| 1 |
Effects of the Si/Al layer thickness on the continuity, crystalline orientation and the growth kinetics of the poly-Si thin films formed by aluminum-induced crystallization
Tutashkonko S, Usami N
Thin Solid Films, 616, 213, 2016 |
| 2 |
In-situ determination of the coefficient of thermal expansion of polysilicon thin films using micro-rotating structures
Liu HY, Li WH, Zhou ZF, Huang QA
Thin Solid Films, 552, 184, 2014 |
| 3 |
Preparation of high quality polycrystalline silicon thin films by aluminum-induced crystallization
Tang ZX, Shen HL, Huang HB, Lu LF, Yin YG, Cai H, Shen JC
Thin Solid Films, 517(19), 5611, 2009 |
| 4 |
Polycrystalline silicon thin film solar cells prepared by PECVD-SPC
Buittrago RH, Risso GA, Cutrera M, Battioni M, De Bernardez L, Schmidt JA, Arce RD, Koropecki RR
International Journal of Hydrogen Energy, 33(13), 3522, 2008 |
| 5 |
Microstructure control of very thin polycrystalline silicon layers on glass substrate by plasma enhanced CVD
Matsuura D, Kamiya T, Fortmann CM, Simizu I
Solar Energy Materials and Solar Cells, 66(1-4), 305, 2001 |
| 6 |
Status of Cat-CVD (Hot-Wire CVD) research in Europe
Schropp REI
Thin Solid Films, 395(1-2), 17, 2001 |
| 7 |
Early Stages of Microcrystalline Silicon Film Growth on Amorphous Substrate with SiH4 Gas Heating
Shirai H, Arai T
Thin Solid Films, 296(1-2), 19, 1997 |
| 8 |
The Formation of TiSi2 by Rta Processing
Wan WK, Wu ST
Thin Solid Films, 298(1-2), 62, 1997 |
| 9 |
Surface Studies of Chemically Vapor-Deposited Silicon Films Using Friction Force Microscopy
Flueraru C, Cobianu C, Cosmin P, Dascalu D
Thin Solid Films, 303(1-2), 117, 1997 |
| 10 |
Microcrystalline Structure of Poly-Si Films Prepared by Cathode-Type RF Glow-Discharge
Jayatissa AH, Suzuki M, Nakanishi Y, Hatanaka Y
Thin Solid Films, 256(1-2), 234, 1995 |
