화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Deposition of device quality silicon nitride with ultra high deposition rate (> 7 nm/s) using hot-wire CVD
Verlaan V, Houweling ZS, van der Werf CHM, Romijn IG, Weeber AW, Goldbach HD, Schropp REI
Thin Solid Films, 516(5), 533, 2008
2 Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multi crystalline silicon solar cells
van der Werf CHM, Goldbach HD, Loffler J, Scarfo A, Kylner AMC, Stannowski B, ArnoldBik WM, Weeber A, Rieffe H, Soppe WJ, Rath JK, Schropp REI
Thin Solid Films, 501(1-2), 51, 2006