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유리기판 박막화를 위한 습식공정에서 식각액 성분의 영향 신영식, 이원규 Korean Chemical Engineering Research, 58(3), 474, 2020 |
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습식 화학 공정에 의한 태양전지로부터 고순도 실리콘 회수 및 이를 이용한 태양전지 재제조 노민호, 이준규, 안영수, 여정구, 이진석, 강기환, 조철희 Korean Journal of Materials Research, 29(11), 697, 2019 |
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Preparation and application of monodisperse spherical polymethylsilsesquioxane (PMSQ) beads by sol-gel method Hong FCN, Yan CJ Advanced Powder Technology, 29(7), 1632, 2018 |
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Fabrication of p-n heterostructure ZnO/Si moth-eye structures: Antireflection, enhanced charge separation and photocatalytic properties Zeng Y, Chen XF, Yi Z, Yi YG, Xu XB Applied Surface Science, 441, 40, 2018 |
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Nanowall formation by maskless wet-etching on a femtosecond laser irradiated silicon surface Lee S, Jo K, Keum HS, Chae S, Kim Y, Choi J, Lee HH, Kim HJ Applied Surface Science, 437, 190, 2018 |
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Nonaqueous organic electrolyte for photoelectrochemical etching of gallium nitride surface Wang C, Zhang MR, Song WX, Peng HD, Huang H, Wang ZG, Xi R, Pan GB Chemical Physics Letters, 710, 54, 2018 |
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A continuous, single-face wet texturing process for industrial multicrystalline silicon solar cells using a surfactant treated photoresist mask Zhang H, Bin Ding B, Xiang Y, Chen TH Solar Energy Materials and Solar Cells, 180, 173, 2018 |
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Normally-off AlGaN/GaN-based MOS-HEMT with self-terminating TMAH wet recess etching Son DH, Jo YW, Won CH, Lee JH, Seo JH, Lee SH, Lim JW, Kim JH, Kang IM, Cristoloveanu S, Lee JH Solid-State Electronics, 141, 7, 2018 |
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The influence of contact material on lateral wet-etching of nickel thin films in lamellae structure Kim JH, Jeong JH, Lee SH, Kim K, Yoon JS, Choi DS, Yoo YE Thin Solid Films, 660, 19, 2018 |
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Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor Shin D, Song H, Lee M, Park H, Ko DH Thin Solid Films, 660, 572, 2018 |