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Effect of substitution group variation on the optical functions of-5-sulfono-7-(4-x phenyl azo)-8-hydroxy quinoline thin films Zeyada HM, El-Ghamaz NA, Gaml EA Current Applied Physics, 13(9), 1960, 2013 |
2 |
Relationships among surface processing at the nanometer scale, nanostructure and optical properties of thin oxide films Losurdo M Thin Solid Films, 455-56, 301, 2004 |
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Temperature dependence of the optical functions of amorphous silicon-based materials: application to in situ temperature measurements by spectroscopic ellipsometry Daineka D, Suendo V, Cabarrocas PRI Thin Solid Films, 468(1-2), 298, 2004 |
4 |
Optical characterization of TiN/SiO2(1000 nm)/Si system by spectroscopic ellipsometry and reflectometry Postava K, Aoyama M, Yamaguchi T Applied Surface Science, 175, 270, 2001 |
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Spectroellipsometric characterization of materials for multilayer coatings Postava K, Aoyama M, Yamaguchi T, Oda H Applied Surface Science, 175, 276, 2001 |
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Metrology of sub-0.5 mu m silicon epitaxial films Chen WZ, Reif R Journal of Vacuum Science & Technology A, 16(4), 2330, 1998 |
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Advances in multichannel spectroscopic ellipsometry Collins RW, An I, Fujiwara H, Lee JC, Lu YW, Koh JY, Rovira PI Thin Solid Films, 313-314, 18, 1998 |
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Measurement of the absorption edge of thick transparent substrates using the incoherent reflection model and spectroscopic UV visible near IR ellipsometry Kildemo M, Ossikovski R, Stchakovsky M Thin Solid Films, 313-314, 108, 1998 |
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Spectroscopic ellipsometry characterization of thin-film silicon nitride Jellison GE, Modine FA, Doshi P, Rohatgi A Thin Solid Films, 313-314, 193, 1998 |
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Comparative study of polysilicon-on-oxide using spectroscopic ellipsometry, atomic force microscopy, and transmission electron microscopy Petrik P, Fried M, Lohner T, Berger R, Biro LP, Schneider C, Gyulai J, Ryssel H Thin Solid Films, 313-314, 259, 1998 |