화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Kinetic Monte Carlo simulation for semiconductor processing: A review
Martin-Bragado I, Borges R, Balbuena JP, Jaraiz M
PROGRESS IN MATERIALS SCIENCE, 92, 1, 2018
2 Real time feedback control of plasma density using a floating probe in semiconductor processing
Jang SH, Oh SJ, Lee YK, Chung CW
Current Applied Physics, 13(1), 76, 2013
3 Germanium vertical Tunneling Field-Effect Transistor
Hahnel D, Oehme M, Sarlija M, Karmous A, Schmid M, Werner J, Kirfel O, Fischer I, Schulze J
Solid-State Electronics, 62(1), 132, 2011
4 Effect of temperature on the decomposition of trifluoromethane in a dielectric barrier discharge reactor
Kim DH, Mok YS, Lee SB
Thin Solid Films, 519(20), 6960, 2011
5 Simulation-based design and experimental evaluation of a spatially controllable CVD reactor
Choo JO, Adomaitis RA, Rubloff GW, Henn-Lecordier L, Liu YJ
AIChE Journal, 51(2), 572, 2005
6 In-line phase and texture control in microelectronics industry
Kozaczek K
Materials Science Forum, 495-497, 1343, 2005
7 Preparation of Cr-Si multilayer structures for thin film heater applications
Cho NI, Kim MC
Thin Solid Films, 475(1-2), 235, 2005
8 Optimal control of rapid thermal annealing in a semiconductor process
Gunawan R, Jung MYL, Seebauer EG, Braatz RD
Journal of Process Control, 14(4), 423, 2004
9 Numerical modeling of silicon oxide particle formation and transport in a one-dimensional low-pressure chemical vapor deposition reactor
Suh SM, Zachariah MR, Girshick SL
Journal of Aerosol Science, 33(6), 943, 2002
10 Simulation of the adhesion of particles to surfaces
Cooper K, Gupta A, Beaudoin S
Journal of Colloid and Interface Science, 234(2), 284, 2001