화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Analytical model of drain current of strained-Si/strained-Si1-yGey/relaxed-Si1-xGex NMOSFETs and PMOSFETs for circuit simulation
Bindu B, DasGupta N, DasGupta A
Solid-State Electronics, 50(3), 448, 2006
2 N-channel MOSFETs fabricated on He-implanted and annealed SiGe buffer layers
Mooney PM, Rim K, Christiansen SH, Chan KK, Chu JO, Cai J, Chen H, Jordan-Sweet JL, Yang YY, Boyd DC
Solid-State Electronics, 49(10), 1669, 2005
3 Numerical simulation of strained Si/SiGe devices: the hierarchical approach
Meinerzhagen B, Jungemann C, Neinhus B, Bartels M
Applied Surface Science, 224(1-4), 235, 2004
4 Performance assessment of scaled strained-Si channel-on-insulator (SSOI) CMOS
Kim K, Chuang CT, Rim K, Joshi RV
Solid-State Electronics, 48(2), 239, 2004
5 Power analysis of strained-Si device s/circuits
Kim K, Joshi RV, Chuang CT
Solid-State Electronics, 48(8), 1453, 2004