| 1 |
Mitigation of ion and particulate emission from laser-produced plasmas used for extreme ultraviolet lithography
Di Lazzaro P, Bollanti S, Flora F, Mezi L, Murra D, Torre A
Applied Surface Science, 272, 13, 2013 |
| 2 |
Dual-power electrodes atmospheric pressure argon plasma jet: Effect of driving frequency (60-130 kHz) on discharge characteristics
Qian MY, Fan QQ, Ren CS, Wang DZ, Nie QY, Zhang JL, Wen XQ
Thin Solid Films, 521, 265, 2012 |
| 3 |
Cold atmospheric plasma: Sources, processes, and applications
Bardos L, Barankova H
Thin Solid Films, 518(23), 6705, 2010 |
| 4 |
Small size plasma tools for material processing at atmospheric pressure
Ionita ER, Ionita MD, Stancu EC, Teodorescu M, Dinescu G
Applied Surface Science, 255(10), 5448, 2009 |
| 5 |
Ultrahigh-frequency microplasma jet as a low-power, high-density, and localized ions/radicals source
Miyazoe H, Sai M, Stauss S, Terashima K
Journal of Vacuum Science & Technology A, 27(1), 9, 2009 |
| 6 |
Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor
Sung DY, Jeong SM, Park YM, Volynets VN, Ushakov AG, Kim GH
Journal of Vacuum Science & Technology A, 27(1), 13, 2009 |
| 7 |
Test particle simulation of the role of ballistic electrons in hybrid dc/rf capacitively coupled CF4 plasmas
Ventzek PLG, Denpoh K
Journal of Vacuum Science & Technology A, 27(2), 287, 2009 |
| 8 |
Latest innovations in large area web coating technology via plasma enhanced chemical vapor deposition source technology
George MA, Chandra H, Morse P, Madocks J
Journal of Vacuum Science & Technology A, 27(4), 970, 2009 |
| 9 |
Deposition of various metal, ceramic, and cermet coatings by an industrial-scale large area filtered arc deposition process
Gorokhovsky V, Bowman C, VanVorous D, Wallace J
Journal of Vacuum Science & Technology A, 27(4), 1080, 2009 |
| 10 |
Diagnostics and application of the high frequency plasma pencil
Janca J, Zajickova L, Klima M, Slavicek P
Plasma Chemistry and Plasma Processing, 21(4), 565, 2001 |
