1 |
Phase-Resolved Measurement of Atmospheric-Pressure Radio-Frequency Pulsed Discharges in Ar/CH4/CO2 Mixture Liu Z, Huang BD, Zhu WC, Zhang C, Tu X, Shao T Plasma Chemistry and Plasma Processing, 40(4), 937, 2020 |
2 |
Comparison of sintering condition and radio frequency plasma discharge on the conversion of coal/biomass fly ash into high-temperature thermal energy storage material Lin WY, Li T, Akasyah L, Lim JWM, Xu HX, Py X, Rawat RS, Romagnoli A Energy Conversion and Management, 192, 180, 2019 |
3 |
Low temperature deposition of germanium on silicon using Radio Frequency Plasma Enhanced Chemical Vapor Deposition Dushaq G, Rasras M, Nayfeh A Thin Solid Films, 636, 585, 2017 |
4 |
Mechanical characterization of a-C:H:SiOx coatings synthesized using radio-frequency plasma-assisted chemical vapor deposition method Batory D, Jedrzejczak A, Szymanski W, Niedzielski P, Fijalkowski M, Louda P, Kotela I, Hromadka M, Musil J Thin Solid Films, 590, 299, 2015 |
5 |
Structural properties of hydrogenated microcrystalline silicon-carbon alloys deposited by Radio Frequency Plasma Enhanced Chemical Vapor Deposition: Effect of microcrystalline silicon seed layer and methane flow rate Gaiaschi S, Ruggeri R, Johnson EV, Bulkin P, Chapon P, Gueunier-Farret ME, Mannino G, Longeaud C, Kleider JP Thin Solid Films, 550, 312, 2014 |
6 |
Room temperature radio-frequency plasma-enhanced pulsed laser deposition of ZnO thin films Huang SH, Chou YC, Chou CM, Hsiao VKS Applied Surface Science, 266, 194, 2013 |
7 |
Measurements of plasma parameters in capacitively coupled radio frequency plasma from discharge characteristics: Correlation with optical emission spectroscopy Bora B, Bhuyan H, Favre M, Wyndham E, Chuaqui H, Wong CS Current Applied Physics, 13(7), 1448, 2013 |
8 |
Structure modification of titanium oxide thin films by rf-plasma assistance in Ti-O-2 reactive dc and pulsed dc sputtering Sakamoto M, Kusano E, Matsuda H Thin Solid Films, 531, 49, 2013 |
9 |
Hydrogen production by radio frequency plasma stimulation in methane hydrate at atmospheric pressure Putra AEE, Nomura S, Mukasa S, Toyota H International Journal of Hydrogen Energy, 37(21), 16000, 2012 |
10 |
Evolution of structural and optical properties of nanostructured silicon carbon films deposited by plasma enhanced chemical vapour deposition Ambrosone G, Basa DK, Coscia U, Passacantando M Thin Solid Films, 520(15), 4875, 2012 |