| 1 |
Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether
You SH, Kim JH, Kim CK
Korean Journal of Chemical Engineering, 39(1), 63, 2022 |
| 2 |
Surface topology engineering of ferroelectric polymer film by high-pressure plasma etching
Kim WY
Molecular Crystals and Liquid Crystals, 711(1), 89, 2020 |
| 3 |
Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching
Osipov AA, Iankevich GA, Alexandrov SE
Plasma Chemistry and Plasma Processing, 40(1), 423, 2020 |
| 4 |
Exploring the Effects of Placement and Electron Angular Distribution on Two Adjacent Mask Holes During Plasma Etching Process
Zhang P, Zhang LD, Lv KM
Plasma Chemistry and Plasma Processing, 40(6), 1605, 2020 |
| 5 |
Removal of photoresist residues and healing of defects on graphene using H-2 and CH4 plasma
Yun H, Lee S, Jung D, Lee G, Park J, Kwon OJ, Lee DJ, Park CY
Applied Surface Science, 463, 802, 2019 |
| 6 |
Easy plasma nano-texturing of PTFE surface: From pyramid to unusual spherules-on-pyramid features
Lo Porto C, Di Mundo R, Veronico V, Trizio I, Barucca G, Palumbo F
Applied Surface Science, 483, 60, 2019 |
| 7 |
Surface modification of polyamide meshes and nonwoven fabrics by plasma etching and a PDA/cellulose coating for oil/water separation
Zhao P, Qin N, Ren CL, Wen JZ
Applied Surface Science, 481, 883, 2019 |
| 8 |
Fabrication of MnO2/carbon micro/nanostructures based on Carbon-MEMS technique on stainless steel substrate for supercapacitive microelectrodes
Jiang SL, Wang F, Tan XH, Lin JB, Liao GL, Tang ZR, Shi TL, Qian LM
Electrochimica Acta, 303, 323, 2019 |
| 9 |
Etching Kinetics and Mechanisms of SiC Thin Films in F-, Cl- and Br-Based Plasma Chemistries
Lee BJ, Efremov A, Lee J, Kwon KH
Plasma Chemistry and Plasma Processing, 39(1), 325, 2019 |
| 10 |
Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4+CHF3+O-2 Inductively Coupled Plasma
Lee J, Kim J, Efremov A, Kim C, Lee HW, Kwon KH
Plasma Chemistry and Plasma Processing, 39(4), 1127, 2019 |
