| 1 |
Control of radial density profile of nano-particles produced in reactive plasma by amplitude modulation of radio frequency discharge voltage
Kamataki K, Koga K, Uchida G, Itagaki N, Yamashita D, Matsuzaki H, Shiratani M
Thin Solid Films, 523, 76, 2012 |
| 2 |
The effect of argon dilution on deposition of microcrystalline silicon by microwave plasma enhanced chemical-vapor deposition
Soppe WJ, Devilee C, Geusebroek M, Loffler J, Muffler HJ
Thin Solid Films, 515(19), 7490, 2007 |
| 3 |
Effect of Si-OH group on characteristics of SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasma
Ye C, Ning ZY, Wang TT, Yu XZ, Xin Y
Thin Solid Films, 496(2), 221, 2006 |
| 4 |
Proximity-controlled silicon carbide etching in inductively coupled plasma
Kim B, Kim S, Ann SC, Lee BT
Thin Solid Films, 434(1-2), 276, 2003 |
| 5 |
TEM and simulation studies of Ti3N ordered superstructure formed in intensified plasma assisted nitrided Ti-6Al-4V alloy
Jiang JC, Meletis EI
Thin Solid Films, 402(1-2), 183, 2002 |
| 6 |
Synthesis and structural properties of Al-C-N-O composite thin films
Ning J, Xu S, Ostrikov KN, Chai JW, Li YN, Ling KM, Lee S
Thin Solid Films, 385(1-2), 55, 2001 |
| 7 |
Cast iron substrates reclamation by tape casting of NiCu treated by plasma transferred arc: optimization of the tape and its plasma treatment
Leylavergne M, Chartier T, Denoirjean A, Grimaud A, Abelard P, Fauchais P
Thin Solid Films, 391(1), 1, 2001 |
