| 3291 - 3295 |
Rapidly Quenched Ni64Zr36 Fiber Anodes for Ni/Hydride Rechargeable Batteries
Ciureanu M, Stromolsen JO, Ryan DH, Rudkowski P, Rudkowska G, Bondac B |
| 3296 - 3299 |
Characterization of Sputter-Deposited Limn2O4 Thin-Films for Rechargeable Microbatteries
Hwang KH, Lee SH, Joo SK |
| 3300 - 3305 |
Barium Metaplumbate for Lead/Acid Batteries
Kao WH, Haberichter SL, Patel P |
| 3306 - 3311 |
Transient Electrochemical Techniques for Studying Electrodeposition of Niobium in Fused NaCl-KCl
Lantelme F, Berghoute Y |
| 3312 - 3317 |
Surface-Enhanced Raman-Scattering from Pyridine Adsorbed on Thin-Layers of Stainless-Steel
Oblonsky LJ, Devine TM, Ager JW, Perry SS, Mao XL, Russo RE |
| 3318 - 3324 |
Electrochemical Reduction of 1,5-Dihalopentanes at Carbon Cathodes in Dimethylformamide
Pritts WA, Peters DG |
| 3325 - 3331 |
Phosphorus-Acid Impurities in Phosphoric-Acid Fuel-Cell Electrolytes .1. Voltammetric Study of Impurity Formation
Sugishima N, Hinatsu JT, Foulkes FR |
| 3332 - 3335 |
Phosphorus-Acid Impurities in Phosphoric-Acid Fuel-Cell Electrolytes .2. Effects on the Oxygen Reduction Reaction at Platinum-Electrodes
Sugishima N, Hinatsu JT, Foulkes FR |
| 3336 - 3342 |
Mobility and Ionic Association of Lithium and Quaternary Ammonium-Salts in Propylene Carbonate and Gamma-Butyrolactone
Ue M |
| 3343 - 3346 |
Thermal Incorporation of External Oxygen into Emd-Derived Manganese Oxides
Xu CN, Miyazaki K |
| 3347 - 3356 |
Chemical-Composition of Passive Films on AISI-304 Stainless-Steel
Lorang G, Belo MD, Simoes AM, Ferreira MG |
| 3357 - 3360 |
Corrosion Inhibition by 1-Hydroxy-Ethane-1,1-Diphosphonic Acid - An Electrochemical Impedance Spectroscopy Study
Kalman E, Varhegyi B, Bako I, Felhosi I, Karman FH, Shaban A |
| 3361 - 3368 |
Detection of Corrosion-Related Defects in Aluminum Using Positron-Annihilation Spectroscopy
Wu X, Asokakumar P, Lynn KG, Hebert KR |
| 3369 - 3375 |
In-Situ FTIR-ATR Study of P-Silicon Photoelectrode Potassium Ferri-Ferrocyonide Electrolyte Interface
Fan QB, Ng LM |
| 3375 - 3382 |
Analysis of Current/Voltage Curves at N-Si/SiO2/Pt Electrodes - Evidence for Hot-Electron Reduction
Frese KW, Chen C |
| 3382 - 3393 |
The Susceptibility to Surface Corrosion in Acidic Fluoride Media - A Comparison of Diamond, Hopg, and Glossy Carbon Electrodes
Swain GM |
| 3394 - 3403 |
The Effects of Organic Adsorbates on the Underpotential and Bulk Deposition of Silver on Polycrystalline Platinum-Electrodes
Harford ST, Taylor DL, Abruna HD |
| 3404 - 3409 |
Electrocatalysis of Anodic Oxygen-Transfer Reactions - Oxidation of Phenol and Benzene at Bismuth-Doped Lead Dioxide Electrodes in Acidic Solutions
Kawagoe KT, Johnson DC |
| 3410 - 3415 |
Electroluminescence Transient and Its Application to Kinetic-Study on Electrode-Reactions Caused by Carrier Tunneling in Semiconductor Electrodes
Nogami G, Sei H, Aoki A, Ohkubo S, Hamasaki Y |
| 3416 - 3422 |
Fast Impedance Analysis of a Surface Microstructure During Anodic-Oxidation of a Copper-Gold Alloy
Pittermann U, Reining R, Weil KG |
| 3423 - 3428 |
Analysis of Nonexponential Transient-Response Due to a Constant-Phase Element
Vanheuveln FH |
| 3429 - 3438 |
A Comparative-Study of NiO(Li), Lifeo2, and Licoo2 Porous Cathodes for Molten-Carbonate Fuel-Cells
Makkus RC, Hemmes K, Dewit JH |
| 3439 - 3443 |
Enhanced Electrochromic Property of Nickel-Hydroxide Thin-Films Prepared by Anodic Deposition
Chigane M, Ishikawa M |
| 3444 - 3449 |
Oxide Ion Conductivity in Doped Ndalo3 Perovskite-Type Oxides
Ishihara T, Matsuda H, Takita Y |
| 3450 - 3453 |
Low-Temperature Operation of Solid Oxide Fuel-Cell with a ZrO2-Sc2O3-Al2O3 System Electrolyte
Ishii T, Tajima Y |
| 3453 - 3456 |
Determination of Sub-Parts per Billion Boron Contamination in N+ Czochralski Silicon Substrates by SIMS
Chu PK, Bleiler RJ, Metz JM |
| 3456 - 3462 |
High Selectivity Magnetically Enhanced Reactive Ion Etching of Boron-Nitride Films
Cote D, Nguyen S, Dobuzinsky D, Basa C, Neureither B |
| 3462 - 3472 |
Modeling of CVD of Silicon Dioxide Using Teos and Ozone in a Single-Wafer Reactor
Kim EJ, Gill WN |
| 3473 - 3479 |
Impedance-Spectroscopy Response of Aluminum-Copper-Silicon Alloys
Griffin AJ, Brotzen FR, Dunn CF |
| 3480 - 3488 |
Interdiffusion, Phase-Transformation, and Epitaxial CoSi2 Formation in Multilayer Co/Ti-Si(100) System
Hong F, Rozgonyi GA |
| 3489 - 3494 |
Ion-Implantation in Beta-SiC Layers Grown on (100)Si
Hirano Y, Inada T |
| 3494 - 3499 |
Interconnection Formation by Doping Chemical-Vapor-Deposition Aluminum with Copper Simultaneously - Al-Cu CVD
Kondoh E, Kawano Y, Takeyasu N, Ohta T |
| 3500 - 3504 |
Uniformity of the N2O Furnace Oxynitride Process for the Formation of Thin Tunnel Dielectrics
Okada Y, Tabin PJ, Reid KG, Hegde RI, Ajuria SA |
| 3505 - 3511 |
Mass-Spectrometric and Kinetic-Study of Low-Pressure Chemical-Vapor-Deposition of Si3N4 Thin-Films from Sih2Cl2 and NH3
Sorita T, Satake T, Adachi H, Ogata T, Kobayashi K |
| 3512 - 3516 |
Effect of Copper Ions in the Slurry on the Chemical-Mechanical Polish Rate of Titanium
Steigerwald JM, Murarka SP, Gutmann RJ, Duquette DJ |
| 3516 - 3521 |
Effects of Low-Dose Silicon, Carbon, and Oxygen Implantation Damage on Diffusion of Phosphorus in Silicon
Chaudhry S, Law ME |
| 3522 - 3525 |
Diamond Resistors Fabricated Monolithically on Diamond Film Substrate
Davidson JL, Shor JS, Wur D, Kurtz AD |
| 3526 - 3531 |
Citric-Acid Etching of GaAs1-xSbx, Al0.5Ga0.5Sb, and InAs for Heterostructure Device Fabrication
Desalvo GC, Kaspi R, Bozada CA |
| 3532 - 3539 |
Nucleation on SiO2 During the Selective Chemical-Vapor-Deposition of Tungsten by the Hydrogen Reduction of Tungsten Hexafluoride
Desatnik N, Thompson BE |
| 3539 - 3546 |
FTIR Studies of the Adsorption/Desorption Behavior of Cu Chemical-Vapor-Deposition Precursors on Silica .3. Reexamination of (1,1,1,5,5,5-Hexafluoroacetylacetonato)(Vinyltrimethylsilane)Copper(I), (Hfac)Cu(Vtms)
Farkas J, Hampdensmith MJ, Kodas TT |
| 3547 - 3555 |
FTIR Studies of the Adsorption/Desorption Behavior of Cu Chemical-Vapor-Deposition Precursors on Silica .4. Interaction of (1,1,1,5,5,5-Hexafluoroacetylacetonato)(2-Butyne)Copper(I), (Hfac)Cu(2-Butyne) and (1,1,1,5,5,5-Hexafluoroacetylacetonato)(Vinyltrimethylsilane)Copper(I), (Hfac)Cu(Vtms) with Passivated Silica Surfaces and Comparison to Selective CVD of Cu
Farkas J, Hampdensmith MJ, Kodas TT |
| 3556 - 3561 |
New Methods for Circuit Fabrication on Poly(Tetrafluoroethylene) Substrates
Howard AJ, Rye RR, Ricco AJ, Rieger DJ, Lovejoy ML, Sloan LR, Mitchell MA |
| 3562 - 3571 |
Deposition of Fluorinated A-SiC-H Films at Room-Temperature
Kim DS, Lee YH |
| 3572 - 3576 |
Photovoltaic Properties of Sintered CdS/CdTe Solar-Cells with an Indium-Tin-Oxide Electrode
Kim HD, Kim DS, Cho K, Ahn BT, Im HB |
| 3576 - 3580 |
Photoluminescence Measurement of Carbon in Silicon-Crystals Irradiated with High-Energy Electrons
Nakamura M, Kitamura E, Misawa Y, Suzuki T, Nagai S, Sunaga H |
| 3580 - 3584 |
The Profile of Electrically Active Phosphorus in Silicon After Thermal-Oxidation
Nicollian EH, Chatterjee A |
| 3584 - 3587 |
The Kinetics of Very-Low Temperature (Similar-to-300-Degrees-C) Silicon Epitaxial-Growth by Confined Plasma-Enhanced Chemical-Vapor-Deposition
Shieh MD, Lee CY, Yew TR |
| 3588 - 3593 |
Morphology Change of Oxide Precipitates in Cz Silicon During 2-Step Annealing
Sueoka K, Ikeda N, Yamamoto T, Kabayashi S |
| 3593 - 3595 |
Enhanced Diffusion of Dopants at Concentrations Near the Solubility Limit
Antoncik E |
| 3595 - 3599 |
Surface Electronic-Properties of Electrolytically Hydrogen-Terminated Si(111)
Dittrich T, Angermann H, Flietner H, Bitzer T, Lewerenz HJ |
| L159 - L161 |
In-Situ Scanning Vibrating Electrode Technique for the Characterization of Interface Between Lithium Electrode and Electrolytes Containing Additives
Ishikawa M, Yoshitake S, Morita M, Matsuda Y |
| L162 - L164 |
Novel Electrosynthesis of Poly(Cyclo-Organophasphazenes)
Josowicz M, Li J, Exarhos GJ |
| L164 - L165 |
Atomically Resolved STM of Oxide Film Structures on Fe-Cr Alloys During Passivation in Sulfuric-Acid-Solution
Ryan MP, Newman RC, Thompson GE |
| L166 - L168 |
The Impact of Sonication on the Structure and Properties of Stain-Etch Porous Silicon
Chandlerhenderson RR, Coffer JL, Filessesler LA |
| L169 - L171 |
Prevention of Resist Pattern Collapse by Resist Heating During Rinsing
Tanaka T, Morigami M, Oizumi H, Soga T, Ogawa T, Murai F |
| L171 - L173 |
Deconvolution of the Impedance of the Silicon Electrolyte Interface by Potential-Modulated-Microwave Measurements
Schlichthorl G, Peter LM |
