1 |
The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films Wang MY, Thimont Y, Presmanes L, Diao XG, Barnabe A Applied Surface Science, 419, 795, 2017 |
2 |
Novel [111] oriented gamma-Mo2N thin films deposited by magnetron sputtering as an anode for aqueous micro-supercapacitors Chen LM, Liu C, Zhang ZJ Electrochimica Acta, 245, 229, 2017 |
3 |
Reactively sputtered ZrN for application as reflecting back contact in Cu(In,Ga)Se-2 solar cells Schleussner S, Kubart T, Torndahl T, Edoff M Thin Solid Films, 517(18), 5548, 2009 |
4 |
Cu2O thin films deposited by reactive direct current magnetron sputtering Zhu HL, Zhang JY, Li CZ, Pan F, Wang TM, Huang BB Thin Solid Films, 517(19), 5700, 2009 |
5 |
Improvement in dye-sensitized solar cells employing TiO2 electrodes coated with Al2O3 by reactive direct current magnetron sputtering Wu SJ, Han HW, Tai QD, Zhang J, Xu S, Zhou CH, Yang Y, Hu H, Chen BL, Zhao XZ Journal of Power Sources, 182(1), 119, 2008 |
6 |
Thin film TiO2 photoanodes for water photolysis prepared by dc magnetron sputtering Brudnik A, Gorzkowska-Sobas A, Pamula E, Radecka M, Zakrzewska K Journal of Power Sources, 173(2), 774, 2007 |
7 |
Corrosion behavior of nanolayered TiN/NbN multilayer coatings prepared by reactive direct current magnetron sputtering process Barshilia HC, Prakash MS, Poojari A, Rajam KS Thin Solid Films, 460(1-2), 133, 2004 |
8 |
Physical properties of thin GeO2 films produced by reactive DC magnetron sputtering Lange T, Njoroge W, Weis H, Beckers M, Wuttig M Thin Solid Films, 365(1), 82, 2000 |