| 1 |
Very high frequency plasma reactant for atomic layer deposition
Oh IK, Yoo G, Yoon CM, Kim TH, Yeom GY, Kim K, Lee Z, Jung H, Lee CW, Kim H, Lee HBR
Applied Surface Science, 387, 109, 2016 |
| 2 |
Crystallinity of silicon films grown on carbon fibers by very high frequency plasma enhanced chemical vapor deposition
Chae E, Lee K, Lee H, Ko D, Jeong H, Sohn H
Thin Solid Films, 591, 137, 2015 |
| 3 |
Simulation of spatial characteristics of very high frequency hydrogen plasma produced by a balanced power feeding
Ogiwara K, Chen WT, Uchino K, Kawai Y
Thin Solid Films, 547, 132, 2013 |
| 4 |
Silicon Oxide Coatings with Very High Rates (> 10 nm/s) by Hexamethyldisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode
Kakiuchi H, Ohmi H, Yamada T, Yokoyama K, Okamura K, Yasutake K
Plasma Chemistry and Plasma Processing, 32(3), 533, 2012 |
| 5 |
Effect of additional VHF plasma source base on conventional RF-PECVD for large area fast growth microcrystalline silicon films
Kim YJ, Choi YS, Choi IS, Han JG
Current Applied Physics, 11(5), S54, 2011 |
| 6 |
Low temperature high-rate growth of crystalline Ge films on quartz and crystalline Si substrates from VHF inductively-coupled plasma of GeH(4)
Sakata T, Makihara K, Deki H, Higashi S, Miyazaki S
Thin Solid Films, 517(1), 216, 2008 |
| 7 |
Design of automatic matching system for very high frequency plasma-enhanced processes
Yoshizako Y, Matsuno D
Materials Science Forum, 512, 239, 2006 |
| 8 |
Development of a large-area, multi-helicon rectangular plasma source for TFT-LCD processing
Kim YJ, Han SH, Hwang W, Hwang YS
Thin Solid Films, 435(1-2), 270, 2003 |
| 9 |
In situ hydrogen plasma treatment for improved transport of (400) oriented polycrystalline silicon films
Suemasu A, Nakahata K, Ro K, Kamiya T, Fortmann CM, Shimizu I
Solar Energy Materials and Solar Cells, 66(1-4), 313, 2001 |
| 10 |
From amorphous to microcrystalline silicon deposition in SiF4-H-2-He plasmas: in situ control by optical emission spectroscopy
Cicala G, Capezzuto P, Bruno G
Thin Solid Films, 383(1-2), 203, 2001 |
