검색결과 : 24건
| No. | Article |
|---|---|
| 1 |
Sub-10-nm nanolithography with a scanning helium beam Sidorkin V, van Veldhoven E, van der Drift E, Alkemade P, Salemink H, Maas D Journal of Vacuum Science & Technology B, 27(4), L18, 2009 |
| 2 |
Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist Sidorkin VA, Alkemade PFA, Salemink HWM, Schmits R, van der Drift E Journal of Vacuum Science & Technology B, 27(6), 2503, 2009 |
| 3 |
Field emission for cantilever sensors Yang CK, le Febre AJ, Pandraud G, van der Drift E, French PJ Journal of Vacuum Science & Technology B, 26(3), 927, 2008 |
| 4 |
Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP Carlstrom CF, van der Heijden R, Andriesse MSP, Karouta F, van der Heijden RW, van der Drift E, Salemink HWM Journal of Vacuum Science & Technology B, 26(5), 1675, 2008 |
| 5 |
Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography Sidorkin V, van der Drift E, Salemink H Journal of Vacuum Science & Technology B, 26(6), 2049, 2008 |
| 6 |
Fabrication of two dimensional GaN nanophotonic crystals (31) Rong B, Salemink HWM, Roeling EM, Van der Heijden R, Karouta F, Van der Drift E Journal of Vacuum Science & Technology B, 25(6), 2632, 2007 |
| 7 |
Cl-2/O-2-inductively coupled plasma etching of deep hole-type photonic crystals in InP Carlstrom CF, van der Heijden R, Karouta F, van der Heijden RW, Salemink HWM, van der Drift E Journal of Vacuum Science & Technology B, 24(1), L6, 2006 |
| 8 |
Magnetization losses in submicrometer CoFeB dots etched in a high ion density Cl-2-based plasma Fabrie CGCHM, Kohlhepp JT, Swagten HJM, Koopmans B, Andriesse MSP, van der Drift E Journal of Vacuum Science & Technology B, 24(6), 2627, 2006 |
| 9 |
Etch mechanism and etch-induced effects in the inductively coupled plasma etching of GaN Cheung R, Rong B, van der Drift E, Sloof WG Journal of Vacuum Science & Technology B, 21(4), 1268, 2003 |
| 10 |
X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films Jiang LD, Fitzgerald AG, Rose MJ, Cheung R, Rong B, van der Drift E Applied Surface Science, 193(1-4), 144, 2002 |