| 1 |
Study of temperature-dependent charge conduction in silicon-nanocrystal/SiO2 multilayers
Mavilla NR, Chavan V, Solanki CS, Vasi J
Thin Solid Films, 612, 41, 2016 |
| 2 |
Effects of Annealing on the Morphology and Porosity of Porous TiO2 Films Fabricated by Deposition of Aerosol Nanoparticles
Kubo M, Mantani Y, Shimada M
Journal of Chemical Engineering of Japan, 48(4), 292, 2015 |
| 3 |
Synthesis of diamond-like carbon films on Si substrates by photoemission-assisted plasma-enhanced chemical vapor deposition
Yang M, Ogawa S, Takabayashi S, Otsuji T, Takakuwa Y
Thin Solid Films, 523, 25, 2012 |
| 4 |
Surface studies of novel hydrophobic active carbons
Bradley RH, Smith MW, Andreu A, Falco M
Applied Surface Science, 257(7), 2912, 2011 |
| 5 |
Influence of hydrogen plasma treatment on Al-doped ZnO thin films for amorphous silicon thin film solar cells
Wang FH, Chang HP, Tseng CC, Huang CC, Liu HW
Current Applied Physics, 11(1), S12, 2011 |
| 6 |
Spectroellipsometric and ion beam analytical investigation of nanocrystalline diamond layers
Lohner T, Csikvari P, Khanh NQ, David S, Horvath ZE, Petrik P, Hars G
Thin Solid Films, 519(9), 2806, 2011 |
| 7 |
Deposition of amorphous hydrogenated carbon films on Si and PMMA by pulsed direct-current plasma CVD
Sung TL, Chao YA, Liu CM, Teii K, Teii S, Hsu CY
Thin Solid Films, 519(20), 6688, 2011 |
| 8 |
Gas phase kinetic and optical emission spectroscopy studies in plasma-enhanced hot filament catalytic CVD production of carbon nanotubes
Gulas M, Le Normand F, Veis P
Applied Surface Science, 255(10), 5177, 2009 |
| 9 |
The influence of H-2/(H-2 + Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD
Tang ZG, Wang WB, Zhou B, Wang DS, Peng SL, He DY
Applied Surface Science, 255(21), 8867, 2009 |
| 10 |
Precursor Cat-CVD a-Si films for the formation of high-quality poly-Si films on glass substrates by flash lamp annealing
Ohdaira K, Shiba K, Takemoto H, Fujiwara T, Endo Y, Nishizaki S, Jang YR, Matsumura H
Thin Solid Films, 517(12), 3472, 2009 |
