251 - 255 |
The charge transport mechanism in silicon nitride: Multi-phonon trap ionization Vishnyakov AV, Novikov YN, Gritsenko VA, Nasyrov KA |
256 - 265 |
Unified analytical threshold voltage model for non-uniformly doped dual metal gate fully depleted silicon-on-insulator MOSFETs Rao R, Katti G, Havaldar DS, DasGupta N, DasGupta A |
266 - 270 |
A flexible organic thin-film transistor with 6,13-bis(triisopropylsilylethynyl) pentacene and a methyl-siloxane-based dielectric Kwon JH, Shin SI, Choi J, Chung MH, Kang H, Ju BK |
271 - 275 |
Wave function penetration effects on ballistic drain current in double gate MOSFETs fabricated on (100) and (110) silicon surfaces Ashraf MK, Khan AI, Haque A |
276 - 278 |
Phase change memory cell based on Sb2Te3/TiN/Ge2Sb2Te5 sandwich-structure Rao F, Song ZT, Wu LC, Gong YF, Feng SL, Chen B |
279 - 284 |
Charge trapping behavior of SiO2-Anodic Al2O3-SiO2 gate dielectrics for nonvolatile memory applications Huang CH, Li EJ, Chang WJ, Wang NF, Hung CI, Houng MP |
285 - 291 |
A comprehensive model of frequency dispersion in 4H-SiC MESFET Lu HL, Zhang YM, Zhang YM, Zhang T |
292 - 296 |
Gated tunnel diode in oscillator applications with high frequency tuning Wernersson LE, Arlelid M, Egard M, Lind E |
297 - 307 |
Analytical modeling and numerical simulations of the thermal behavior of trench-isolated bipolar transistors Marano I, d'Alessandro V, Rinaldi N |
308 - 313 |
Performance evaluation of sphere-form cathodes in the fabrication of optoelectronic In2O3SnO2 PET Pa PS |
314 - 319 |
Measurement of the MOSFET drain current variation under high gate voltage Terada K, Chagawa T, Xiang JY, Tsuji K, Tsunomura T, Nishida A |
320 - 323 |
Visualization of local gate control in a ZnO inter-nanowire junction device Lim JH, Ji HJ, Jung GE, Chung KH, Kim GT, Ha JS, Park JY, Kahng SJ |
324 - 328 |
Negative capacitance in light-emitting devices Zhu CY, Feng LF, Wang CD, Cong HX, Zhang GY, Yang ZJ, Chen ZZ |
329 - 331 |
Zinc tin oxide based driver for highly transparent active matrix OLED displays Gorrn P, Ghaffari F, Riedl T, Kowalsky W |
332 - 335 |
An internally-matched GaN HEMTs device with 45.2 W at 8 GHz for X-band application Wang XL, Chen TS, Xiao HL, Tang J, Ran JX, Zhang ML, Feng C, Hou QF, Wei M, Jiang LJ, Li JM, Wang ZG |
336 - 340 |
Optical properties studies in InGaN/GaN multiple-quantum well Zhu LH, Liu BL |
341 - 348 |
Temperature dependent analytical model for current-voltage characteristics of AlGaN/GaN power HEMT Huque MA, Eliza SA, Rahman T, Huq HF, Islam SK |
349 - 354 |
Discussions and extension of van Vliet's noise model for high speed bipolar transistors Xia KJ, Niu GF |
355 - 358 |
Effects of nitrogen incorporation into lanthana film by plasma immersion ion implantation Sen B, Wong H, Yang BL, Chu PK, Kakushima K, Iwai H |
359 - 363 |
Experimental characterization of the subthreshold leakage current in triple-gate FinFETs Tsormpatzoglou A, Dimitriadis CA, Mouis M, Ghibaudo G, Collaert N |
364 - 370 |
Simulation of hole and electron tunnel currents in MIS devices adopting the symmetric Franz-type dispersion relation for the charged carriers in thin insulators Vexler MI, Kuligk A, Meinerzhagen B |
371 - 375 |
Formation of polycrystalline-Si thin-film-transistors with a retrograde channel doping profile Juang MH, Cheng SH, Jang SL |
376 - 382 |
A nonparabolicity model compared to tight-binding: The case of square silicon quantum wires Esposito A, Luisier M, Frey M, Schenk A |
383 - 388 |
Design and numerical analysis of a polarization-insensitive quantum well optoelectronic integrated amplifier-switch Darabi E, Ahmadi V |
389 - 391 |
Unified random access memory (URAM) by integration of a nanocrystal floating gate for nonvolatile memory and a partially depleted floating body for capacitorless 1T-DRAM Ryu SW, Han JW, Kim CJ, Kim S, Choi YK |
392 - 396 |
Piezoresistance effect of strained and unstrained fully-depleted silicon-on-insulator MOSFETs integrating a HfO2/TiN gate stack Rochette F, Casse M, Mouis M, Haziot A, Pioger T, Ghibaudo G, Boulanger F |
397 - 399 |
Pure red organic light-emitting diode based on a europium complex Xue Q, Chen P, Lu JH, Xie GH, Hou JY, Liu SY, Zhao Y, Zhang LY, Li B |