검색결과 : 1건
No. | Article |
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1 |
Enhancement of device performance in vertical sub-100 nm MOS devices due to local channel doping Fink C, Anil KG, Geiger H, Hansch W, Kaesen F, Schulze J, Sulima T, Eisele I Solid-State Electronics, 46(3), 387, 2002 |
No. | Article |
---|---|
1 |
Enhancement of device performance in vertical sub-100 nm MOS devices due to local channel doping Fink C, Anil KG, Geiger H, Hansch W, Kaesen F, Schulze J, Sulima T, Eisele I Solid-State Electronics, 46(3), 387, 2002 |