검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Effect of process related and haze defects on 193 nm immersion lithography Tay CJ, Quan C, Ling ML, Lin Q, Chua GS Journal of Vacuum Science & Technology B, 28(1), 45, 2010 |
| 2 |
Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas Jung HY, Park YR, Lee HJ, Lee NE, Jeong CY, Ahn J Journal of Vacuum Science & Technology B, 27(6), 2361, 2009 |
| 3 |
Improvement of imaging properties by optimizing the capping structure in extreme ultraviolet lithography Jeong CY, Lee S, Shin HD, Kim TG, Ahn J Journal of Vacuum Science & Technology B, 27(6), 2922, 2009 |
| 4 |
Propagation Effects of Partial Coherence in Optical Lithography Socha RJ, Neureuther AR Journal of Vacuum Science & Technology B, 14(6), 3724, 1996 |
| 5 |
Printability of Substrate and Absorber Defects on Extreme-Ultraviolet Lithographic Masks Nguyen KB, Raychaudhuri AK, Stulen RH, Krenz K, Fetter LA, Tennant DM, Windt DL Journal of Vacuum Science & Technology B, 13(6), 3082, 1995 |