| 1 |
Investigation of Ti0.54Al0.46/Ti0.54Al0.46N multilayer films deposited by reactive gas pulsing process by nano-indentation and electron energy-loss spectroscopy
Pac MJ, Pinot Y, Giljean S, Rousselot C, Delobelle P, Ulhaq-Bouillet C, Tuilier MH
Thin Solid Films, 634, 96, 2017 |
| 2 |
Enhanced tunability of the composition in silicon oxynitride thin films by the reactive gas pulsing process
Aubry E, Weber S, Billard A, Martin N
Applied Surface Science, 290, 148, 2014 |
| 3 |
Structural analysis of W3O/WO3 and TiO/TiO2 periodic multilayer thin films sputter deposited by the reactive gas pulsing process
Cacucci A, Potin V, Imhoff L, de Lucas MCM, Martin N
Thin Solid Films, 520(14), 4778, 2012 |
| 4 |
Silicon oxynitride thin films synthesised by the reactive gas pulsing process using rectangular pulses
Aubry E, Weber S, Billard A, Martin N
Applied Surface Science, 257(23), 10065, 2011 |
| 5 |
Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process
Chappe JM, Martin N, Lintymer J, Sthal F, Terwagne G, Takadoum J
Applied Surface Science, 253(12), 5312, 2007 |
| 6 |
Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique
Martin N, Banakh O, Santo AME, Springer S, Sanjines R, Takadoum J, Levy F
Applied Surface Science, 185(1-2), 123, 2001 |
