - C141 |
Influence of chemical pretreatment of epoxy polymers on the adhesion strength of electrochemically deposited Cu for use in electronic interconnections Siau S, Vervaet A, Schacht E, Van Calster A |
C142 - C148 |
Microfabrication of glassy carbon by electrochemical etching Kiema GK, Ssenyange S, McDermott MT |
C149 - C154 |
Cr-free passivation on ZnNi alloys Muller C, Sarret M, Garcia E, Ortega JA |
G104 - G108 |
Mechanical removal in CMP of copper using alumina abrasives Guo LR, Subramanian RS |
G109 - G112 |
Atomic layer deposition of ruthenium thin films for copper glue layer Kwon OK, Kim JH, Park HS, Kang SW |
G113 - G118 |
Smart fabrication process of an Ir-IrOx top-electrode on a PZT film for reliable FeRAM Inoue N, Hayashi Y |
G119 - G130 |
Using interdigitated electrodes for measuring photoacid generator kinetics in chemically amplified resists Berger CM, Byers JD, Henderson CL |
G131 - G135 |
Effects of AsH3 surface treatment for the improvement of ultrashallow area-selective regrown GaAs sidewall tunnel junction Oyama Y, Ohno T, Suto K, Nishizawa J |
G136 - G143 |
Improved 3C-SiC films epitaxially grown on Si by flash lamp processing Stoemenos J, Panknin D, Eickhoff M, Heera V, Skorupa W |
G144 - G148 |
Effects of process and gate doping species on negative-bias-temperature instability of p-channel MOSFETs Lee DY, Huang TY, Lin HC, Chiang WJ, Huang GW, Wanga T |
G149 - G154 |
Analysis of experimental data for metallic impurity out-diffusion from deep-UV photoresist Yang TS, Hsu NT, Chen KS, Ko FH |
G155 - G161 |
Mesoscale Monte Carlo simulation of photoresist processing Schmid GM, Stewart MD, Burns SD, Willson CG |