화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 The effect of aspect ratio scaling on hydrostatic stress in passivated interconnects
Ang D, Wong CC, Ramanujan RV
Thin Solid Films, 515(6), 3246, 2007
2 The effect of grain boundary characteristics on microstructure and stress void evolution in electroplated and sputtered Cu films
Joo YC, Hwang SJ, Park H
Materials Science Forum, 426-4, 3481, 2003
3 Evolution of surface morphologies in sputtered and electroplated Cu films during thermal cycling
Hwang SJ, Park H, Lee JH, Oh KH, Joo YC
Materials Science Forum, 408-4, 1651, 2002